Patents by Inventor Todd Bailey

Todd Bailey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040189994
    Abstract: The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks and the template having template alignment marks, the method including, reducing a distance between the substrate and the template to cause a spreading of the activating light curable liquid; and varying an overlay placement of the template with respect to the substrate such that the template alignment marks are substantially aligned with the substrate alignment marks before the spreading causes the activating light curable liquid to cover an area between the substrate alignment marks and the template alignment marks.
    Type: Application
    Filed: March 22, 2004
    Publication date: September 30, 2004
    Applicant: Board of Regents, The University of Texas System
    Inventors: S. V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey
  • Publication number: 20040170771
    Abstract: The present invention includes a method of moving a liquid between a substrate extending in a first plane and a template extending in a second plane. More specifically, the method may include forming an oblique angle between the first plane and the second plane, reducing a distance between the substrate and the template such that the template is in contact with a portion of the liquid at a desired location, and creating a dispersion of the liquid away from the desired location.
    Type: Application
    Filed: January 13, 2004
    Publication date: September 2, 2004
    Applicant: Board of Regents, The University of Texas System
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S. V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20040168586
    Abstract: The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.
    Type: Application
    Filed: January 13, 2004
    Publication date: September 2, 2004
    Applicant: Board of Regents, The University of Texas System
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S.V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20040163563
    Abstract: The present invention includes a template to form a recorded pattern on a substrate from a conformable material disposed between the template and the substrate, with the recorded pattern having recorded features with designed dimensions, the template comprising an original pattern having original features with original dimensions, with the original dimensions differing from the designed dimensions sufficient to compensate for volumetric changes of the conformable material that occurs upon the conformable material transitioning between first and second states.
    Type: Application
    Filed: February 18, 2004
    Publication date: August 26, 2004
    Applicant: The Board of Regents, The University of Texas System
    Inventors: S. V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey
  • Publication number: 20040141168
    Abstract: A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
    Type: Application
    Filed: December 29, 2003
    Publication date: July 22, 2004
    Applicant: The University of Texas System Board of Regents, UT System
    Inventors: S. V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey
  • Publication number: 20040141163
    Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.
    Type: Application
    Filed: December 29, 2003
    Publication date: July 22, 2004
    Applicant: The University of Texas System, Board of Regents, UT System
    Inventors: Todd Bailey, Byung J. Choi, Matthew E. Colburn, S. V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20040086793
    Abstract: A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
    Type: Application
    Filed: May 27, 2003
    Publication date: May 6, 2004
    Applicant: University of Texas System Board of Regents, UT System
    Inventors: S. V. Sreenivasan, Byung J. Choi, Matthew Colbum, Todd Bailey
  • Publication number: 20040053146
    Abstract: A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
    Type: Application
    Filed: May 27, 2003
    Publication date: March 18, 2004
    Applicant: University of Texas System Board of Regents, UT System
    Inventors: S.V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey
  • Patent number: 6696220
    Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.
    Type: Grant
    Filed: October 12, 2001
    Date of Patent: February 24, 2004
    Assignee: Board of Regents, The University of Texas System
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S. V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20030235787
    Abstract: The present invention provides a composition and a method for forming a pattern on a substrate with the composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. The viscosity and wetting properties of the composition are selected to facilitate formation of a layer from a plurality of spaced-apart beads of the material disposed on the substrate. To that end, in one embodiment of the present invention the composition includes a mono-functional acrylate component, a poly-functional molecule component, and an initiator component responsive to the radiation to initiate a free radical reaction to cause the mono-functional acrylate component and the poly-functional molecule component to polymerize and crosslink.
    Type: Application
    Filed: June 24, 2002
    Publication date: December 25, 2003
    Inventors: Michael P.C. Watts, Carlton Grant Willson, Todd Bailey, Stephen C. Johnson, Eui-Kyoon Kim, Nicholas A. Stacey
  • Publication number: 20020115002
    Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.
    Type: Application
    Filed: October 12, 2001
    Publication date: August 22, 2002
    Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S.V. Sreenivasan, C. Grant Willson, John Ekerdt
  • Publication number: 20020098426
    Abstract: A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
    Type: Application
    Filed: July 16, 2001
    Publication date: July 25, 2002
    Inventors: S. V. Sreenivasan, Byung J. Choi, Matthew Colburn, Todd Bailey
  • Publication number: 20020094496
    Abstract: Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.
    Type: Application
    Filed: February 12, 2002
    Publication date: July 18, 2002
    Inventors: Byung J. Choi, S. V. Sreenivasan, C. Grant Willson, Matthew Colburn, Todd Bailey, John Ekerdt
  • Publication number: 20020093122
    Abstract: Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.
    Type: Application
    Filed: August 1, 2001
    Publication date: July 18, 2002
    Inventors: Byung J. Choi, Matthew Colburn, S. V. Sreenivasan, C. Grant Willson, Todd Bailey, John Ekerdt
  • Patent number: 5558366
    Abstract: An initiator assembly (140) comprises a retainer (46), which can be the cover for an inflator housing (10), and an igniter (142). An opening (85) is formed in the retainer (46). The igniter (142) has a longitudinal axis (143) and comprises a pyrotechnic material (152, 156) on the axis. The pyrotechnic material (152, 156) on ignition exerts a force along the axis (143). The assembly further comprises a preformed compressible plastic coupler plug (148) which includes a plug portion (170) received within the retainer opening (85). The coupler plug (148) comprises locking surfaces (184, 188) which engage the igniter (142) and the retainer (46) and hold the igniter in a spaced relationship with respect to the retainer. The plastic coupler plug (148) further comprises an inwardly extending compressible web (174) integral with the locking surfaces (184, 188). The compressible web (174) provides a seal in the space between the igniter (142) and the retainer (46).
    Type: Grant
    Filed: August 22, 1995
    Date of Patent: September 24, 1996
    Assignee: TRW Inc.
    Inventors: Homer W. Fogle, Jr., Todd Bailey, Brian R. Pitstick, Eric Streif