Patents by Inventor Thompson Huang

Thompson Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240153947
    Abstract: Embodiments of the disclosure are in the field of advanced integrated circuit structure fabrication and, in particular, 10 nanometer node and smaller integrated circuit structure fabrication and the resulting structures. In an example, an integrated circuit structure includes a first isolation structure over a first end of a fin. A gate structure is over the fin and is spaced apart from the first isolation structure along the direction. A second isolation structure is over a second end of the fin, the second end opposite the first end. The second isolation structure is spaced apart from the gate structure. The first isolation structure and the second isolation structure both comprise a first dielectric material laterally surrounding a recessed second dielectric material distinct from the first dielectric material. The recessed second dielectric material laterally surrounds at least a portion of a third dielectric material different from the first and second dielectric materials.
    Type: Application
    Filed: January 12, 2024
    Publication date: May 9, 2024
    Inventors: Byron HO, Chun-Kuo HUANG, Erica THOMPSON, Jeanne LUCE, Michael L. HATTENDORF, Christopher P. AUTH, Ebony L. MAYS
  • Patent number: 11961838
    Abstract: Embodiments of the disclosure are in the field of advanced integrated circuit structure fabrication and, in particular, 10 nanometer node and smaller integrated circuit structure fabrication and the resulting structures. In an example, an integrated circuit structure includes a first isolation structure over a first end of a fin. A gate structure is over the fin and is spaced apart from the first isolation structure along the direction. A second isolation structure is over a second end of the fin, the second end opposite the first end. The second isolation structure is spaced apart from the gate structure. The first isolation structure and the second isolation structure both comprise a first dielectric material laterally surrounding a recessed second dielectric material distinct from the first dielectric material. The recessed second dielectric material laterally surrounds at least a portion of a third dielectric material different from the first and second dielectric materials.
    Type: Grant
    Filed: May 3, 2022
    Date of Patent: April 16, 2024
    Assignee: Intel Corporation
    Inventors: Byron Ho, Chun-Kuo Huang, Erica Thompson, Jeanne Luce, Michael L. Hattendorf, Christopher P. Auth, Ebony L. Mays
  • Publication number: 20130330062
    Abstract: A movie is automatically created from a music track and a series of images such that placement of the images is synchronized to the music. The minimum image display time is automatically determined by the pace of the music. The pace can be determined by the beats per minute for the music. Two procedures are used for identifying beats, corresponding to hard and soft beats. The best transition points for the images in the movie are automatically determined. When the music has a relatively long quiet portion, the number of images during the quiet portion is adjusted so that each image does not exceed the maximum duration, and the duration of images during the quiet portion is approximately equal.
    Type: Application
    Filed: June 6, 2013
    Publication date: December 12, 2013
    Inventors: Alexander John Meikle, Thompson Huang