Patents by Inventor Thomas Ochs

Thomas Ochs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11952302
    Abstract: A process for the production of a fluorinated quartz glass including the steps of generating SiO2 particles in a synthesis burner; depositing the resulting SiO2 particles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to ?10° C. is supplied to the synthesis burner.
    Type: Grant
    Filed: August 6, 2021
    Date of Patent: April 9, 2024
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Stefan Ochs, Thomas Kayser, Martin Trommer, Andreas Langner, Sascha Pihan, Kay Schuster, Michael Hünermann
  • Publication number: 20240110427
    Abstract: Described is an actuating mechanism for actuating a cover of a vehicle. The cover is reversibly movable between a closed position where the cover is arranged flush with a vehicle outer shell and an open position where the cover is arranged at least partially or regionally behind the vehicle outer shell. The actuating mechanism comprises a movement mechanism operatively connected to the rear side of the cover. In order to transition the cover from the closed position into the open position proceeding from the closed position of the cover, the movement mechanism moves the cover initially into an intermediate position in a rotational and translational movement in which intermediate position the cover is pivoted relative to the closed position of the cover about a first axis of rotation and is at least partially or regionally offset in comparison to the closed position backwards towards the interior of the vehicle.
    Type: Application
    Filed: September 12, 2023
    Publication date: April 4, 2024
    Inventors: Tobias GÖPFERT, Matthias HEGWEIN, Thomas LECHNER-WATZLIK, Joachim OBERST, Roland OCH
  • Publication number: 20230083793
    Abstract: The invention relates to an arrangement (I) of a palm rest (IO) and a manually actuatable operating element (20) for a vehicle. The palm rest (IO) is designed to adopt a first and a second position relative to the operating element (20), the palm rest (IO) being positioned, in the first position, such that it enables a hand (2) to be supported while the operating element (20) is being operated. To protect against damage and to enable the vehicle interior to be better used, the palm rest (IO) is positioned, in the second position, such that the palm rest (IO) at least partially projects over and/or covers the operating element (20).
    Type: Application
    Filed: January 20, 2021
    Publication date: March 16, 2023
    Applicant: MAN Truck & Bus SE
    Inventor: Thomas OCHS
  • Patent number: 7754908
    Abstract: The present invention relates to specific novel tungsten and molybdenum compounds to the use thereof for the deposition of tungsten- or molybdenum-containing layers by means of chemical vapour deposition, and to the tungsten- or molybdenum-containing layers produced by this process.
    Type: Grant
    Filed: January 4, 2007
    Date of Patent: July 13, 2010
    Assignee: H. C. Starck Clevios GmbH
    Inventors: Knud Reuter, Jörg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kestin Volz, Michael Pokoj, Thomas Ochs
  • Patent number: 7442407
    Abstract: Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described: wherein M stands for Nb or Ta, R1 and R2 C1 to C12 alkyl, C5 to C12 cycloalkyl, C6 to C10 aryl radicals, 1-alkenyl, 2-alkenyl, 3-alkenyl, triorganosilyl radicals —SiR3, or amino radicals NR2 R3 is C1 to C8 alkyl, C5 to C10 cycloalkyl, C6 to C14 aryl radical, or SiR3 or NR2, R4 denotes Cl, Br, I, NIH—R5 where R5 is C1 to C8 alkyl, C5 to C10 cycloalkyl or C6 to C10 aryl radical, or O—R6 where R6=optionally substituted C1 to C11 alkyl, C5 to C10 cycloalkyl, C6 to C10 aryl radical, or —SiR3, or BH4, or an allyl radical, or an indenyl radical, or an benzyl radical, or an cyclopentadienyl radical, or —NIR—NR?R? (hydrazido(-1), wherein R, R? and R? have the aforementioned meaning of R, or CH2SiMe3, pseudohalide, or silylamide —N(SiMe3)2, and R7 and R8 are H, C1 to C12 alkyl, C5 to C12 cycloalkyl or C6 to C10 aryl radicals.
    Type: Grant
    Filed: July 7, 2006
    Date of Patent: October 28, 2008
    Assignee: H.C. Starck GmbH
    Inventors: Knud Reuter, Jörg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kerstin Volz, Michael Pokoj, Thomas Ochs
  • Publication number: 20080038466
    Abstract: The present invention relates to special, novel tantalum and niobium compounds, the use thereof for the deposition of tantalum- or niobium-containing layers by means of chemical vapour deposition and the tantalum- or niobium-containing layers produced by this process.
    Type: Application
    Filed: August 9, 2007
    Publication date: February 14, 2008
    Applicant: H. C. Starck GmbH
    Inventors: Knud Reuter, Stephan Kirchmeyer, Daniel Gaess, Michael Pokoj, Jorg Sundermeyer, Wolfgang Stolz, Thomas Ochs, Kerstin Volz
  • Publication number: 20080016868
    Abstract: A method of reducing pollutants exhausted into the atmosphere from the combustion of fossil fuels. The disclosed process removes nitrogen from air for combustion, separates the solid combustion products from the gases and vapors and can capture the entire vapor/gas stream for sequestration leaving near-zero emissions. The invention produces up to three captured material streams. The first stream is contaminant-laden water containing SOx, residual NOx particulates and particulate-bound Hg and other trace contaminants. The second stream can be a low-volume flue gas stream containing N2 and O2 if CO2 purification is needed. The final product stream is a mixture comprising predominantly CO2 with smaller amounts of H2O, Ar, N2, O2, SOX, NOX, Hg, and other trace gases.
    Type: Application
    Filed: May 24, 2007
    Publication date: January 24, 2008
    Inventors: Thomas Ochs, Cathy Summers, Steve Gerdemann, Danylo Oryschyn, Paul Turner, Brian Patrick
  • Publication number: 20070160761
    Abstract: The present invention relates to specific novel tungsten and molybdenum compounds to the use thereof for the deposition of tungsten- or molybdenum-containing layers by means of chemical vapour deposition, and to the tungsten- or molybdenum-containing layers produced by this process.
    Type: Application
    Filed: January 4, 2007
    Publication date: July 12, 2007
    Applicant: H.C. Starck GmbH & Co. KG
    Inventors: Knud Reuter, Jorg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kestin Volz, Michael Pokoj, Thomas Ochs
  • Publication number: 20070042213
    Abstract: Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described: wherein M stands for Nb or Ta, R1 and R2 mutually independently denote optionally substituted C1 to C12 alkyl, C5 to C12 cycloalkyl, C6 to C10 aryl radicals, 1-alkenyl, 2-alkenyl, 3-alkenyl, triorganosilyl radicals —SiR3, or amino radicals NR2 where R?C1 to C4 alkyl, R3 denotes an optionally substituted C1 to C8 alkyl, C5 to C10 cycloalkyl, C6 to C14 aryl radical, or SiR3 or NR2, R4 denotes halogen from the group comprising Cl, Br, I, or NH—R5 where R5?optionally substituted C1 to C8 alkyl, C5 to C10 cycloalkyl or C6 to C10 aryl radical, or O—R6 where R6=optionally substituted C1 to C11 alkyl, C5 to C10 cycloalkyl, C6 to C10 aryl radical, or —SiR3, or BH4, or an optionally substituted allyl radical, or an indenyl radical, or an optionally substituted benzyl radical, or an optionally substituted cyclopentadienyl radical, or —NR—NR?R? (hydrazido(?1), wherein R, R? and R? h
    Type: Application
    Filed: July 7, 2006
    Publication date: February 22, 2007
    Applicant: H.C. STARCK
    Inventors: Knud Reuter, Jorg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kerstin Volz, Michael Pokoj, Thomas Ochs