Patents by Inventor Tobias Hickmann

Tobias Hickmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methos and device for keeping mask dimensions constant
    Patent number: 8647797
    Abstract: The present application describes a method and a device for keeping the mask dimensions of a mask (6) constant in the mask plane in lithography. The mask (6) is heated due to the exposure during lithography. By means of thermal and/or mechanical methods, the dimensions of the mask (6) are kept constant. It is possible to use additional methods or devices, e.g. an air cooler (17) or an air heater (17), in order to prevent a change in the mask dimensions in the mask plane.
    Type: Grant
    Filed: August 6, 2010
    Date of Patent: February 11, 2014
    Assignee: Suss Microtec Lithography GmbH
    Inventors: Takaaki Ishii, Tomas Hülsmann, Tobias Hickmann
  • METHOS AND DEVICE FOR KEEPING MASK DIMENSIONS CONSTANT
    Publication number: 20120141928
    Abstract: The present application describes a method and a device for keeping the mask dimensions of a mask (6) constant in the mask plane in lithography. The mask (6) is heated due to the exposure during lithography. By means of thermal and/or mechanical methods, the dimensions of the mask (6) are kept constant. It is possible to use additional methods or devices, e.g. an air cooler (17) or an air heater (17), in order to prevent a change in the mask dimensions in the mask plane. (FIG. 1).
    Type: Application
    Filed: August 6, 2010
    Publication date: June 7, 2012
    Applicant: SÜSS MICROTEC LITHOGRAPHY GMBH
    Inventors: Takaaki Ishii, Tomas Hülsmann, Tobias Hickmann