Patents by Inventor Todd O. Curtis

Todd O. Curtis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Trench isolation process to deposit a trench fill oxide prior to sidewall liner oxidation growth
    Patent number: 6387764
    Abstract: This invention relates generally to a method of trench isolation used in the fabrication of semiconductor devices, wafers and the like. More specifically, the present invention related to a method of trench isolation using chemical vapor deposition (CVD) with TEOS and ozone to deposit a trench fill oxide prior to growing a thermal oxide layer or liner on sidewalls of the trench. The method provides void-free as-deposited dielectric CVD films into gaps or trenches with non-vertical, vertical and or re-entrant profiles.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: May 14, 2002
    Assignee: Silicon Valley Group, Thermal Systems LLC
    Inventors: Todd O. Curtis, Vivek Rao, Kerem Kapkin