Patents by Inventor Tomohiro Etou
Tomohiro Etou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160168418Abstract: Provided are: a material which has high transparency and excellent sputtering resistance and heat resistance, does not undergo cracking, and can be formed into a cured film having a thickness of 10 to 200 ?m by the application or printing of the material; and a cured film and a display element, each of which is produced using the material.Type: ApplicationFiled: August 22, 2013Publication date: June 16, 2016Inventors: Yuki OKAMOTO, Yuki Kimura, Tomohiro ETOU
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Patent number: 8507171Abstract: The present invention provides a positive photosensitive composition containing a specific tetrafunctional silsesquioxane compound (A), a siloxane polymer (B) formed of multiple kinds of alkoxysilane compounds having different numbers of alkoxyl groups, a 1,2-quinone diazide compound (C), and a solvent (D) in order to provide a positive photosensitive composition useful for forming a film on which a pattern is formed, the film being excellent in high thermal resistance, high transparency, crack resistance, adhesiveness with a ground, and the like, and being obtained by performing development with an alkali aqueous solution.Type: GrantFiled: July 13, 2010Date of Patent: August 13, 2013Assignee: JNC CorporationInventors: Yuki Kimura, Tomohiro Etou, Manabu Kondo
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Patent number: 8206811Abstract: A material of cured film, a thermosetting film and a display device are provided. The thermosetting composition includes a solvent and at least one siloxane polymer selected from the group consisting of siloxane polymer (A) obtained by hydrolyzing or condensing a silane mixture containing a monofunctional silane represented by formula (1) and a trifunctional silane represented by formula (2), and siloxane polymer (B) obtained by hydrolyzing or condensing a silane mixture containing a bifunctional silane represented by formula (3) and a tetrafunctional silane represented by formula (4). R independently represents hydrogen, an alkyl group having 1 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, an aryl group having 6 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, or an alkenyl group having 2 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen. R? independently represents a hydrolyzable group.Type: GrantFiled: September 29, 2010Date of Patent: June 26, 2012Assignee: JNC CorporationInventors: Yuki Okamoto, Yuuki Kimura, Tomohiro Etou
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Publication number: 20110091693Abstract: A material of cured film, a thermosetting film and a display device are provided. The thermosetting composition includes a solvent and at least one siloxane polymer selected from the group consisting of siloxane polymer (A) obtained by hydrolyzing or condensing a silane mixture containing a monofunctional silane represented by formula (1) and a trifunctional silane represented by formula (2), and siloxane polymer (B) obtained by hydrolyzing or condensing a silane mixture containing a bifunctional silane represented by formula (3) and a tetrafunctional silane represented by formula (4). R independently represents hydrogen, an alkyl group having 1 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, an aryl group having 6 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, or an alkenyl group having 2 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen. R? independently represents a hydrolyzable group.Type: ApplicationFiled: September 29, 2010Publication date: April 21, 2011Applicant: CHISSO CORPORATIONInventors: YUKI OKAMOTO, YUUKI KIMURA, TOMOHIRO ETOU
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Publication number: 20110091703Abstract: A material of cured film, a thermosetting film and a display device are provided. The thermosetting composition includes a solvent and at least one siloxane polymer selected from the group consisting of siloxane polymer (A) obtained by hydrolyzing or condensing a silane mixture containing a mono functional silane represented by formula (1) and a trifunctional silane represented by formula (2), and siloxane polymer (B) obtained by hydrolyzing or condensing a silane mixture containing a bifunctional silane represented by formula (3) and a tetrafunctional silane represented by formula (4). R independently represents hydrogen, an alkyl group having 1 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, an aryl group having 6 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, or an alkenyl group having 2 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen. R? independently represents a hydrolyzable group.Type: ApplicationFiled: September 16, 2010Publication date: April 21, 2011Applicant: CHISSO CORPORATIONInventors: YUKI OKAMOTO, YUUKI KIMURA, TOMOHIRO ETOU
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Publication number: 20110008589Abstract: The present invention provides a positive photosensitive composition containing a specific tetrafunctional silsesquioxane compound (A), a siloxane polymer (B) formed of multiple kinds of alkoxysilane compounds having different numbers of alkoxyl groups, a 1,2-quinone diazide compound (C), and a solvent (D) in order to provide a positive photosensitive composition useful for forming a film on which a pattern is formed, the film being excellent in high thermal resistance, high transparency, crack resistance, adhesiveness with a ground, and the like, and being obtained by performing development with an alkali aqueous solution.Type: ApplicationFiled: July 13, 2010Publication date: January 13, 2011Applicant: CHISSO CORPORATIONInventors: Yuki KIMURA, Tomohiro Etou, Manabu Kondo
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Patent number: 7670745Abstract: The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.Type: GrantFiled: November 2, 2007Date of Patent: March 2, 2010Assignee: Chisso CorporationInventors: Tomohiro Etou, Eiji Watanabe, Ryouta Mineo
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Publication number: 20090191386Abstract: A positive photosensitive polymer composition of the invention contains: a copolymer obtained by the radical polymerization of monomers including a radical polymerizable monomer (a1) having a (meth)acryloyl group and a polyalkylene glycol group a terminal of which is an alkoxy group; and a 1,2-quinone diazide compound. The positive photosensitive polymer composition may further contain a copolymer obtained by the radical polymerization of monomers not including the monomer (a1).Type: ApplicationFiled: January 14, 2009Publication date: July 30, 2009Applicant: CHISSO CORPORATIONInventors: Toshiyuki TAKAHASHI, Eiji WATANABE, Tomohiro ETOU, Yuuki KIMURA
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Patent number: 7413782Abstract: Provided are a polymerizing liquid-crystalline compound of formula (1). In formula (1), Q1 to Q4 each independently represent a formula (2), a hydrogen atom, a halogen atom, an alkyl group or the like; at least two of Q1 to Q4 are a formula (2) and may differ from each other. In formula (2), A independently represent a 1,4-cyclohexylene group, a 1,4-phenylene group or the like; X independently represents a single bond, an alkylene group or the like; Z represents a single bond, —COO—, —OCO— or the like; n indicates an integer of from 0 to 3; p represents any one polymerizing group of formulae (P1) to (P8); W represents a hydrogen atom, a halogen atom, an alkyl group or the like. When Q1 and Q2 are both hydrogen atoms and when Q3 and Q4 are both formula (2), then p must not be (P8).Type: GrantFiled: February 14, 2005Date of Patent: August 19, 2008Assignees: Chisso Corporation, Chisso Petrochemical CorporationInventors: Takashi Kato, Kazuhiko Saigusa, Tomohiro Etou, Kazutoshi Miyazawa
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Patent number: 7407691Abstract: Provided are a liquid-crystal compound and a liquid-crystal composition containing the compound, of which the advantages are that they show nematic hybrid orientation on a rubbed TAC substrate, they are polymerizable in open air and they readily give a polymer having a high degree of polymerization even when exposed to a relatively small total quantity of light. The films formed by photopolymerizing them keep nematic hybrid orientation. The compound is represented by formula (1): wherein R1 is a hydrogen or an alkyl; R2 is a hydrogen, —OCF3, etc.; A1 is a 1,4-phenylene, etc.; A2 and A3 are independently a 1,4-cyclohexylene, a 1,4-phenylene, etc.; X1 is a single bond, —O—, etc.; X2 and X3 are independently a single bond, —COO—, —C?C—, —CONH—, etc.; m is an integer of from 0 to 20; and n is 1 or 0.Type: GrantFiled: March 21, 2005Date of Patent: August 5, 2008Assignees: Chisso Corporation, Chisso Petrochemical CorporationInventors: Ryushi Shundo, Tomohiro Etou, Masami Kimura
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Publication number: 20080131813Abstract: The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.Type: ApplicationFiled: November 2, 2007Publication date: June 5, 2008Inventors: Tomohiro Etou, Eiji Watanabe, Ryouta Mineo
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Patent number: 7381350Abstract: The compound (1) or (2), a composition containing the compound and a polymer obtained by polymerizing the composition. R1 is fluorine, cyano, alkyl, and so forth; R2 is hydrogen, alkyl, and so forth; R3 and R4 are independently hydrogen, fluorine, alkyl, and so forth; A is 1,4-cyclohexylene, 1,4-phenylene, and so forth; X is a single bond, —COO—, —OCO—, and so forth; P is alkylene and so forth; m and n are independently 0, 1 or 2.Type: GrantFiled: July 8, 2005Date of Patent: June 3, 2008Assignees: Chisso Corporation, Chisso Petrochemical CorporationInventors: Ryushi Shundo, Tomohiro Etou
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Patent number: 7101595Abstract: The present invention provides a compound represented by formula (1) defined in the specification. The invention further provides a liquid crystal composition comprising at least two compounds, which at least one compound out of them is the above compound. The invention still further provides a polymer obtained by polymerizing the above composition, and uses of the polymer such as a molded article having an optical anisotropy, an optical compensation element, a wavelength functional plate, an optical element, and a liquid crystal display element comprising the polymer.Type: GrantFiled: July 29, 2004Date of Patent: September 5, 2006Assignees: Chisso Corporation, Chisso Petrochemical CorporationInventors: Ryushi Shundo, Hiromichi Inoue, Tomohiro Etou
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Publication number: 20060006364Abstract: The compound (1) or (2), a composition containing the compound and a polymer obtained by polymerizing the composition. R1 is fluorine, cyano, alkyl, and so forth; R2 is hydrogen, alkyl, and so forth; R3 and R4 are independently hydrogen, fluorine, alkyl, and so forth; A is 1,4-cyclohexylene, 1,4-phenylene, and so forth; X is a single bond, —COO—, —OCO—, and so forth; P is alkylene and so forth; m and n are independently 0, 1 or 2.Type: ApplicationFiled: July 8, 2005Publication date: January 12, 2006Inventors: Ryushi Shundo, Tomohiro Etou
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Publication number: 20050224757Abstract: Provided are a liquid-crystal compound and a liquid-crystal composition containing the compound, of which the advantages are that they show nematic hybrid orientation on a rubbed TAC substrate, they are polymerizable in open air and they readily give a polymer having a high degree of polymerization even when exposed to a relatively small total quantity of light. The films formed by photopolymerizing them keep nematic hybrid orientation. The compound is represented by formula (1): wherein R1 is a hydrogen or an alkyl; R2 is a hydrogen, —OCF3, etc.; A1 is a 1,4-phenylene, etc.; A2 and A3 are independently a 1,4-cyclohexylene, a 1,4-phenylene, etc.; X1 is a single bond, —O—, etc.; X2 and X3 are independently a single bond, —COO—, —C?C—, —CONH—, etc.; m is an integer of from 0 to 20; and n is 1 or 0.Type: ApplicationFiled: March 21, 2005Publication date: October 13, 2005Inventors: Ryushi Syundo, Tomohiro Etou, Masami Kimura
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Publication number: 20050179005Abstract: Provided are a polymerizing liquid-crystalline compound of formula (1). In formula (1), Q1 to Q4 each independently represent a formula (2), a hydrogen atom, a halogen atom, an alkyl group or the like; at least two of Q1 to Q4 are a formula (2) and may differ from each other. In formula (2), A independently represent a 1,4-cyclohexylene group, a 1,4-phenylene group or the like; X independently represents a single bond, an alkylene group or the like; Z represents a single bond, —COO—, —OCO— or the like; n indicates an integer of from 0 to 3; p represents any one polymerizing group of formulae (P1) to (P8); W represents a hydrogen atom, a halogen atom, an alkyl group or the like. When Q1 and Q2 are both hydrogen atoms and when Q3 and Q4 are both formula (2), then p must not be (P8).Type: ApplicationFiled: February 14, 2005Publication date: August 18, 2005Inventors: Takashi Kato, Kazuhiko Saigusa, Tomohiro Etou, Kazutoshi Miyazawa
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Publication number: 20050031801Abstract: The present invention provides a compound represented by formula (1) defined in the specification. The invention further provides a liquid crystal composition comprising at least two compounds, which at least one compound out of them is the above compound. The invention still further provides a polymer obtained by polymerizing the above composition, and uses of the polymer such as a molded article having an optical anisotropy, an optical compensation element, a wavelength functional plate, an optical element, and a liquid crystal display element comprising the polymer.Type: ApplicationFiled: July 29, 2004Publication date: February 10, 2005Inventors: Ryushi Shundo, Hiromichi Inoue, Tomohiro Etou
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Patent number: 4661547Abstract: An antistatic material containing a base material which is rubber and/or polyvinyl cloride resin, to which are added a cationic quaternary ammonium salt and polyethylene glycol, and optionally aluminum hydroxide or calcium carbonate. The antistatic material has a low electric resistance and excellent thermal stability, and can be colored in any color.Type: GrantFiled: November 8, 1985Date of Patent: April 28, 1987Assignee: Nippon Rubber Co., Ltd.Inventors: Masasuke Harada, Kouji Tsukamoto, Tomohiro Etou