Patents by Inventor Thomas Leichsenring

Thomas Leichsenring has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6844136
    Abstract: This present invention discloses a photopolymerisable mixture comprising a polymer binder, a radically photopolymerisable component containing at least one photooxidisable group, a polyethylene glycol di(meth)acrylate containing 2 or more ethylene glycol units, a photoreducible dye and a metallocene. This mixture can be used for preparing high-speed light-sensitive recording materials showing a particularly high resolution, especially for small negative types.
    Type: Grant
    Filed: August 24, 2000
    Date of Patent: January 18, 2005
    Assignee: AGFA-Gevaert
    Inventors: Thorsten Lifka, Sabine Kosack, Thomas Leichsenring, Hans-Joachim Schlosser
  • Patent number: 6576396
    Abstract: The invention relates to a pigment dispersion which contains at least one polymer containing polyvinyl alcohol, polyvinyl ether an/or polyvinyl acetal units and at least one polymer based on acrylate, wherein the weight ratio is generally 1:10 to 10:1, preferably 4:1 to 1:4. This dispersion is used in positive- or negative-working and reversible photosensitive mixtures for the preparation of recording materials.
    Type: Grant
    Filed: July 17, 2000
    Date of Patent: June 10, 2003
    Assignee: Agfa-Gevaert
    Inventors: Thomas Leichsenring, Thorsten Lifka, Armin Pink, Klaus-Peter Konrad, Hans-Joachim Schlosser
  • Patent number: 6410205
    Abstract: The present invention relates to a photosensitive recording material comprising a base, a photopolymerisable layer and a covering layer containing a mixture of at least one water-soluble or at least water-dispersible polymer and at least one additive, the additive being selected from the group consisting of alkoxylated alkylenediamines, alkoxylated (C10-C25) alkanols, phosphoric acid (C1-C15) alkyl esters and phosphoric acid (C1-C15) alkyl esters and the amount of the additive being in the range of 0.001 to 10.0% by weight, relative to the total weight of the non-volatile components of the covering layer. The present invention also relates to a process for preparing an offset printing plate with this recording material.
    Type: Grant
    Filed: September 12, 2000
    Date of Patent: June 25, 2002
    Assignee: AGFA-Gevaert
    Inventors: Thomas Leichsenring, Thorsten Lifka, Mario Boxhorn
  • Patent number: 6365330
    Abstract: The invention relates to a developer concentrate which comprises water, at least one agent which is alkaline in water and an amphoteric surfactant and additionally at least one anionic surfactant, at least one complexing agent, at least one aminoalcohol and at least one N-alkoxylated mono- or polyfunctional amine. A ready-to-use developer can be prepared from this concentrate by dilution with tap water advantageously in the ratio of from 1:0.5 to 1:10, preferably in the ratio of from 1:2 to 1:6. The developer or the replenisher is preferably used in the production of printing plates.
    Type: Grant
    Filed: October 5, 1999
    Date of Patent: April 2, 2002
    Assignee: Agfa-Gevaert AG
    Inventors: Thomas Leichsenring, Mario Boxhorn, Andreas Elsaesser, Thorsten Lifka, Rudolf Zertani
  • Patent number: 6100004
    Abstract: A positive-working or negative-working radiation-sensitive mixture includes as an IR absorbing component a carbon black pigment having a primary particle size smaller than 80 nm. The carbon black pigment is predispersed in a polymer containing acidic units having a pK.sub.a of less than 13. The radiation-sensitive component may include an ester of (i) a 1,2-naphthoquinone-2-diazide-4-sulfonic acid or a 1,2-naphthoquinone-2-diazide-5-sulfonic acid and (ii) a compound having at least one phenolic hydroxyl group, such as 3 to 6 phenolic hydroxyl groups. After imagewise radiation exposure, the recording material including the radiation-sensitive mixture can be developed without difficulties in an aqueous alkaline solution without leaving residual coating on the areas that became soluble or that remained soluble upon exposure.
    Type: Grant
    Filed: March 11, 1998
    Date of Patent: August 8, 2000
    Assignee: Agfa-Gevaert N.V.
    Inventors: Andreas Elsaesser, Otfried Gaschler, Helmut Haberhauer, Mathias Eichhorn, Fritz-Feo Grabley, Thomas Leichsenring, Gabor I. Koletar, Douglas A. Seeley