Patents by Inventor Thomas Theeuwes

Thomas Theeuwes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of determining focus corrections, lithographic processing cell and device manufacturing method
    Patent number: 9360770
    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes, Antoine Gaston Marie Kiers
  • Method of calibrating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
    Patent number: 9177219
    Abstract: A lithographic apparatus is calibrated by reference to a primary reference substrate. Using an apparatus which need not be the same as the one being calibrated, there is obtained an apparatus-specific fingerprint of the primary reference substrate. Using the same set-up there is then obtained an apparatus-specific fingerprint of a secondary reference substrate. The apparatus-specific fingerprint of the primary reference substrate is subtracted from the apparatus-specific fingerprint of the secondary reference substrate to obtain and store an apparatus-independent fingerprint of the secondary reference substrate. The secondary reference substrate and stored apparatus-independent fingerprint are subsequently used together in place of the primary reference substrate as a reference for the calibration of the lithographic apparatus to be calibrated.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: November 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Wim Tjibbo Tel, Wouter Onno Pril, Thomas Theeuwes, Alexander Viktorovych Padiy
  • Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method
    Publication number: 20150085267
    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
    Type: Application
    Filed: December 5, 2014
    Publication date: March 26, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arend Johannes KISTEMAN, Wim Tjibbo TEL, Thomas THEEUWES, Antoine Gaston Marie KIERS
  • Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method
    Publication number: 20130050668
    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
    Type: Application
    Filed: August 10, 2012
    Publication date: February 28, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes, Antoine Gaston Marie Kiers
  • Method Of Calibrating A Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product
    Publication number: 20120008127
    Abstract: A lithographic apparatus is calibrated by reference to a primary reference substrate. Using an apparatus which need not be the same as the one being calibrated, there is obtained an apparatus-specific fingerprint of the primary reference substrate. Using the same set-up there is then obtained an apparatus-specific fingerprint of a secondary reference substrate. The apparatus-specific fingerprint of the primary reference substrate is subtracted from the apparatus-specific fingerprint of the secondary reference substrate to obtain and store an apparatus-independent fingerprint of the secondary reference substrate. The secondary reference substrate and stored apparatus-independent fingerprint are subsequently used together in place of the primary reference substrate as a reference for the calibration of the lithographic apparatus to be calibrated.
    Type: Application
    Filed: June 27, 2011
    Publication date: January 12, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Wim Tjibbo TEL, Wouter Onno Pril, Thomas Theeuwes, Alexander Viktorovych Padiy