Abstract: This invention provides a semiconductor device and a manufacturing method thereof. The semiconductor device comprises a substrate; a bitline, suspended on the substrate; a bottom electrode, wrapped around the bitline; a resistive layer, wrapped around the bottom electrode; a top electrode, wrapped around the resistive layer; and a wordline electrode, disposed around the top electrode and connected to the top electrode.

Abstract: This invention provides a semiconductor device and a manufacturing method thereof. The semiconductor device comprises a substrate; a bitline, suspended on the substrate; a bottom electrode, wrapped around the bitline; a resistive layer, wrapped around the bottom electrode; a top electrode, wrapped around the resistive layer; and a wordline electrode, disposed around the top electrode and connected to the top electrode.

Abstract: The present disclosure relates to an image sensor and a method of forming the same, and an image forming device. An image sensor includes: a substrate in which a photosensitive element region is formed; and a first light concentrating portion formed in a peripheral region of the photosensitive element region, wherein the first light concentrating portion is formed such that to the light entering the peripheral region of the photosensitive element is refracted toward the photosensitive element region through the light concentrating portion. The image sensor and method for forming an image sensor of the present disclosure allow more light to enter the area of the photosensitive element in the substrate, thereby improving the light sensitivity of the image sensor.

Abstract: The present disclosure relates to an image sensor comprising: a photodiode; a color filter located above the photodiode; and a converging lens located between the photodiode and the color filter, wherein the converging lens is configured to converge light onto the photodiode. The image sensor can make the configuration of the image sensor more compact while preventing crosstalk of light between pixel cells.

Abstract: A back-side illumination CMOS image sensor and a method forming it are described. A first refraction layer, a reflection layer, and a second refraction layer are deposited in the dielectric layer around the isolation trench between pixels in the image sensor. The refractive index of the second refraction layer is smaller than the refractive index of a dielectric layer to reduce the refraction of light due to total reflection. And a small amount of light refracted by the second refraction layer is reflected back to the second refraction layer the reflection layer, and thus this part of light is collected to a photodiode region to prevent the light cross-talk to an adjacent photodiode. More photons are absorbed resulting in higher quantum conversion efficiency.

Abstract: A grading system and method for grading a user solution to a computing assignment are presented. The method includes receiving a program code submitted by a user, wherein the received program code is the user solution to the computing assignment; activating at least one code processing engine, wherein each code processing engine is a secured isolated execution environment; executing the program code in the at least one activated code processing engine to produce an answer; determining a grade for the answer based on an expected answer and an approximate grading function, wherein the approximate grading function is determined based on a type of the computing assignment; and returning the grade to the user.

Abstract: A grading system and method for grading a user solution to a computing assignment are presented. The method includes receiving a program code submitted by a user, wherein the received program code is the user solution to the computing assignment; activating at least one code processing engine, wherein each code processing engine is a secured isolated execution environment; executing the program code in the at least one activated code processing engine to produce an answer; determining a grade for the answer based on an expected answer and an approximate grading function, wherein the approximate grading function is determined based on a type of the computing assignment; and returning the grade to the user.

Abstract: An exposure method and an exposure device are provided. An exemplary exposure device includes a stage, a first clamp holder, a second clamp holder, an optical projection unit, a first alignment detection unit, and/or a second alignment detection unit. The stage includes a first region and a second region. The first clamp holder is located in the first region and adapted for holding a first substrate, and the second clamp holder is located in the second region and adapted for holding a second substrate. The optical projection unit is located above the stage and adapted for exposure of the first substrate or the second substrate. The first alignment detection unit is adapted for detecting alignment marks of the first substrate. The second alignment detection unit is adapted for detecting alignment marks of the second substrate. The exposure device can accurately position the stage and improve production yield.

Abstract: The present disclosure provides a lithography machine and a scanning and exposing method thereof. According to the scanning and exposing method, the scanning and exposing process for a whole wafer includes two alternately circulated motions: a scanning and exposing motion and a stepping motion; and the scanning and exposing motion is a sinusoidal motion rather than a rapid-acceleration uniform-speed rapid-deceleration scanning and exposing motion in the conventional techniques. During the scanning of a single exposure shot, it may begin to scan the exposure shot once a wafer stage and a reticle stage begin to accelerate from zero speed. And the scanning and exposing may not end until the speeds of the wafer stage and the reticle decrease to zero. Therefore, the effective time of the scanning and exposing in the scanning and exposing motion is greatly increased and the production efficiency of the wafer is improved.

Abstract: Systems and methods are provided that presents interesting local content to users at times when the content is most actionable and engaging without the user explicitly entering a search term or expressing intent. In one implementation, the system uses contextual signals about a user to rank local content. Signals may include, for example, who they (one or more users) are, what kinds of places they like, where they are, how familiar they are with the area, the time of day, where the user's friends have been nearby, among other information related to the one or more users. A system may be provided that uses contextual rules and machine learning to target content to users. The system learns which of these contextual signals are most important and alters its ranking function to optimize user engagement in terms of conversions.