Patents by Inventor Thomas Patrick Duffey
Thomas Patrick Duffey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11777271Abstract: Disclosed are methods of and apparatus for extending a useful lifetime of a laser discharge chamber in which a polarity of an electrode positioned at a fixed position within the chamber is caused to be positive with respect to the polarity of a second electrode defining a discharge gap with the first electrode and the first electrode is made of a material that forms an erosion resistant surface when the first electrode is used and an anode. Also disclosed is an arrangement in which a first electrode is positionable with respect a second electrode defining a discharge gap with the second electrode and the position of the first electrode controlled to maintain the width of the gap within a predetermined range.Type: GrantFiled: October 9, 2018Date of Patent: October 3, 2023Assignee: Cymer, LLCInventors: Thomas Patrick Duffey, Paul Christopher Melcher, Walter Dale Gillespie
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Patent number: 11768438Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: GrantFiled: October 21, 2022Date of Patent: September 26, 2023Assignee: Cymer, LLCInventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Patent number: 11686951Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: GrantFiled: April 26, 2021Date of Patent: June 27, 2023Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Publication number: 20230040812Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: ApplicationFiled: October 21, 2022Publication date: February 9, 2023Inventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Publication number: 20230017337Abstract: Systems, apparatuses, methods, and computer program products are provided for controlling a laser source that includes two laser discharge chambers. An example laser control system can include a first pulsed powertrain including a first independent circuit configured to generate a first resonant charging supply (RCS) output voltage. The first RCS output voltage can be configured to drive a first laser discharge chamber. The example laser control system can further include a second pulsed powertrain including a second independent circuit configured to generate a second RCS output voltage independent from the first RCS output voltage. The second RCS output voltage can be configured to drive a second laser discharge chamber independent from the first laser discharge chamber.Type: ApplicationFiled: December 11, 2020Publication date: January 19, 2023Inventors: Paul Christopher Melcher, Thomas Patrick Duffey, Walter Dale Gillespie
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Publication number: 20220404717Abstract: A method of generating a test for a radiation source for a lithographic apparatus comprises a step of receiving data corresponding to a plurality of firing patterns of the radiation source. The method further comprises the step of analyzing the data to determine parameters for configuring one or more further firing patterns for testing the radiation source. The parameters are determined such that a stability of the radiation source when executing the one or more further firing patterns configured using the parameters is substantially the same as, or within predefined bounds relative to, a stability of the radiation source when executing the plurality of firing patterns. Furthermore, parameters are determined such that a total duration of the one or more further firing patterns when executed by the radiation source will be less than a duration of the plurality of firing patterns when executed by the radiation source.Type: ApplicationFiled: October 16, 2020Publication date: December 22, 2022Inventors: Russell Allen Burdt, Thomas Patrick Duffey
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Patent number: 11526083Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: GrantFiled: March 1, 2019Date of Patent: December 13, 2022Assignee: Cymer, LLCInventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Publication number: 20220255288Abstract: Apparatus for and method of generating multiple laser beams using multiple laser chambers. The relative timing of the beams is controllable so they may, for example, be interleaved, may overlap, or be prevented from overlapping, or may occur in rapid sequence. The beams may have different spectral and power characteristics such as different wavelengths. Also disclosed is a system in which at least one of the multiple laser chambers is configured to generate radiation of two different wavelengths.Type: ApplicationFiled: May 15, 2020Publication date: August 11, 2022Inventors: Walter Dale Gillespie, Joshua Jon Thornes, Thomas Patrick Duffey, Eric Anders Mason, Rabin Paudel
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Publication number: 20220255286Abstract: A deep ultraviolet (DUV) optical system includes: an optical source system including: a plurality of optical oscillators; a beam combiner; and a beam control apparatus between the optical oscillators and the beam combiner. The beam combiner is configured to receive and direct light emitted from any of the optical oscillators toward a scanner apparatus as an exposure light beam, and the beam control apparatus is configured to determine whether the beam combiner receives light from a particular one of the optical oscillators. The DUV optical lithography system also includes a control system coupled to the optical source system, the control system configured to: determine whether a condition exists in the DUV optical system, and based on a determination that the condition exists, perform a calibration action in a subset of the optical oscillators.Type: ApplicationFiled: May 15, 2020Publication date: August 11, 2022Inventors: Yingbo Zhao, Walter Dale Gillespie, Joshua Jon Thornes, Thomas Patrick Duffey, Eric Anders Mason
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Publication number: 20210239998Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: ApplicationFiled: April 26, 2021Publication date: August 5, 2021Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Patent number: 11054665Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: GrantFiled: July 3, 2019Date of Patent: July 6, 2021Assignees: Cymer, LLC, ASML Netherlands B.V.Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Publication number: 20210111529Abstract: Disclosed are methods of and apparatus for extending a useful lifetime of a laser discharge chamber in which a polarity of an electrode positioned at a fixed position within the chamber is caused to be positive with respect to the polarity of a second electrode defining a discharge gap with the first electrode and the first electrode is made of a material that forms an erosion resistant surface when the first electrode is used and an anode. Also disclosed is an arrangement in which a first electrode is positionable with respect a second electrode defining a discharge gap with the second electrode and the position of the first electrode controlled to maintain the width of the gap within a predetermined range.Type: ApplicationFiled: October 9, 2018Publication date: April 15, 2021Inventors: Thomas Patrick Duffey, Paul Christopher Melcher, Walter Dale Gillespie
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Publication number: 20210018846Abstract: A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.Type: ApplicationFiled: March 1, 2019Publication date: January 21, 2021Inventors: Kevin Michael O'Brien, Thomas Patrick Duffey, Joshua Jon Thornes
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Patent number: 10852227Abstract: Disclosed is an apparatus for and method of measuring the concentration of F2 in the laser gas used in an excimer laser. Quartz Enhanced Photoacoustic Spectroscopy is used to obtain a direct measurement of F2 concentration quickly and using only a small sample volume.Type: GrantFiled: February 4, 2019Date of Patent: December 1, 2020Assignee: Cymer, LLCInventor: Thomas Patrick Duffey
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Patent number: 10845711Abstract: Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.Type: GrantFiled: June 13, 2019Date of Patent: November 24, 2020Assignee: Cymer, LLCInventors: Thomas Frederick Allen Bibby, Jr., Omar Zurita, Abhishek Subramanian, Thomas Patrick Duffey
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Publication number: 20190324286Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: ApplicationFiled: July 3, 2019Publication date: October 24, 2019Inventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Patent number: 10451890Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.Type: GrantFiled: January 16, 2017Date of Patent: October 22, 2019Assignee: Cymer, LLCInventors: Wilhelmus Patrick Elisabeth Maria op 't Root, Thomas Patrick Duffey, Herman Philip Godfried, Frank Everts, Joshua Jon Thornes, Brian Edward King
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Publication number: 20190310558Abstract: Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.Type: ApplicationFiled: June 13, 2019Publication date: October 10, 2019Inventors: Thomas Frederick Allen Bibby, JR., Omar Zurita, Abhishek Subramanian, Thomas Patrick Duffey
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Patent number: 10345714Abstract: Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations.Type: GrantFiled: June 12, 2017Date of Patent: July 9, 2019Assignee: Cymer, LLCInventors: Thomas Frederick Allen Bibby, Jr., Omar Zurita, Abhishek Subramanian, Thomas Patrick Duffey
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Publication number: 20190170635Abstract: Disclosed is an apparatus for and method of measuring the concentration of F2 in the laser gas used in an excimer laser. Quartz Enhanced Photoacoustic Spectroscopy is used to obtain a direct measurement of F2 concentration quickly and using only a small sample volume.Type: ApplicationFiled: February 4, 2019Publication date: June 6, 2019Inventor: Thomas Patrick Duffey