Patents by Inventor Tim Mahatdejkul

Tim Mahatdejkul has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection
    Patent number: 11366307
    Abstract: A defect detection system includes a programmable and reconfigurable digital micro-mirror device (DMD) and at least one optical element. The DMD includes a micro-mirror array with a plurality of micro-mirrors adjustable to achieve a first deflection state or a second deflection state. The DMD is configured to receive incoming light and reflect a first portion of the incoming light into a first light channel corresponding to the first deflection state and a second portion of the incoming light into a second light channel corresponding to the second deflection state. The at least one optical element is optically coupled to the first light channel and the second light channel. The at least one optical element is configured to deflect the first portion of the incoming light to a first imaging lens and a second portion of the incoming light to a second imaging lens.
    Type: Grant
    Filed: August 27, 2020
    Date of Patent: June 21, 2022
    Assignee: KLA Corporation
    Inventors: Hongxing Yuan, Tim Mahatdejkul, Bret Whiteside
  • Programmable and Reconfigurable Mask with MEMS Micro-Mirror Array for Defect Detection
    Publication number: 20220066195
    Abstract: A defect detection system includes a programmable and reconfigurable digital micro-mirror device (DMD) and at least one optical element. The DMD includes a micro-mirror array with a plurality of micro-mirrors adjustable to achieve a first deflection state or a second deflection state. The DMD is configured to receive incoming light and reflect a first portion of the incoming light into a first light channel corresponding to the first deflection state and a second portion of the incoming light into a second light channel corresponding to the second deflection state. The at least one optical element is optically coupled to the first light channel and the second light channel. The at least one optical element is configured to deflect the first portion of the incoming light to a first imaging lens and a second portion of the incoming light to a second imaging lens.
    Type: Application
    Filed: August 27, 2020
    Publication date: March 3, 2022
    Inventors: Hongxing Yuan, Tim Mahatdejkul, Bret Whiteside
  • Haze and defect distribution and aperture configuration in surface metrology inspectors
    Patent number: 10088345
    Abstract: The present disclosure is directed to a method for designing an aperture in a mask for inspecting a wafer. The method includes the steps of scanning a collection plane of the wafer at a plurality of points and collecting data for at least a part of the wafer. The method also includes the step of mapping the data. A further step of the method includes configuring the aperture based on the mapped data.
    Type: Grant
    Filed: December 4, 2012
    Date of Patent: October 2, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Chuanyong Huang, Raymond Chu, Gordana Neskovic, Dieter Wilk, Christian Wolters, Tim Mahatdejkul