Patents by Inventor Tomio Yoneda

Tomio Yoneda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5932012
    Abstract: A paste applicator for drawing a paste film in a desired pattern on a substrate, including a table for detachably supporting a substrate, a paste reservoir tube to be filled with a paste, and a nozzle communicating with the paste reservoir and having a paste discharging port opposing to an upper surface of the substrate mounted on the table. A device is supplied for changing the relative positional relationship between the nozzle and the substrate mounted on the table. The paste is applied onto the substrate to form a desired pattern of the paste. A measuring device measures a position of a paste discharging port of a nozzle exchanged together with the paste reservoir tube by using a paste pattern formed by applying the paste onto the substrate held on the table using the exchanged nozzle. The center of the paste pattern nearly agrees with the center of the paste discharging port.
    Type: Grant
    Filed: June 14, 1996
    Date of Patent: August 3, 1999
    Assignee: Hitachi Techno Engineering Co., Ltd.
    Inventors: Shigeru Ishida, Haruo Mishina, Yukihiro Kawasumi, Tomio Yoneda, Masayuki Saito, Hiroshi Tsutsumi
  • Patent number: 5614024
    Abstract: An apparatus for applying a paste to a surface of a substrate by holding the substrate on a table and by moving a nozzle relative to the table to form a desired paste pattern on the substrate. The apparatus has a device for measuring the position of a paste ejection orifice of the nozzle, a processing unit for calculating, from a result of the measurement by the measuring device, a displacement of the position of the paste ejection orifice when the nozzle is changed, and a mechanism for positioning the substrate at a desired position with respect to the ejection orifice of the changed nozzle on the basis of a result of the operation of the processsing unit. With this arrangement, even if the position of the ejection orifice of the nozzle is changed when the nozzle is changed, the desired positional relationship between the nozzle and the substrate can be set with improved accuracy, whereby a paste pattern can be drawn accurately.
    Type: Grant
    Filed: July 27, 1994
    Date of Patent: March 25, 1997
    Assignee: Hitachi Techno Engineering Co., Ltd.
    Inventors: Shigeru Ishida, Satoshi Yawata, Tomio Yoneda, Haruo Mishina, Kiyoshi Imaizumi, Yukihiro Kawasumi
  • Patent number: 5437727
    Abstract: An apparatus for drawing a pattern of a photoresist on a substrate has a nozzle for discharging the paste and a substrate-supporting table movable along the X and Y-axes relative to the paste drawing opening of the nozzle. The nozzle is fixed to a Z-axis table which carries an optical displacement meter which measures the clearance between the substrate and the paste discharging opening. According to the results of the measurements, the Z-axis table is moved toward and away from the substrate so that the clearance is maintained at a desired distance. The optical displacement meter has a measuring point on the substrate. The measuring point is positioned so as not to interfere with the paste line which is drawn on the substrate with paste discharged from the nozzle.
    Type: Grant
    Filed: July 24, 1992
    Date of Patent: August 1, 1995
    Assignee: Hitachi Techno Engineering Co., Ltd.
    Inventors: Tomio Yoneda, Shigeru Ishida, Haruo Mishina
  • Patent number: 5415693
    Abstract: A paste applicator for drawing a paste pattern on a substrate has X- and Y-axis tables, on which the substrate is mounted, and a paste reservoir tube, a nozzle, a nozzle support and an optical displacement meter all fixed to a Z-axis table in opposite relation to the substrate. The paste reservoir tube and the nozzle are communicated with each other by a horizontal portion of the nozzle support. The horizontal portion is extended to a position below the optical displacement meter so that the nozzle is located close to a measuring point of the optical displacement meter. This arrangement places the nozzle as close as possible to the measuring point of the optical displacement meter, whereby an error between data measured by the optical displacement meter and an actual nozzle-to-substrate gap is substantially eliminated to assure that the paste is applied to the substrate in a desired pattern and configuration.
    Type: Grant
    Filed: September 29, 1993
    Date of Patent: May 16, 1995
    Assignee: Hitachi Techno Engineering Co., Ltd.
    Inventors: Tomio Yoneda, Shigeru Ishida, Haruo Mishina