Patents by Inventor Ting-Ming Huang
Ting-Ming Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12002684Abstract: A method for CMP includes following operations. A metal stack is received. The metal layer stack includes at least a first metal layer and a second metal layer, and a top surface of the first metal layer and a top surface of the second metal layer are exposed. A protecting layer is formed over the second metal layer. A portion of the first metal layer is etched. The protecting layer protects the second metal layer during the etching of the portion of the first metal layer. A top surface of the etched first metal layer is lower than a top surface of the protecting layer. The protecting layer is removed from the second metal layer.Type: GrantFiled: November 21, 2022Date of Patent: June 4, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Ji Cui, Fu-Ming Huang, Ting-Kui Chang, Tang-Kuei Chang, Chun-Chieh Lin, Wei-Wei Liang, Liang-Guang Chen, Kei-Wei Chen, Hung Yen, Ting-Hsun Chang, Chi-Hsiang Shen, Li-Chieh Wu, Chi-Jen Liu
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Patent number: 11992322Abstract: A heart rhythm detection method and system by using radar sensor is capable of collecting an original signal using a radar sensor toward at least one subject, and converting the original signal to a two dimensional image information (i.e., spectrogram) using the concept of image vision. Then, the neural network automatically learns which heartbeat frequency should be focused on and which heartbeat frequency should be filtered out in the two dimensional image information through deep learning, so that the heartbeat frequencies can be extracted effectively.Type: GrantFiled: March 30, 2021Date of Patent: May 28, 2024Assignee: IONETWORKS INC.Inventors: Jing-Ming Guo, Ting Lin, Chia-Fen Chang, Jeffry Susanto, Yi-Hsiang Lin, Po-Cheng Huang, Yu-Wen Wei
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Patent number: 11955397Abstract: A semiconductor structure is provided. The semiconductor structure includes a substrate, a channel layer, a barrier layer, a compound semiconductor layer, a gate electrode, and a stack of dielectric layers. The channel layer is disposed on the substrate. The barrier layer is disposed on the channel layer. The compound semiconductor layer is disposed on the barrier layer. The gate electrode is disposed on the compound semiconductor layer. The stack of dielectric layers is disposed on the gate electrode. The stack of dielectric layers includes layers having different etching rates.Type: GrantFiled: November 9, 2020Date of Patent: April 9, 2024Assignee: Vanguard International Semiconductor CorporationInventors: Shin-Cheng Lin, Cheng-Wei Chou, Ting-En Hsieh, Yi-Han Huang, Kwang-Ming Lin, Yung-Fong Lin, Cheng-Tao Chou, Chi-Fu Lee, Chia-Lin Chen, Shu-Wen Chang
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Patent number: 10209161Abstract: A measuring method for an optical element for obtaining a plurality of measurement errors of the optical element is disclosed, which comprises steps of irradiating a laser ray to an overall portion of the optical element, wherein the optical element is supported as one of a horizontal state and a vertical state; rotating continuously the optical element with 360 degrees to reflect the laser ray to obtain a reflected light wavefront picture from the reflected laser ray; analyzing the reflected light wavefront picture to obtain a plurality of aberration characteristics information, respectively, each being one of a sine and a cosine wave functions of a wavefront error for each of the plurality of specified rotation angles; analyzing a plurality of interference factors each for the plurality of measurement errors on each of the plurality of aberration characteristics information, respectively; calculating and extracting a plurality of classified aberration characteristics information for each of the plurality ofType: GrantFiled: July 3, 2014Date of Patent: February 19, 2019Assignee: NATIONAL APPLIED RESEARCH LABORATORIESInventors: Shenq-Tsong Chang, Wei-Cheng Lin, Ting-Ming Huang
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Patent number: 10025058Abstract: A gap compensation mechanism capable of self adaptive posture adjustment is disclosed, which comprises a base seat, having at least a fixation portion disposed thereon, the fixation portion having a flow path area disposed peripheral thereto; at least an adjustment unit, sleeved onto an outer rim of the fixation portion; and a filler, being filled within the flow path area. As such, a workpiece to be fixed may be disposed on a face of an adjustment unit. Further, the adjustment unit provides at least three freedoms for the altitude and two axial inclinations for self adaptively compensating a gap with any geometrical shapes and thus further adjusting the posture of the combined workpiece. After all the adjustments, a filler is filled to reinforce the structure and finally a fixation unit is employed for locking and fixing.Type: GrantFiled: October 13, 2014Date of Patent: July 17, 2018Assignee: NATIONAL APPLIED RESERACH LABORATORIESInventors: Wei-Cheng Lin, Shenq-Tsong Chang, Hsu-Pin Pan, Ting-Ming Huang, Shih-Feng Tseng
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Publication number: 20160103293Abstract: A gap compensation mechanism capable of self adaptive posture adjustment is disclosed, which comprises a base seat, having at least a fixation portion disposed thereon, the fixation portion having a flow path area disposed peripheral thereto; at least an adjustment unit, sleeved onto an outer rim of the fixation portion; and a filler, being filled within the flow path area. As such, a workpiece to be fixed may be disposed on a face of an adjustment unit. Further, the adjustment unit provides at least three freedoms for the altitude and two axial inclinations for self adaptively compensating a gap with any geometrical shapes and thus further adjusting the posture of the combined workpiece. After all the adjustments, a filler is filled to reinforce the structure and finally a fixation unit is employed for locking and fixing.Type: ApplicationFiled: October 13, 2014Publication date: April 14, 2016Inventors: Wei-Cheng Lin, Shenq-Tsong Chang, Hsu-Pin Pan, Ting-Ming Huang, Shih-Feng Tseng
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Publication number: 20160061671Abstract: An optical element stress aberration calculation system and method, where a stress distribution is obtained through a stress analysis and a light tracking technologies, and then a stress distribution generated by incident lights with different viewing angles is calculated, so that a stress aberration error is reduced.Type: ApplicationFiled: August 27, 2014Publication date: March 3, 2016Applicant: NATIONAL APPLIED RESEARCH LABORATORIESInventors: Ming-Ying HSU, Shenq-Tsong CHANG, Ting-Ming HUANG
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Publication number: 20160003706Abstract: A measuring method for an optical element for obtaining a plurality of measurement errors of the optical element is disclosed, which comprises steps of irradiating a laser ray to an overall portion of the optical element, wherein the optical element is supported as one of a horizontal state and a vertical state; rotating continuously the optical element with 360 degrees to reflect the laser ray to obtain a reflected light wavefront picture from the reflected laser ray; analyzing the reflected light wavefront picture to obtain a plurality of aberration characteristics information, respectively, each being one of a sine and a cosine wave functions of a wavefront error for each of the plurality of specified rotation angles; analyzing a plurality of interference factors each for the plurality of measurement errors on each of the plurality of aberration characteristics information, respectively; calculating and extracting a plurality of classified aberration characteristics information for each of the plurality ofType: ApplicationFiled: July 3, 2014Publication date: January 7, 2016Applicant: NATIONAL APPLIED RESEARCH LABORATORIESInventors: Shenq-Tsong CHANG, Wei-Cheng LIN, Ting-Ming HUANG
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Patent number: 8823927Abstract: The present invention discloses a system and method for nondestructively measuring the refractive index and the central thickness of a lens. The system comprises a radius measurement module arranged for measuring the curvature radius of the first surface of the lens; a focus measurement module arranged for measuring the best focus distance of the first surface of the lens; and a calculation module arranged for performing the first or the second calculation process according to the lensmaker's formula. Wherein, when the central thickness is given, the calculation module performs the first calculation process according to the curvature radius, the best focus distance and the central thickness to calculate the refractive index. On the contrary, when the refractive index is given, the calculation module performs the second calculation process according to the curvature radius, the best focus distance and the refractive index to calculate the central thickness.Type: GrantFiled: May 10, 2012Date of Patent: September 2, 2014Assignee: National Applied Research LaboratoriesInventors: Chia-Yen Chan, Shenq-Tsong Chang, Ting-Ming Huang, Po-Han Huang
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Publication number: 20130301038Abstract: The present invention discloses a system and method for nondestructively measuring the refractive index and the central thickness of a lens. The system comprises a radius measurement module arranged for measuring the curvature radius of the first surface of the lens; a focus measurement module arranged for measuring the best focus distance of the first surface of the lens; and a calculation module arranged for performing the first or the second calculation process according to the lensmaker's formula. Wherein, when the central thickness is given, the calculation module performs the first calculation process according to the curvature radius, the best focus distance and the central thickness to calculate the refractive index. On the contrary, when the refractive index is given, the calculation module performs the second calculation process according to the curvature radius, the best focus distance and the refractive index to calculate the central thickness.Type: ApplicationFiled: May 10, 2012Publication date: November 14, 2013Applicant: NATIONAL APPLIED RESEARCH LABORATORIESInventors: Chia-Yen Chan, Shenq-Tsong Chang, Ting-Ming Huang, Po-Han Huang
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Patent number: 7580122Abstract: A lens inspection device and method are provided. The lens inspection method includes the steps of providing a collimating light beam, polarizing the collimating light beam by a polarizer to produce a polarized light beam, deflecting the polarized light beam by a lens to be measured to produce a deflected light beam, providing a phase retardation plate through which a polarized compensation image is generated, and comparing the polarized compensation image with a lookup table having standard color values of a plurality of standard polarization compensated images recorded therein, so as to determine whether a deformation is presented on the lens.Type: GrantFiled: September 12, 2006Date of Patent: August 25, 2009Assignee: Instrument Technology Research CenterInventors: Kuo-Cheng Huang, Wen-Hong Wu, Chia-Wei Hsu, Ting-Ming Huang
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Publication number: 20070058160Abstract: A lens inspection device and method are provided. The lens inspection method includes the steps of providing a collimating light beam, polarizing the collimating light beam by a polarizer to produce a polarized light beam, deflecting the polarized light beam by a lens to be measured to produce a deflected light beam, providing a phase retardation plate through which a polarized compensation image is generated, and comparing the polarized compensation image with a lookup table having standard color values of a plurality of standard polarization compensated images recorded therein, so as to determine whether a deformation is presented on the lens.Type: ApplicationFiled: September 12, 2006Publication date: March 15, 2007Applicant: INSTRUMENT TECHNOLOGY RESEARCH CENTERInventors: Kuo-Cheng Huang, Wen-Hong Wu, Chia-Wei Hsu, Ting-Ming Huang
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Patent number: 6797959Abstract: The sensitivity adjusting equipment applied to a photoelectric smoke detector is provided. The photoelectric smoke detector includes a luminous component for providing an input light and a detecting component for receiving an even output light. The sensitivity adjusting equipment includes a light-scattering device having a scattering component and an adjustable hole for scattering the input light evenly and adjusting an intensity of the input light so as to output the even output light to the detecting component. The sensitivity adjusting equipment also includes a movable platform having a first brace connected to the photoelectric smoke detector and a supporting base having a second brace connected to the light-scattering device. The movable platform is moved to make the photoelectric smoke detector and the light-scattering device combined to adjust the sensitivity of the photoelectric smoke detector.Type: GrantFiled: August 19, 2002Date of Patent: September 28, 2004Assignee: Precision Instrument Development Center, National Science CouncilInventors: Shenq-Tsong Chang, Ho-Lin Tsay, Tai-Shan Liao, Bih-Chang Wang, Ting-Ming Huang
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Publication number: 20030209670Abstract: A sensitivity adjusting equipment applied to a photoelectric smoke detector is provided. The photoelectric smoke detector includes a luminous component for providing an input light and a detecting component for receiving an even output light. The sensitivity adjusting equipment includes a light-scattering device having a scattering component and an adjustable hole for scattering the input light evenly and adjusting an intensity of the input light so as to output the even output light to the detecting component. The sensitivity adjusting equipment also includes a movable platform having a first brace connected to the photoelectric smoke detector and a supporting base having a second brace connected to the light-scattering device. The movable platform is moved to make the photoelectric smoke detector and the light-scattering device combined to adjust the sensitivity of the photoelectric smoke detector.Type: ApplicationFiled: August 19, 2002Publication date: November 13, 2003Applicant: Precision Instrument Development Center, National Science CouncilInventors: Shenq-Tsong Chang, Ho-Lin Tsay, Tai-Shan Liao, Bih-Chang Wang, Ting-Ming Huang
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Patent number: 5966392Abstract: A butt-coupling pumped single-mode solid-state laser is provided for generating a laser of single-transverse and single-longitudinal mode. The butt-coupling pumped single-mode solid-state laser includes: (1) a laser diode having an output facet for producing a pumping light; (2) a laser crystal immediately connected to the output facet of the laser diode with a specific length therebetween for generating an excited light at a fundamental wavelength in response to the pumping light; and (3) a mirror disposed away from the laser crystal with a specific distance for emanating a laser output.Type: GrantFiled: August 13, 1997Date of Patent: October 12, 1999Assignee: National Science CouncilInventors: Yung-Fu Chen, Ting-Ming Huang, Ching-Fen Kao, Chi-Luen Wang, Jui-I Tsai