Patents by Inventor Tod Evan Robinson
Tod Evan Robinson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11964310Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: GrantFiled: January 6, 2023Date of Patent: April 23, 2024Assignee: Bruker Nano, Inc.Inventors: Tod Evan Robinson, Bernabe Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. LeClaire
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Publication number: 20230158555Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: ApplicationFiled: January 6, 2023Publication date: May 25, 2023Inventors: Tod Evan Robinson, Bernabe Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. LeClaire
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Patent number: 11577286Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: GrantFiled: June 15, 2021Date of Patent: February 14, 2023Assignee: Bruker Nano, Inc.Inventors: Tod Evan Robinson, Bernabe Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. LeClaire
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Patent number: 11391664Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: GrantFiled: May 17, 2019Date of Patent: July 19, 2022Assignee: Bruker Nano, Inc.Inventors: Tod Evan Robinson, Bernabe Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. LeClaire
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Publication number: 20210308724Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: ApplicationFiled: June 15, 2021Publication date: October 7, 2021Inventors: Tod Evan Robinson, Bernabe Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. LeClaire
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Patent number: 11040379Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: GrantFiled: July 19, 2019Date of Patent: June 22, 2021Assignee: Bruker Nano, Inc.Inventors: Tod Evan Robinson, Bernabe Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. LeClaire
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Publication number: 20190337025Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: ApplicationFiled: July 19, 2019Publication date: November 7, 2019Inventors: Tod Evan Robinson, Bernabe Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. LeClaire
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Publication number: 20190271631Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: ApplicationFiled: May 17, 2019Publication date: September 5, 2019Inventors: Tod Evan Robinson, Bernabe Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. LeClaire
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Patent number: 10384238Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: GrantFiled: May 20, 2016Date of Patent: August 20, 2019Assignee: RAVE LLCInventors: Tod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. Leclaire
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Patent number: 10330581Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: GrantFiled: May 20, 2016Date of Patent: June 25, 2019Assignee: RAVE LLCInventors: Tod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler, David Brinkley, Jeffrey E. Leclaire
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Publication number: 20160263632Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: ApplicationFiled: May 20, 2016Publication date: September 15, 2016Inventors: TOD EVAN ROBINSON, BERNABE J. ARRUZA, KENNETH GILBERT ROESSLER, DAVID BRINKLEY, JEFFREY E. LECLAIRE
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Publication number: 20160266165Abstract: A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.Type: ApplicationFiled: May 20, 2016Publication date: September 15, 2016Inventors: TOD EVAN ROBINSON, BERNABE J. ARRUZA, KENNETH GILBERT ROESSLER, DAVID BRINKLEY, JEFFREY E. LECLAIRE
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Publication number: 20140176922Abstract: A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.Type: ApplicationFiled: February 28, 2014Publication date: June 26, 2014Inventors: Tod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler
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Patent number: 8696818Abstract: A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.Type: GrantFiled: October 15, 2012Date of Patent: April 15, 2014Assignee: Rave LLCInventors: Tod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler
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Patent number: 8334084Abstract: A method for fabricating high aspect ratio nanostructures is provided. The method uses a nanomachining tip of an atomic force microscope to create an orthogonal series of isolated cuts that define a grid of high aspect ratio nanostructures in a work area on a substrate. Additional material can then be removed to smooth out at least one of the nanostructures in the work area.Type: GrantFiled: August 19, 2011Date of Patent: December 18, 2012Assignee: Rave LLCInventor: Tod Evan Robinson
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Patent number: 8287653Abstract: A method of debris removal is provided. The method includes positioning a nanometer-scaled tip adjacent to a piece of debris on a substrate. The method also includes adhering the piece of debris to the tip. In addition, the method also includes removing the piece of debris from the substrate by moving the tip away from the substrate.Type: GrantFiled: September 17, 2007Date of Patent: October 16, 2012Assignee: Rave, LLCInventors: Tod Evan Robinson, Bernabe J. Arruza, Kenneth Gilbert Roessler
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Publication number: 20110303062Abstract: A method for fabricating high aspect ratio nanostructures is provided. The method uses a nanomachining tip of an atomic force microscope to create an orthogonal series of isolated cuts that define a grid of high aspect ratio nanostructures in a work area on a substrate. Additional material can then be removed to smooth out at least one of the nanostructures in the work area.Type: ApplicationFiled: August 19, 2011Publication date: December 15, 2011Applicant: RAVE LLCInventor: Tod Evan Robinson
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Patent number: 8003283Abstract: This invention provides the user the ability to accurately nanomachine surfaces with reduced tip induced errors. Nanomaching has two types of errors, a first type of error is brought about by the tip's shape and its aspect ratio. A second type of error due to the tip's deflection as it works the material. Therefore, embodiments of the present invention minimizes tip deflection errors allowing allow high aspect Nano-bits to reliably and accurately nanomachine small high aspect three dimensional structures to repair and rejuvenate photomasks.Type: GrantFiled: June 18, 2009Date of Patent: August 23, 2011Assignee: Rave LLCInventor: Tod Evan Robinson
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Patent number: 7829360Abstract: A method of nanomachining is provided. The method includes plunging a nanometer-scaled tip into a surface of a substrate at a first location in a first direction that is substantially perpendicular to the surface, thereby displacing a first portion of the substrate with the tip. The method also includes withdrawing the tip from the substrate in a second direction that is substantially opposite to the first direction. The method further includes moving at least one of the tip and the substrate laterally relative to each other. In addition, the method also includes plunging the tip into the substrate at a second location in a third direction that is substantially parallel to the first direction, thereby displacing a second portion of the substrate with the tip and withdrawing the tip from the substrate in a fourth direction that is substantially opposite to the third direction.Type: GrantFiled: September 17, 2007Date of Patent: November 9, 2010Assignee: Rave, LLCInventors: Bernabe J. Arruza, Ronald Bozak, Kenneth Gilbert Roessler, Andrew Dinsdale, Tod Evan Robinson, David Brinkley
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Publication number: 20090317730Abstract: This invention provides the user the ability to accurately nanomachine surfaces with reduced tip induced errors. Nanomaching has two types of errors, a first type of error is brought about by the tip's shape and its aspect ratio. A second type of error due to the tip's deflection as it works the material.Type: ApplicationFiled: June 18, 2009Publication date: December 24, 2009Applicant: RAVE LLCInventor: Tod Evan ROBINSON