Patents by Inventor Thomas S. Toellner

Thomas S. Toellner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Redundantly constrained laminar structure as weak-link mechanisms
    Patent number: 6984335
    Abstract: Redundantly constrained laminar structures as weak-link mechanisms and a novel method for manufacturing the redundantly constrained laminar structures as weak-link mechanisms are provided. The method for producing the redundantly constrained laminar structures as weak-link mechanisms is carried out by lithographic techniques. A designed pattern is repeatedly chemically etched with a mask to produce a plurality of individual identical units. The units are stacked together to form the laminar structure and are secured together with fasteners. A high quality adhesive can be applied to the sides of the laminar structure to provide the mechanism equivalent to a single piece mechanism. The redundantly constrained laminar structures as weak-link mechanisms of the invention include a stack of a plurality of thin material structures.
    Type: Grant
    Filed: July 14, 2003
    Date of Patent: January 10, 2006
    Assignee: The University of Chicago
    Inventors: Deming Shu, Thomas S. Toellner, E. Ercan Alp
  • Redundantly constrained laminar structure as weak-link mechanisms
    Publication number: 20040013898
    Abstract: Redundantly constrained laminar structures as weak-link mechanisms and a novel method for manufacturing the redundantly constrained laminar structures as weak-link mechanisms are provided. The method for producing the redundantly constrained laminar structures as weak-link mechanisms is carried out by lithographic techniques. A designed pattern is repeatedly chemically etched with a mask to produce a plurality of individual identical units. The units are stacked together to form the laminar structure and are secured together with fasteners. A high quality adhesive can be applied to the sides of the laminar structure to provide the mechanism equivalent to a single piece mechanism. The redundantly constrained laminar structures as weak-link mechanisms of the invention include a stack of a plurality of thin material structures.
    Type: Application
    Filed: July 14, 2003
    Publication date: January 22, 2004
    Applicant: THE UNIVERSITY OF CHICAGO
    Inventors: Deming Shu, Thomas S. Toellner, E. Ercan Alp
  • Redundantly constrained laminar structure as weak-link mechanisms
    Patent number: 6607840
    Abstract: Redundantly constrained laminar structures as weak-link mechanisms and a novel method for manufacturing the redundantly constrained laminar structures as weak-link mechanisms are provided. The method for producing the redundantly constrained laminar structures as weak-link mechanisms is carried out by lithographic techniques. A designed pattern is repeatedly chemically etched with a mask to produce a plurality of individual identical units. The units are stacked together to form the laminar structure and are secured together with fasteners. A high quality adhesive can be applied to the sides of the laminar structure to provide the mechanism equivalent to a single piece mechanism. The redundantly constrained laminar structures as weak-link mechanisms of the invention include a stack of a plurality of thin material structures.
    Type: Grant
    Filed: August 15, 2001
    Date of Patent: August 19, 2003
    Assignee: The University of Chicago
    Inventors: Deming Shu, Thomas S. Toellner, E. Ercan Alp
  • Redundantly constrained laminar structure as weak-link mechanisms
    Publication number: 20020060200
    Abstract: Redundantly constrained laminar structures as weak-link mechanisms and a novel method for manufacturing the redundantly constrained laminar structures as weak-link mechanisms are provided. The method for producing the redundantly constrained laminar structures as weak-link mechanisms is carried out by lithographic techniques. A designed pattern is repeatedly chemically etched with a mask to produce a plurality of individual identical units. The units are stacked together to form the laminar structure and are secured together with fasteners. A high quality adhesive can be applied to the sides of the laminar structure to provide the mechanism equivalent to a single piece mechanism. The redundantly constrained laminar structures as weak-link mechanisms of the invention include a stack of a plurality of thin material structures.
    Type: Application
    Filed: August 15, 2001
    Publication date: May 23, 2002
    Applicant: THE UNIVERSITY OF CHICAGO
    Inventors: Deming Shu, Thomas S. Toellner, E. Ercan Alp