Patents by Inventor Tomohiro Iijima
Tomohiro Iijima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180261421Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.Type: ApplicationFiled: May 10, 2018Publication date: September 13, 2018Applicant: NuFlare Technology, Inc.Inventors: Hiroshi MATSUMOTO, Tomohiro Iijima, Munehiro Ogasawara, Hideo Inoue, Ryoichi Yoshikawa
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Patent number: 10020159Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.Type: GrantFiled: December 19, 2016Date of Patent: July 10, 2018Assignee: NuFlare Technology, Inc.Inventors: Hiroshi Matsumoto, Tomohiro Iijima, Munehiro Ogasawara, Hideo Inoue, Ryoichi Yoshikawa
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Publication number: 20170098524Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.Type: ApplicationFiled: December 19, 2016Publication date: April 6, 2017Applicant: NuFlare Technology, Inc.Inventors: Hiroshi MATSUMOTO, Tomohiro IIJIMA, Munehiro OGASAWARA, Hideo INOUE, Ryoichi YOSHIKAWA
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Patent number: 9570267Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.Type: GrantFiled: October 16, 2015Date of Patent: February 14, 2017Assignee: NuFlare Technology, Inc.Inventors: Hiroshi Matsumoto, Tomohiro Iijima, Munehiro Ogasawara, Hideo Inoue, Ryoichi Yoshikawa
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Publication number: 20160042908Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.Type: ApplicationFiled: October 16, 2015Publication date: February 11, 2016Applicant: NuFlare Technology, Inc.Inventors: Hiroshi MATSUMOTO, Tomohiro IIJIMA, Munehiro OGASAWARA, Hideo INOUE, Ryoichi YOSHIKAWA
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Patent number: 9202673Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.Type: GrantFiled: October 30, 2013Date of Patent: December 1, 2015Assignee: NuFlare Technology, Inc.Inventors: Hiroshi Matsumoto, Tomohiro Iijima, Munehiro Ogasawara, Hideo Inoue, Ryoichi Yoshikawa
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Publication number: 20140124684Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.Type: ApplicationFiled: October 30, 2013Publication date: May 8, 2014Applicant: NuFlare Technology, IncInventors: Hiroshi MATSUMOTO, Tomohiro Iijima, Munehiro Ogasawara, Hideo Inoue, Ryoichi Yoshikawa
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Patent number: 8423921Abstract: Data including information related to each area with a graphic disposed therein is inputted to the writing apparatus. The area is delimited with meshes each having a predetermined size. Next, an area value of a graphic lying within each of the meshes and its center-of-gravity position are determined. For every mesh, a check is made whether the area value is less than or equal to a predetermined value. When the area value is less than or equal to the predetermined value, a range allowable for an x coordinate of the center-of-gravity position is determined and a check is made whether an actual x coordinate falls within this range. Next, a range allowable for a y coordinate of the center-of-gravity position is determined and a check is made whether an actual y coordinate falls within this range.Type: GrantFiled: May 5, 2009Date of Patent: April 16, 2013Assignee: NuFlare Technology, Inc.Inventors: Yujin Handa, Kei Hasegawa, Tomohiro Iijima
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Patent number: 8352889Abstract: A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.Type: GrantFiled: December 13, 2011Date of Patent: January 8, 2013Assignee: NuFlare Technology, Inc.Inventors: Keiko Emi, Junichi Suzuki, Takayuki Abe, Tomohiro Iijima, Jun Yashima
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Patent number: 8309283Abstract: A writing method includes calculating a proximity effect-corrected dose for correcting a proximity effect in charged particle beam writing, for each first mesh region made by virtually dividing a writing region of a target object into a plurality of first mesh regions of a first mesh size, calculating a fogging effect-corrected dose by using the proximity effect-corrected dose calculated and an area density in the first mesh size with respect to a part of a calculation region for calculating the fogging effect-corrected dose for correcting a fogging effect in the charged particle beam writing, and by using an area density in a second mesh size larger than the first mesh size with respect to a remaining part of the calculation region, synthesizing the fogging effect-corrected dose and the proximity effect-corrected dose for the each first mesh region, and writing a pattern on the target object by using a charged particle beam based on a synthesized correction dose.Type: GrantFiled: December 30, 2009Date of Patent: November 13, 2012Assignee: NuFlare Technology, Inc.Inventors: Yasuo Kato, Jun Yashima, Hiroshi Matsumoto, Tomoo Motosugi, Tomohiro Iijima, Takayuki Abe
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Publication number: 20120108063Abstract: A beam dose computing method includes dividing a surface area of a target object into include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions to create a map of base doses of the beam in respective of said second regions and to prepare a map of proximity effect correction coefficients in respective of said second regions, using the maps to determine second corrected doses of the beam for proximity effect correction in the third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.Type: ApplicationFiled: December 13, 2011Publication date: May 3, 2012Applicant: NuFlare Technology, Inc.Inventors: Keiko EMI, Junichi SUZUKI, Takayuki ABE, Tomohiro IIJIMA, Jun YASHIMA
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Patent number: 7872745Abstract: A pattern inspection apparatus includes a light source configured to emit a pulsed light, a stage on which an inspection target workpiece is placed, a sensor, including a plurality of light receiving elements two-dimensionally arrayed, configured to capture a pattern image in a two-dimensional region of the inspection target workpiece which is irradiated with the pulsed light, by using the plurality of light receiving elements, and a comparing unit configured to compare data of the pattern image with predetermined reference pattern image data, wherein the stage moves to be shifted by a number of pixels, being the number of natural number times one pixel, between pulses of the pulsed light.Type: GrantFiled: August 6, 2008Date of Patent: January 18, 2011Assignee: NuFlare Technology, Inc.Inventors: Takayuki Abe, Tomohiro Iijima, Hideo Tsuchiya, Tetsuyuki Arai
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Publication number: 20100173235Abstract: A writing method includes calculating a proximity effect-corrected dose for correcting a proximity effect in charged particle beam writing, for each first mesh region made by virtually dividing a writing region of a target object into a plurality of first mesh regions of a first mesh size, calculating a fogging effect-corrected dose by using the proximity effect-corrected dose calculated and an area density in the first mesh size with respect to a part of a calculation region for calculating the fogging effect-corrected dose for correcting a fogging effect in the charged particle beam writing, and by using an area density in a second mesh size larger than the first mesh size with respect to a remaining part of the calculation region, synthesizing the fogging effect-corrected dose and the proximity effect-corrected dose for the each first mesh region, and writing a pattern on the target object by using a charged particle beam based on a synthesized correction dose.Type: ApplicationFiled: December 30, 2009Publication date: July 8, 2010Applicant: NuFlare Technology, Inc.Inventors: Yasuo KATO, Jun Yashima, Hiroshi Matsumoto, Tomoo Motosugi, Tomohiro Iijima, Takayuki Abe
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Patent number: 7740991Abstract: A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position onType: GrantFiled: July 28, 2006Date of Patent: June 22, 2010Assignee: NuFlare Technology, Inc.Inventors: Keiko Emi, Junichi Suzuki, Takayuki Abe, Tomohiro Iijima, Jun Yashima
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Patent number: 7657863Abstract: A method for calculating area values of a pattern written by using a charged particle beam, includes virtually dividing a pattern into a plurality of mesh-like first square regions surrounded by first grids defined at intervals of a predetermined size, virtually dividing the pattern into a plurality of mesh-like second square regions surrounded by second grids defined at intervals of the predetermined size, wherein the second grids being positionally deviated from the first grids by a half of the predetermined size, distributing an area value of a sub-pattern in each of the second square regions to a plurality of apexes of each of the second square regions such that a center-of-gravity position of the sub-pattern does not change, wherein the sub-pattern being a part of the pattern, and outputting the distributed area values as area values, for correcting a proximity effect, defined at the center position of each of the first square regions.Type: GrantFiled: January 3, 2007Date of Patent: February 2, 2010Assignee: NuFlare Technology, Inc.Inventors: Tomohiro Iijima, Masafumi Ise
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Publication number: 20090285494Abstract: Data including information related to each area with a graphic disposed therein is inputted to the writing apparatus. The area is delimited with meshes each having a predetermined size. Next, an area value of a graphic lying within each of the meshes and its center-of-gravity position are determined. For every mesh, a check is made whether the area value is less than or equal to a predetermined value. When the area value is less than or equal to the predetermined value, a range allowable for an x coordinate of the center-of-gravity position is determined and a check is made whether an actual x coordinate falls within this range. Next, a range allowable for a y coordinate of the center-of-gravity position is determined and a check is made whether an actual y coordinate falls within this range.Type: ApplicationFiled: May 5, 2009Publication date: November 19, 2009Applicant: NuFlare Technology, Inc.Inventors: Yujin HANDA, Kei Hasegawa, Tomohiro Iijima
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Patent number: 7619230Abstract: A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing regiType: GrantFiled: September 27, 2006Date of Patent: November 17, 2009Assignee: NuFlare Technology, Inc.Inventors: Junichi Suzuki, Keiko Emi, Takayuki Abe, Tomohiro Iijima, Hideyuki Tsurumaki
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Patent number: 7608845Abstract: A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among a time having passed since the writing start time, the total writing time, and the base dose, a third part configured to acquire a fogging effect correction coefficient at the arbitrary time by using a second correlation among the time, the total writing time and the coefficient, a forth part configured to calculate a beam dose at the arbitrary time by using the base dose and the coefficient, a fifth part configured to calculate a beam irradiation time based on the beam dose, a deflector for deflecting the beam, and an aperture for blocking the beam.Type: GrantFiled: November 19, 2007Date of Patent: October 27, 2009Assignee: NuFlare Technology, Inc.Inventors: Takayuki Abe, Junichi Suzuki, Tomohiro Iijima, Hideyuki Tsurumaki
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Patent number: 7511290Abstract: A method for writing a pattern on a workpiece by use of a charged particle beam, the method includes calculating a corrected dose including at least a proximity effect correction dose for correction of proximity effect, calculating a corrected residual difference-corrected dose for correcting a correction residual difference of the corrected dose, calculating a exposure dose of the charged particle beam to be corrected by the corrected dose as corrected by the correction residual difference-corrected dose, and irradiating the charged particle beam onto the workpiece in such a way as to become the exposure dose.Type: GrantFiled: February 6, 2007Date of Patent: March 31, 2009Assignee: NuFlare Technology, Inc.Inventors: Junichi Suzuki, Keiko Emi, Takayuki Abe, Tomohiro Iijima
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Publication number: 20090040513Abstract: A pattern inspection apparatus includes a light source configured to emit a pulsed light, a stage on which an inspection target workpiece is placed, a sensor, including a plurality of light receiving elements two-dimensionally arrayed, configured to capture a pattern image in a two-dimensional region of the inspection target workpiece which is irradiated with the pulsed light, by using the plurality of light receiving elements, and a comparing unit configured to compare data of the pattern image with predetermined reference pattern image data, wherein the stage moves to be shifted by a number of pixels, being the number of natural number times one pixel, between pulses of the pulsed light.Type: ApplicationFiled: August 6, 2008Publication date: February 12, 2009Applicant: NuFlare Technology, Inc.Inventors: Takayuki ABE, Tomohiro Iijima, Hideo Tsuchiya, Tetsuyuki Arai