Abstract: A method and semiconductor structure are provided for implementing body contacts for semiconductor-on-insulator transistors. A bulk semiconductor substrate is provided. A mask is applied to the bulk semiconductor substrate to block an insulating implant layer in selected regions. The selected regions provide for body contact for transistors. Holes are formed extending into the bulk semiconductor substrate. The holes are filled with an electrically conductive material to create stud contacts to the bulk semiconductor substrate. In the preferred embodiment, the semiconductor-on-insulator is silicon on an oxide insulating layer and the invention provides a body contact for SOI transistors.

Abstract: A high performance, low cell stress, low-power silicon-on-insulator (SOI) complementary metal oxide semiconductor (CMOS) latch-type sensing method and apparatus are provided. A silicon-on-insulator (SOI) complementary metal oxide semiconductor (CMOS) latch-type sense amplifier includes a precharge circuit for charging complementary bit and data lines to a predefined precharge voltage during a precharge cycle. The precharge voltage is lower than a full rail voltage. The reduced bit and data line precharge voltage substantially reduces voltage stress applied to the access transistors in the RAM cells. A pre-amplifying mechanism produces an offset voltage between the complementary data lines before the. sense amplifier is set. The pre-amplifying mechanism includes a pre-amplifying FET that is substantially smaller than a sensing silicon-on-insulator (SOI) field effect transistor (FET) in the sense amplifier. The pre-amplifying mechanism aids offset voltage development before the sense amplifier is set.

Abstract: A method and semiconductor structure are provided for implementing body contacts for semiconductor-on-insulator transistors. A bulk semiconductor substrate is provided. A mask is applied to the bulk semiconductor substrate to block an insulating implant layer in selected regions. The selected regions provide for body contact for transistors. Holes are formed extending into the bulk semiconductor substrate. The holes are filled with an electrically conductive material to create stud contacts to the bulk semiconductor substrate. In the preferred embodiment, the semiconductor-on-insulator is silicon on an oxide insulating layer and the invention provides a body contact for SOI transistors.

Abstract: A method and apparatus are provided for laser fuseblow protection in transistors, such as silicon-on-insulator (SOI) transistors. The transistors are connected to a fuse. A pair of diodes are connected in series between a high supply and ground. A common connection of the series connected pair of diodes is connected to a common connection of the fuse and transistors. A charge is shunted to the high supply or ground by the pair of diodes with a first voltage a set value above the high supply and a second voltage a set value below the ground. A pair of protection diodes are provided on each side of the fuse with transistors. The transistors are either connected to one side of the fuse or to both sides of the fuse.

Abstract: The present invention is a decoupling capacitor for an integrated circuit. The integrated circuit has a final metal layer which includes a power bus. The decoupling capacitor comprises a dielectric film disposed over the final metal layer and a conductive film disposed over the dielectric layer, whereby capacitance may be provided in the dielectric layer.

Abstract: A method and semiconductor structure are provided for implementing dual plane body contacts for silicon-on-insulator (SOI) transistors. A bulk silicon substrate is provided. A deep ion implant layer is implanted to reside below an oxide insulator. An oxygen implant layer is implanted while applying a mask to block the oxygen implant layer in selected regions. The selected regions provide for body contact for the SOI transistors. Holes are formed extending into the deep ion implant layer and the bulk silicon substrate. The holes are filled with an electrically conductive material to create stud contacts to the deep ion implant layer and the bulk silicon substrate.

Abstract: A method and semiconductor structure are provided for implementing dual plane body contacts for silicon-on-insulator (SOI) transistors. A bulk silicon substrate is provided. A deep ion implant layer is implanted to reside below an oxide insulator. An oxygen implant layer is implanted while applying a mask to block the oxygen implant layer in selected regions. The selected regions provide for body contact for the SOI transistors. Holes are formed extending into the deep ion implant layer and the bulk silicon substrate. The holes are filled with an electrically conductive material to create stud contacts to the deep ion implant layer and the bulk silicon substrate.

Abstract: An apparatus, program product, and method of testing a silicon-on-insulator (SOI) static random access memory (SRAM) introduce switching history effects to a memory cell under test to stress the memory cell such that a reliable determination of stability may be made. It has been found that the worst case scenario for memory cell stability typically occurs immediately after a memory cell is switched to one state after the memory cell has been maintained in the other, opposite state for a period of time sufficient to introduce switching history effects. As such, a testing process may be configured to maintain a memory cell in a particular state for a period of time sufficient to introduce switching history effects, whereby the memory cell may be adequately stressed during the testing process to highlight any stability problems by setting the memory cell to an opposite state, and then shortly thereafter disturbing the memory cell, e.g.

Abstract: A semiconductor-on-insulator integrated circuit with buried patterned layers as electrical conductors for discrete device functions, thermal conductors, and/or decoupling capacitors.

Abstract: A semiconductor device including a conductive substrate, an insulator layer, a silicon layer doped with impurities and forming a first transistor and a second transistor, an isolation volume between said first transistor and said second transistor, and a conductive stud extending from the doped silicon layer to the substrate.

Abstract: The present invention is a decoupling capacitor for an integrated circuit. The integrated circuit has a final metal layer which includes a power bus. The decoupling capacitor includes a dielectric film disposed over the final metal layer and a conductive film disposed over the dielectric layer, whereby capacitance may be provided in the dielectric layer.

Abstract: A method and apparatus for handling variable data word widths and array depths in an array built-in self-test system for testing a plurality of memory arrays using a single controller. Each array includes a predetermined row and column address depth and data word width. Each array further includes a scan register. A universal test data word is generated and sent to the scan register of each array. The universal length test data word has a length dependent upon the maximum row address depth, maximum column address depth and/or the maximum data word width. A portion of the test data word which exceeds the column address depth, row address depth and/or the data word width of a particular array is shifted off the end of the scan register of the particular array.

Abstract: A multi-threaded memory (and associated method) for use in a multi-threaded computer system in which plural threads are used with a single processor. The multi-threaded memory includes: multi-threaded storage cells; at least one write decoder supplying information to a selected multi-threaded storage cell; and at least one read decoder accessing information from a selected multi-threaded storage cell. Each of the multi-threaded storage cells includes: N storage elements, where N.gtoreq.2, each of the N storage elements having a thread-correspondent content; a write interface supplying information to the intra-cell storage elements; and a read interface reading information from the intra-cell storage elements. At least one of the intra-cell read and write interfaces selects one of the thread-correspondent contents based at least in part by identifying the corresponding thread to achieve intra-cell thread-correspondent content selection.