Patents by Inventor Thorsten Rassel
Thorsten Rassel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9513562Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.Type: GrantFiled: September 29, 2014Date of Patent: December 6, 2016Assignee: Carl Zeiss SMT GmbHInventors: Juergen Fischer, Armin Schoeppach, Matthias Orth, Norbert Muehlberger, Thorsten Rassel, Armin Werber, Juergen Huber
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Patent number: 9341807Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.Type: GrantFiled: September 12, 2014Date of Patent: May 17, 2016Assignee: Carl Zeiss SMT GmbHInventors: Norbert Muehlberger, Thorsten Rassel, Armin Schoeppach, Juergen Fischer, Matthias Orth
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Patent number: 9298101Abstract: A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.Type: GrantFiled: April 27, 2015Date of Patent: March 29, 2016Assignee: Carl Zeiss SMT GmbHInventors: Thorsten Rassel, Markus Hauf
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Publication number: 20150227053Abstract: A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.Type: ApplicationFiled: April 27, 2015Publication date: August 13, 2015Inventors: Thorsten Rassel, Markus Hauf
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Patent number: 9041910Abstract: A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.Type: GrantFiled: January 22, 2013Date of Patent: May 26, 2015Assignee: Carl Zeiss SMT GmbHInventors: Thorsten Rassel, Markus Hauf
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Publication number: 20150015864Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.Type: ApplicationFiled: September 29, 2014Publication date: January 15, 2015Inventors: Juergen Fischer, Armin Schoeppach, Matthias Orth, Norbert Muehlberger, Thorsten Rassel, Armin Werber, Juergen Huber
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Publication number: 20150009557Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.Type: ApplicationFiled: September 12, 2014Publication date: January 8, 2015Inventors: Norbert Muehlberger, Thorsten Rassel, Armin Schoeppach, Juergen Fischer, Matthias Orth
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Patent number: 8885143Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.Type: GrantFiled: March 24, 2011Date of Patent: November 11, 2014Assignee: Carl Zeiss SMT GmbHInventors: Juergen Fischer, Armin Schoeppach, Matthias Orth, Norbert Muehlberger, Thorsten Rassel, Armin Werber, Juergen Huber
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Patent number: 8854603Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.Type: GrantFiled: May 19, 2011Date of Patent: October 7, 2014Assignee: Carl Zeiss SMT GmbHInventors: Norbert Muehlberger, Thorsten Rassel, Armin Schoeppach, Juergen Fischer, Matthias Orth
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Patent number: 8810934Abstract: The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.Type: GrantFiled: March 17, 2011Date of Patent: August 19, 2014Assignee: Carl Zeiss SMT GmbHInventors: Karl-Eugen Aubele, Erich Merz, Thorsten Rassel
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Patent number: 8514371Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: April 28, 2011Date of Patent: August 20, 2013Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Publication number: 20110267596Abstract: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.Type: ApplicationFiled: May 19, 2011Publication date: November 3, 2011Applicant: CARL ZEISS SMT GMBHInventors: Norbert Muehlberger, Thorsten Rassel, Armin Schoeppach, Juergen Fischer, Matthias Orth
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Publication number: 20110235005Abstract: The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.Type: ApplicationFiled: March 17, 2011Publication date: September 29, 2011Applicant: CARL ZEISS SMT GMBHInventors: Karl-Eugen Aubele, Erich Merz, Thorsten Rassel
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Publication number: 20110235012Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.Type: ApplicationFiled: March 24, 2011Publication date: September 29, 2011Applicant: CARL ZEISS SMT GMBHInventors: Juergen Fischer, Armin Schoeppach, Matthias Orth, Norbert Muehlberger, Thorsten Rassel, Armin Werber, Juergen Huber
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Publication number: 20110199597Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: ApplicationFiled: April 28, 2011Publication date: August 18, 2011Applicant: CARL ZEISS SMT GMBHInventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Patent number: 7961294Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: October 8, 2008Date of Patent: June 14, 2011Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Patent number: 7710542Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: November 7, 2007Date of Patent: May 4, 2010Assignee: Carl Zeiss SMT AGInventors: Wolfgang Hummel, Jürgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Patent number: 7548387Abstract: An optical imaging device (1a) has at least one optical element (2) which is provided with an outer frame (1), an inner ring (4) in which the optical element (2) is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring (4) to the outer frame (1) is provided in at least one degree of freedom by means of a support (5) arranged between the inner ring (4) and the outer frame (1). The manipulator instrument has at least one actuator (8), the setting forces and/or bearing forces of which act contactlessly on the inner ring (4), for mounting and/or positioning and/or manipulating the inner ring (4) relative to the outer frame (1).Type: GrantFiled: April 6, 2006Date of Patent: June 16, 2009Assignee: Carl Zeiss SMT AGInventors: Thorsten Rassel, Erich Merz, Martin Mahlmann
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Publication number: 20090141258Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: ApplicationFiled: January 30, 2009Publication date: June 4, 2009Applicant: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Publication number: 20090040487Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: ApplicationFiled: October 8, 2008Publication date: February 12, 2009Applicant: CARL ZEISS SMT AGInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schongart, Markus Neumaier, Barbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel