Patents by Inventor Thomas Kloffenstein

Thomas Kloffenstein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Real-time component monitoring and replenishment system for multicomponent fluids
    Patent number: 7214537
    Abstract: A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: May 8, 2007
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Russell Stevens, Thomas Kloffenstein, Todd Aycock, Joseph W. Evans
  • Real-time component monitoring and replenishment system for multicomponent fluids
    Patent number: 7153690
    Abstract: A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.
    Type: Grant
    Filed: October 23, 2002
    Date of Patent: December 26, 2006
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Russell Stevens, Thomas Kloffenstein, Todd Aycock, Joseph W. Evans, Richard Bhella
  • Real-time component monitoring and replenishment system for multicomponent fluids
    Publication number: 20060211129
    Abstract: A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.
    Type: Application
    Filed: May 22, 2006
    Publication date: September 21, 2006
    Inventors: Russell Stevens, Thomas Kloffenstein, Todd Aycock, Joseph Evans
  • Real-time component monitoring and replenishment system for multicomponent fluids
    Publication number: 20040065547
    Abstract: A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.
    Type: Application
    Filed: October 23, 2002
    Publication date: April 8, 2004
    Inventors: Russell Stevens, Thomas Kloffenstein, Todd Aycock, Joseph W. Evans, Richard Bhella
  • Real-time component monitoring and replenishment system for multicomponent fluids
    Publication number: 20030121799
    Abstract: A multicomponent fluid composition monitoring and compositional control system, in which a component analysis is effected by titration or other analytical procedure, for one or more components of interest, and a computational means then is employed to determine and responsively adjust the relative amount or proportion of the one or more components in the multicomponent fluid composition, to maintain a predetermined compositional character of the multicomponent fluid composition. The system is usefully employed in semiconductor manufacturing photoresist and post-etch residue removal, in which the cleaning medium is a semi-aqueous solvent composition, and water is the monitored and responsively adjusted component.
    Type: Application
    Filed: October 4, 2002
    Publication date: July 3, 2003
    Inventors: Russell Stevens, Thomas Kloffenstein, Todd Aycock, Joseph W. Evans