Abstract: A target for X-ray generation has a substrate and a target portion. The substrate is comprised of diamond and has a first principal surface and a second principal surface opposed to each other. A bottomed hole is formed from the first principal surface side in the substrate. The target portion is comprised of a metal deposited from a bottom surface of the hole toward the first principal surface. An entire side surface of the target portion is in close contact with an inside surface of the hole.

Abstract: A column for chromatography includes a flow path for allowing a mobile phase, the flow path including mutually-opposing sidewalls and a bottom wall joined to the sidewalls and arranged at bottom ends of the sidewalls; and a plurality of pillars provided to extend along the sidewalls from the bottom wall and regularly arranged at a specified interval. The column is configured to separate individual components from a mixture sample containing multiple kinds of components by using the pillars as a stationary phase. Each of the pillars includes a curved outer surface and the sidewalls partially include a curved surface conforming to the outer surface of each of the pillars. The shortest distance between each of the sidewalls and a pillar positioned closest to said each of the sidewalls is equal to the shortest distance between the pillars in a flow direction of the mobile phase.

Abstract: A micro-channel device provided in a solution analysis system using pressure liquid feed comprises a plurality of straight-line channels and curved channels connecting the ends of the neighboring straight-line channels. The width w of each curved channel is smaller than the width t of each straight-line channel. The radius of curvature r of each curved channel is set so that the value of a expressed by formula (1) is equal to or smaller than the value of a at a local maximum point of the theoretical step height H expressed by formula (2) and based on the shape of the curved channel. a=w/r??(1) H = u c ? w 2 64 ? ? ? ? D m × a 2 ? ( a + 2 ) a + 1 ( 2 ) Where, w is a width of the curved channel, uc is a channel passing speed of a solution in the curved channel, ? is a molecular diffusion inhibition factor by basic members present in the curved channel, and Dm is a molecular diffusion coefficient of the solution.

Abstract: A target for X-ray generation has a substrate and a target portion. The substrate is comprised of diamond and has a first principal surface and a second principal surface opposed to each other. A bottomed hole is formed from the first principal surface side in the substrate. The target portion is comprised of a metal deposited from a bottom surface of the hole toward the first principal surface. An entire side surface of the target portion is in close contact with an inside surface of the hole.

Abstract: A high separation efficiency column 10 for chromatography and a manufacturing method thereof are provided. The column 10 for chromatography includes a first substrate 11 having a plurality of pillars 22 formed on one surface thereof and a second substrate 12 bonded to the one surface of the first substrate 11 and constituting a flow path 13 together with the plurality of pillars 22 formed on the first substrate. At least a surface of each pillar is formed in a porous shape.

Abstract: A chromatography detector 11 includes a base substrate having a main surface 12a and a column flow path 15 formed on the main surface 12a, and a substrate block 13 and 14, which has a detection space 18 communicating with an outlet of the column flow path 15 and is stacked on the main surface 12a of the base substrate 12 so as to close a top surface of the column flow path 15.

Abstract: Using a silicon single crystal with (100) plane orientation as a base material, a pectinate portion having a slope portion and a patterning material guiding groove is formed through photolithography process. A liquid reservoir for keeping a patterning material common to tooth portions of the pectinate portion is formed in the same step as a step for forming the guiding grooves. In forming slope portion, anisotropic wet etching allows easy and accurate formation of a slope portion with (111) plane orientation to (100) plane orientation, by taking advantage of differences in speed due to the plane orientations. In addition, by forming a groove portion using anisotropic dry etching, the patterning material guiding groove having a perpendicular sidewall reaching the slope portion may be formed at high accuracy. A pattern forming apparatus with high accuracy and low cost is provided.