Patents by Inventor Thomas Scott Williams
Thomas Scott Williams has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240159005Abstract: A snow thrower, power tool, or method of operation may include detecting switch engagement at a single tool activation switch. A method may also include directing element rotation for a rotatable work element in response to detecting switch engagement. The method may further include directing wheel rotation for one or more drive wheels in response to detecting switch engagement.Type: ApplicationFiled: November 7, 2023Publication date: May 16, 2024Inventors: Thomas Kolangayil James, Michael Scott Bailey, Shuai Shao, Christian Rudoph Williams
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Publication number: 20240079929Abstract: A fluid moving apparatus includes an electric motor having a rotor and a stator and a propeller. The rotor rotates relative to the stator on an axis to generate a rotational output. The rotational output is provided to the propeller to power the marine propulsion apparatus. The stator includes one or more coils configured to power rotation of the rotor. The one or more coils extend circumferentially around and can be coaxial on the axis. A portion of a housing of the motor extends into the aquatic environment to facilitate heat dissipation.Type: ApplicationFiled: November 3, 2023Publication date: March 7, 2024Inventors: Thomas F. Janecek, Jeremy Scott Reynolds, Robert J. Lind, Timothy S. Roman, Tyler K. Williams
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Publication number: 20230049702Abstract: Plasma applications are disclosed that operate with argon and other molecular gases at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species. The plasma apparatus and the enclosure that contains the plasma apparatus and the substrate are substantially free of particles, so that the substrate does not become contaminated with particles during processing. The plasma is developed through capacitive discharge without streamers or micro-arcs. The techniques can be employed to remove organic materials from a substrate, thereby cleaning the substrate; to activate the surfaces of materials, thereby enhancing bonding between the material and a second material; to etch thin films of materials from a substrate; and to deposit thin films and coatings onto a substrate; all of which processes are carried out without contaminating the surface of the substrate with substantial numbers of particles.Type: ApplicationFiled: September 7, 2022Publication date: February 16, 2023Applicant: Surfx Technologies LLCInventors: Thomas Scott Williams, Siu Fai Cheng, Robert F. Hicks
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Patent number: 11518082Abstract: Plasma applications are disclosed that operate with argon or helium at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species in the effluent stream. Laminar gas flow is developed prior to forming the plasma and at least one of the electrodes can be heated which enables operation at conditions where the argon or helium plasma would otherwise be unstable and either extinguish, or transition into an arc. The techniques can be employed to clean and activate a metal substrate, including removal of oxidation, thereby enhancing the bonding of at least one other material to the metal.Type: GrantFiled: September 10, 2020Date of Patent: December 6, 2022Assignee: Surfx Technologies LLCInventors: Siu Fai Cheng, Thomas Scott Williams, Toby Desmond Oste, Sarkis Minas Keshishian, Robert F. Hicks
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Patent number: 10923331Abstract: Atmospheric pressure plasma devices and methods for preparing the surfaces of fasteners, e.g. nutplates, for adhesive bonding are disclosed. A device supports a fastener to dispose a contact surface of the fastener to receive an atmospheric pressure plasma flow, thereby activating the contact surface to be bonded. A spacer is used to properly support the fastener to receive the plasma treatment. A spacer can comprise beveled edges of a grounded enclosure which electrically connects the contact surface of the fastener to the plasma generator where plasma is formed in a gas flow along the electrodes. Alternately, a spacer can comprise a plurality of standoffs on a showerhead port comprising a ground electrode of the plasma generator where plasma is formed in a gas flow across the electrodes.Type: GrantFiled: October 23, 2017Date of Patent: February 16, 2021Assignee: Surfx Technologies LLCInventors: Thomas Scott Williams, Quoc Dinh Truong, Robert F. Hicks
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Patent number: 10827601Abstract: A handheld plasma tool for controlled application of low temperature atmospheric pressure plasma to material surfaces, e.g. to enhance bonding and or cleaning. The handheld plasma tool can include a hand grip, on/off trigger, display, indicator lights, indexing pin, marking device, cable connections for gas supply and electrical power, and a plasma head for generating at least one reactive gas species at a low temperature. The handheld plasma tool can employ a rotatable clamp for treating backside surfaces. The handheld plasma tool can include motorized wheels to scan over a large area at a controlled speed. Other optional nozzles can also be employed for specialized applications.Type: GrantFiled: May 3, 2017Date of Patent: November 3, 2020Assignee: Surfx Technologies LLCInventors: Thomas Scott Williams, George Suarez, Mikhail Grigoriev, Robert F. Hicks
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Patent number: 10800092Abstract: Plasma applications are disclosed that operate with argon or helium at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species in the effluent stream. Laminar gas flow is developed prior to forming the plasma and at least one of the electrodes can be heated which enables operation at conditions where the argon or helium plasma would otherwise be unstable and either extinguish, or transition into an arc. The techniques can be employed to clean and activate a metal substrate, including removal of oxidation, thereby enhancing the bonding of at least one other material to the metal.Type: GrantFiled: July 23, 2018Date of Patent: October 13, 2020Assignee: Surfx Technologies LLCInventors: Siu Fai Cheng, Thomas Scott Williams, Toby Desmond Oste, Sarkis Minas Keshishian, Robert F. Hicks
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Publication number: 20200152430Abstract: Plasma applications are disclosed that operate with argon and other molecular gases at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species. The plasma apparatus and the enclosure that contains the plasma apparatus and the substrate are substantially free of particles, so that the substrate does not become contaminated with particles during processing. The plasma is developed through capacitive discharge without streamers or micro-arcs. The techniques can be employed to remove organic materials from a substrate, thereby cleaning the substrate; to activate the surfaces of materials, thereby enhancing bonding between the material and a second material; to etch thin films of materials from a substrate; and to deposit thin films and coatings onto a substrate; all of which processes are carried out without contaminating the surface of the substrate with substantial numbers of particles.Type: ApplicationFiled: September 4, 2019Publication date: May 14, 2020Applicant: Surfx Technologies LLCInventors: Thomas Scott Williams, Siu Fai Cheng, Robert F. Hicks
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Publication number: 20190127841Abstract: Nano-multilayered coatings and fabrication methods are disclosed. By exemplary disclosure, a nano-multilayered coating fabricated from sequential depositions on a substrate from an atmospheric-plasma chemical vapor deposition (AP-CVD) source is disclosed. The coating includes a vapor precursor fed to the deposition source, an amorphous oxide layer deposited from the deposition source onto the substrate, and a nanoparticle layer deposited onto the substrate on top of the amorphous oxide layer. A nano-multilayered coating of the amorphous oxide and nanoparticle layers is fabricated from alternating deposition coatings of the amorphous oxide layer and the nanoparticle layer onto the substrate two or more times.Type: ApplicationFiled: September 18, 2018Publication date: May 2, 2019Applicant: Nanocoatings, Inc.Inventors: Francis M. Kustas, Andrew Benjamin Kustas, Thomas Scott Williams, Robert Hicks
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Patent number: 10032609Abstract: Plasma applications are disclosed that operate with helium or argon at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species in the effluent stream. Laminar gas flow is developed prior to forming the plasma and at least one of the electrodes is heated which enables operation at conditions where the helium plasma would otherwise be unstable and either extinguish, or transition into an arc. The techniques can be employed to remove organic materials from a substrate, thereby cleaning the substrate; activate the surfaces of materials thereby enhancing adhesion between the material and an adhesive; kill microorganisms on a surface, thereby sterilizing the substrate; etches thin films of materials from a substrate, and deposit thin films and coatings onto a substrate.Type: GrantFiled: June 29, 2016Date of Patent: July 24, 2018Assignee: Surfx Technologies LLCInventors: Siu Fai Cheng, Thomas Scott Williams, Toby Desmond Oste, Sarkis Minas Keshishian, Robert F. Hicks
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Patent number: 9406485Abstract: An argon and helium plasma apparatus and method are disclosed that operate with argon or helium at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species in the effluent stream. Laminar gas flow is developed prior to forming the plasma and at least one of the electrodes is heated which enables operation at conditions where the argon or helium plasma would otherwise be unstable and either extinguish, or transition into an arc. The apparatus and method can be employed to remove organic materials from a substrate, thereby cleaning the substrate; activate the surfaces of materials thereby enhancing adhesion between the material and an adhesive; kill microorganisms on a surface, thereby sterilizing the substrate; etches thin films of materials from a substrate, and deposit thin films and coatings onto a substrate.Type: GrantFiled: December 18, 2014Date of Patent: August 2, 2016Assignee: Surfx Technologies LLCInventors: Siu Fai Cheng, Thomas Scott Williams, Toby Desmond Oste, Sarkis Minas Keshishian, Robert F. Hicks