Abstract: A method of manufacturing a photomask for the production of dual depth features on substrates, and the photomask so manufactured, wherein the method of manufacturing the photomask is comprised of the steps of: (1) coating a substrate which transmits at least two selected wavelengths with: a) an optical filter material which prevents the transmission of at least one of the wavelengths, b) an opaque masking material, and c) a dual tone photoresist; (2) using a single mastering tool to selectively expose areas of the coated substrate to one of the wavelengths; (3) developing the photoresist; (4) etching the exposed masking material and optical filter material; (5) exposing the remaining coated substrate; (6) developing the remaining photoresist; (7) etching the exposed surface; and (8) stripping away the remaining photoresist.

Abstract: An improved thin magnetic layer which is suitable for use in magnetic head pole piece applications and a method of manufacture therefor are disclosed. The magnetic layer is a single phase composition of NiFe and Al.sub.2 O.sub.3. The magnetic layer is manufactured by cosputtering from a single, two phase sputtering target, or from separate NiFe and Al.sub.2 O.sub.3 sputtering targets. The single phase composition results in increased abrasion resistance without degradation of the magnetic properties of the layer.

Abstract: Use of a rare gas in combination with oxygen or nitrogen to sputter etch unreacted platinum after formation of a platinum silicide contact structure for the formation of a Schottky Barrier diode in a silicon semiconductor substrate.