Patents by Inventor Tomohiro Etou

Tomohiro Etou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160168418
    Abstract: Provided are: a material which has high transparency and excellent sputtering resistance and heat resistance, does not undergo cracking, and can be formed into a cured film having a thickness of 10 to 200 ?m by the application or printing of the material; and a cured film and a display element, each of which is produced using the material.
    Type: Application
    Filed: August 22, 2013
    Publication date: June 16, 2016
    Inventors: Yuki OKAMOTO, Yuki Kimura, Tomohiro ETOU
  • Patent number: 8507171
    Abstract: The present invention provides a positive photosensitive composition containing a specific tetrafunctional silsesquioxane compound (A), a siloxane polymer (B) formed of multiple kinds of alkoxysilane compounds having different numbers of alkoxyl groups, a 1,2-quinone diazide compound (C), and a solvent (D) in order to provide a positive photosensitive composition useful for forming a film on which a pattern is formed, the film being excellent in high thermal resistance, high transparency, crack resistance, adhesiveness with a ground, and the like, and being obtained by performing development with an alkali aqueous solution.
    Type: Grant
    Filed: July 13, 2010
    Date of Patent: August 13, 2013
    Assignee: JNC Corporation
    Inventors: Yuki Kimura, Tomohiro Etou, Manabu Kondo
  • Patent number: 8206811
    Abstract: A material of cured film, a thermosetting film and a display device are provided. The thermosetting composition includes a solvent and at least one siloxane polymer selected from the group consisting of siloxane polymer (A) obtained by hydrolyzing or condensing a silane mixture containing a monofunctional silane represented by formula (1) and a trifunctional silane represented by formula (2), and siloxane polymer (B) obtained by hydrolyzing or condensing a silane mixture containing a bifunctional silane represented by formula (3) and a tetrafunctional silane represented by formula (4). R independently represents hydrogen, an alkyl group having 1 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, an aryl group having 6 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, or an alkenyl group having 2 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen. R? independently represents a hydrolyzable group.
    Type: Grant
    Filed: September 29, 2010
    Date of Patent: June 26, 2012
    Assignee: JNC Corporation
    Inventors: Yuki Okamoto, Yuuki Kimura, Tomohiro Etou
  • Publication number: 20110091693
    Abstract: A material of cured film, a thermosetting film and a display device are provided. The thermosetting composition includes a solvent and at least one siloxane polymer selected from the group consisting of siloxane polymer (A) obtained by hydrolyzing or condensing a silane mixture containing a monofunctional silane represented by formula (1) and a trifunctional silane represented by formula (2), and siloxane polymer (B) obtained by hydrolyzing or condensing a silane mixture containing a bifunctional silane represented by formula (3) and a tetrafunctional silane represented by formula (4). R independently represents hydrogen, an alkyl group having 1 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, an aryl group having 6 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, or an alkenyl group having 2 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen. R? independently represents a hydrolyzable group.
    Type: Application
    Filed: September 29, 2010
    Publication date: April 21, 2011
    Applicant: CHISSO CORPORATION
    Inventors: YUKI OKAMOTO, YUUKI KIMURA, TOMOHIRO ETOU
  • Publication number: 20110091703
    Abstract: A material of cured film, a thermosetting film and a display device are provided. The thermosetting composition includes a solvent and at least one siloxane polymer selected from the group consisting of siloxane polymer (A) obtained by hydrolyzing or condensing a silane mixture containing a mono functional silane represented by formula (1) and a trifunctional silane represented by formula (2), and siloxane polymer (B) obtained by hydrolyzing or condensing a silane mixture containing a bifunctional silane represented by formula (3) and a tetrafunctional silane represented by formula (4). R independently represents hydrogen, an alkyl group having 1 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, an aryl group having 6 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, or an alkenyl group having 2 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen. R? independently represents a hydrolyzable group.
    Type: Application
    Filed: September 16, 2010
    Publication date: April 21, 2011
    Applicant: CHISSO CORPORATION
    Inventors: YUKI OKAMOTO, YUUKI KIMURA, TOMOHIRO ETOU
  • Publication number: 20110008589
    Abstract: The present invention provides a positive photosensitive composition containing a specific tetrafunctional silsesquioxane compound (A), a siloxane polymer (B) formed of multiple kinds of alkoxysilane compounds having different numbers of alkoxyl groups, a 1,2-quinone diazide compound (C), and a solvent (D) in order to provide a positive photosensitive composition useful for forming a film on which a pattern is formed, the film being excellent in high thermal resistance, high transparency, crack resistance, adhesiveness with a ground, and the like, and being obtained by performing development with an alkali aqueous solution.
    Type: Application
    Filed: July 13, 2010
    Publication date: January 13, 2011
    Applicant: CHISSO CORPORATION
    Inventors: Yuki KIMURA, Tomohiro Etou, Manabu Kondo
  • Patent number: 7670745
    Abstract: The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.
    Type: Grant
    Filed: November 2, 2007
    Date of Patent: March 2, 2010
    Assignee: Chisso Corporation
    Inventors: Tomohiro Etou, Eiji Watanabe, Ryouta Mineo
  • Publication number: 20090191386
    Abstract: A positive photosensitive polymer composition of the invention contains: a copolymer obtained by the radical polymerization of monomers including a radical polymerizable monomer (a1) having a (meth)acryloyl group and a polyalkylene glycol group a terminal of which is an alkoxy group; and a 1,2-quinone diazide compound. The positive photosensitive polymer composition may further contain a copolymer obtained by the radical polymerization of monomers not including the monomer (a1).
    Type: Application
    Filed: January 14, 2009
    Publication date: July 30, 2009
    Applicant: CHISSO CORPORATION
    Inventors: Toshiyuki TAKAHASHI, Eiji WATANABE, Tomohiro ETOU, Yuuki KIMURA
  • Patent number: 7413782
    Abstract: Provided are a polymerizing liquid-crystalline compound of formula (1). In formula (1), Q1 to Q4 each independently represent a formula (2), a hydrogen atom, a halogen atom, an alkyl group or the like; at least two of Q1 to Q4 are a formula (2) and may differ from each other. In formula (2), A independently represent a 1,4-cyclohexylene group, a 1,4-phenylene group or the like; X independently represents a single bond, an alkylene group or the like; Z represents a single bond, —COO—, —OCO— or the like; n indicates an integer of from 0 to 3; p represents any one polymerizing group of formulae (P1) to (P8); W represents a hydrogen atom, a halogen atom, an alkyl group or the like. When Q1 and Q2 are both hydrogen atoms and when Q3 and Q4 are both formula (2), then p must not be (P8).
    Type: Grant
    Filed: February 14, 2005
    Date of Patent: August 19, 2008
    Assignees: Chisso Corporation, Chisso Petrochemical Corporation
    Inventors: Takashi Kato, Kazuhiko Saigusa, Tomohiro Etou, Kazutoshi Miyazawa
  • Patent number: 7407691
    Abstract: Provided are a liquid-crystal compound and a liquid-crystal composition containing the compound, of which the advantages are that they show nematic hybrid orientation on a rubbed TAC substrate, they are polymerizable in open air and they readily give a polymer having a high degree of polymerization even when exposed to a relatively small total quantity of light. The films formed by photopolymerizing them keep nematic hybrid orientation. The compound is represented by formula (1): wherein R1 is a hydrogen or an alkyl; R2 is a hydrogen, —OCF3, etc.; A1 is a 1,4-phenylene, etc.; A2 and A3 are independently a 1,4-cyclohexylene, a 1,4-phenylene, etc.; X1 is a single bond, —O—, etc.; X2 and X3 are independently a single bond, —COO—, —C?C—, —CONH—, etc.; m is an integer of from 0 to 20; and n is 1 or 0.
    Type: Grant
    Filed: March 21, 2005
    Date of Patent: August 5, 2008
    Assignees: Chisso Corporation, Chisso Petrochemical Corporation
    Inventors: Ryushi Shundo, Tomohiro Etou, Masami Kimura
  • Publication number: 20080131813
    Abstract: The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.
    Type: Application
    Filed: November 2, 2007
    Publication date: June 5, 2008
    Inventors: Tomohiro Etou, Eiji Watanabe, Ryouta Mineo
  • Patent number: 7381350
    Abstract: The compound (1) or (2), a composition containing the compound and a polymer obtained by polymerizing the composition. R1 is fluorine, cyano, alkyl, and so forth; R2 is hydrogen, alkyl, and so forth; R3 and R4 are independently hydrogen, fluorine, alkyl, and so forth; A is 1,4-cyclohexylene, 1,4-phenylene, and so forth; X is a single bond, —COO—, —OCO—, and so forth; P is alkylene and so forth; m and n are independently 0, 1 or 2.
    Type: Grant
    Filed: July 8, 2005
    Date of Patent: June 3, 2008
    Assignees: Chisso Corporation, Chisso Petrochemical Corporation
    Inventors: Ryushi Shundo, Tomohiro Etou
  • Patent number: 7101595
    Abstract: The present invention provides a compound represented by formula (1) defined in the specification. The invention further provides a liquid crystal composition comprising at least two compounds, which at least one compound out of them is the above compound. The invention still further provides a polymer obtained by polymerizing the above composition, and uses of the polymer such as a molded article having an optical anisotropy, an optical compensation element, a wavelength functional plate, an optical element, and a liquid crystal display element comprising the polymer.
    Type: Grant
    Filed: July 29, 2004
    Date of Patent: September 5, 2006
    Assignees: Chisso Corporation, Chisso Petrochemical Corporation
    Inventors: Ryushi Shundo, Hiromichi Inoue, Tomohiro Etou
  • Publication number: 20060006364
    Abstract: The compound (1) or (2), a composition containing the compound and a polymer obtained by polymerizing the composition. R1 is fluorine, cyano, alkyl, and so forth; R2 is hydrogen, alkyl, and so forth; R3 and R4 are independently hydrogen, fluorine, alkyl, and so forth; A is 1,4-cyclohexylene, 1,4-phenylene, and so forth; X is a single bond, —COO—, —OCO—, and so forth; P is alkylene and so forth; m and n are independently 0, 1 or 2.
    Type: Application
    Filed: July 8, 2005
    Publication date: January 12, 2006
    Inventors: Ryushi Shundo, Tomohiro Etou
  • Publication number: 20050224757
    Abstract: Provided are a liquid-crystal compound and a liquid-crystal composition containing the compound, of which the advantages are that they show nematic hybrid orientation on a rubbed TAC substrate, they are polymerizable in open air and they readily give a polymer having a high degree of polymerization even when exposed to a relatively small total quantity of light. The films formed by photopolymerizing them keep nematic hybrid orientation. The compound is represented by formula (1): wherein R1 is a hydrogen or an alkyl; R2 is a hydrogen, —OCF3, etc.; A1 is a 1,4-phenylene, etc.; A2 and A3 are independently a 1,4-cyclohexylene, a 1,4-phenylene, etc.; X1 is a single bond, —O—, etc.; X2 and X3 are independently a single bond, —COO—, —C?C—, —CONH—, etc.; m is an integer of from 0 to 20; and n is 1 or 0.
    Type: Application
    Filed: March 21, 2005
    Publication date: October 13, 2005
    Inventors: Ryushi Syundo, Tomohiro Etou, Masami Kimura
  • Publication number: 20050179005
    Abstract: Provided are a polymerizing liquid-crystalline compound of formula (1). In formula (1), Q1 to Q4 each independently represent a formula (2), a hydrogen atom, a halogen atom, an alkyl group or the like; at least two of Q1 to Q4 are a formula (2) and may differ from each other. In formula (2), A independently represent a 1,4-cyclohexylene group, a 1,4-phenylene group or the like; X independently represents a single bond, an alkylene group or the like; Z represents a single bond, —COO—, —OCO— or the like; n indicates an integer of from 0 to 3; p represents any one polymerizing group of formulae (P1) to (P8); W represents a hydrogen atom, a halogen atom, an alkyl group or the like. When Q1 and Q2 are both hydrogen atoms and when Q3 and Q4 are both formula (2), then p must not be (P8).
    Type: Application
    Filed: February 14, 2005
    Publication date: August 18, 2005
    Inventors: Takashi Kato, Kazuhiko Saigusa, Tomohiro Etou, Kazutoshi Miyazawa
  • Publication number: 20050031801
    Abstract: The present invention provides a compound represented by formula (1) defined in the specification. The invention further provides a liquid crystal composition comprising at least two compounds, which at least one compound out of them is the above compound. The invention still further provides a polymer obtained by polymerizing the above composition, and uses of the polymer such as a molded article having an optical anisotropy, an optical compensation element, a wavelength functional plate, an optical element, and a liquid crystal display element comprising the polymer.
    Type: Application
    Filed: July 29, 2004
    Publication date: February 10, 2005
    Inventors: Ryushi Shundo, Hiromichi Inoue, Tomohiro Etou
  • Patent number: 4661547
    Abstract: An antistatic material containing a base material which is rubber and/or polyvinyl cloride resin, to which are added a cationic quaternary ammonium salt and polyethylene glycol, and optionally aluminum hydroxide or calcium carbonate. The antistatic material has a low electric resistance and excellent thermal stability, and can be colored in any color.
    Type: Grant
    Filed: November 8, 1985
    Date of Patent: April 28, 1987
    Assignee: Nippon Rubber Co., Ltd.
    Inventors: Masasuke Harada, Kouji Tsukamoto, Tomohiro Etou