Patents by Inventor Todd Alden Coleman

Todd Alden Coleman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for depositing a material on a substrate
    Patent number: 8642125
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: February 4, 2014
    Assignee: First Solar, Inc
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and method for depositing a material on a substrate
    Patent number: 8388754
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Grant
    Filed: February 15, 2011
    Date of Patent: March 5, 2013
    Assignee: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and method for depositing a material on a substrate
    Patent number: 8382901
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Grant
    Filed: June 3, 2011
    Date of Patent: February 26, 2013
    Assignee: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • SYSTEM AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE
    Publication number: 20130019953
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 24, 2013
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and method for depositing a material on a substrate
    Patent number: 8353987
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Grant
    Filed: February 14, 2011
    Date of Patent: January 15, 2013
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • SYSTEM AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE
    Publication number: 20110232570
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Application
    Filed: June 3, 2011
    Publication date: September 29, 2011
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • MATERIAL SUPPLY SYSTEM AND METHOD
    Publication number: 20110211920
    Abstract: A system and a method for feeding a solid into a solid deposition system is described. Solid contained in a hopper is directed into a vibratory bowl. The frequency of the vibrations of the vibratory bowl can be modulated by a feedback system. The solid can then be entrained in a carrier gas which can flow to a distributor for deposition on a substrate.
    Type: Application
    Filed: May 10, 2011
    Publication date: September 1, 2011
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and method for depositing a material on a substrate
    Patent number: 7968145
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: June 28, 2011
    Assignee: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and Method for Depositing a Material on a Substrate
    Publication number: 20110132262
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Application
    Filed: February 14, 2011
    Publication date: June 9, 2011
    Applicant: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and Method for Depositing a Material on a Substrate
    Publication number: 20110132261
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Application
    Filed: February 15, 2011
    Publication date: June 9, 2011
    Applicant: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and Method for Depositing a Material on a Substrate
    Publication number: 20110132263
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Application
    Filed: February 15, 2011
    Publication date: June 9, 2011
    Applicant: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • Material supply system and method
    Patent number: 7955031
    Abstract: A system and a method for feeding a solid into a solid deposition system is described. Solid contained in a hopper is directed into a vibratory bowl. The frequency of the vibrations of the vibratory bowl can be modulated by a feedback system. The solid can then be entrained in a carrier gas which can flow to a distributor for deposition on a substrate.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: June 7, 2011
    Assignee: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and method for depositing a material on a substrate
    Patent number: 7931937
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: April 26, 2011
    Assignee: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and method for depositing a material on a substrate
    Patent number: 7927659
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: April 19, 2011
    Assignee: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman
  • System and method for depositing a material on a substrate
    Patent number: 7910166
    Abstract: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: March 22, 2011
    Assignee: First Solar, Inc.
    Inventors: Ricky Charles Powell, Andrew Kelly Gray, Todd Alden Coleman