Abstract: The present invention is a resist material containing: (i) a metal compound shown by the following general formula (M-1) and (ii) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.

Abstract: The present invention is a resist material containing: (i) a compound (i-1), which is a (partial) condensate or a (partial) hydrolysis-condensate of a metal compound shown by the following general formula (A-1), or a compound (i-2), which is a reaction product of the compound (i-1) and a dihydric or trihydric alcohol shown by the following general formula (A-2), (ii) a photo-acid generator, (iii) a basic compound, and (iv) an organic solvent. An object of the present invention is to provide a metal-containing resist material having high sensitivity and high resolution particularly in EUV and electron beam lithography; and a patterning process using this material.

Abstract: A display device of which an entire thickness in front and rear directions can be reduced and in which temperature of a lower portion can be prevented from being high is provided. A television device (display device) (100) includes a light source part (2), an optical sheet (5), and a rear frame (6). The light source part (2) is disposed in the upper portion of the television device (television device) (100) and a hollow light-guiding region (7) is provided between the reflection sheet (4) and the optical sheet (5). In the reflection sheet (4), a distance to the optical sheet (5) is less in the lower portion than in the upper portion.

Abstract: A lighting device includes a plurality of light sources, a light diffusion plate, a sheet-like optical member, and a partition. The light diffusion plate is arranged opposite the light sources. The light diffusion plate diffuses light from the light sources. The optical member is disposed between the light diffusion plate and the light sources. The optical member includes a transmitting part that transmits the light emitted from the light sources and a reflecting part that reflects the light emitted from the light sources. The partition is arranged between adjacent light sources. The optical member is held by a support portion that is integrally provided to the partition and protrudes from an end portion of the partition toward the light diffusion plate.

Abstract: A lighting device includes a light source, a light diffusion plate, and a sheet-like optical member. The light diffusion plate is arranged opposite the light source. The light diffusion plate diffuses light from the light source. The optical member is disposed between the light diffusion plate and the light source. The optical member includes a transmitting part that transmits the light emitted from the light source and a reflecting part that reflects the light emitted from the light source. The optical member is supported by a support portion that is integrally provided to the light diffusion plate.

Abstract: A method for measuring a distance of diffusion of a curing catalyst for a thermosetting silicon-containing material includes the steps of: forming a silicon-containing film from a composition containing a thermosetting silicon-containing material, a curing catalyst and a solvent; coating the silicon-containing film with a photosensitive resin composition containing a resin whose solubility in alkaline developer is increased by the action of an acid, an acid generator and a solvent, and subsequently heating to prepare a substrate on which the silicon-containing film and a resin film are formed; irradiating the substrate with a high energy beam or an electron beam to generate an acid and heat-treating the substrate to increase the solubility of the resin in an alkaline developer by the action of the acid in the resin film; dissolving the resin film in an alkaline developer; and measuring a film thickness of the remaining resin.

Abstract: A resist composition comprising a sulfonium salt having formula (1) as PAG, a base polymer, and an organic solvent, when processed by lithography, has light transmittance, acid diffusion suppressing effect, and excellent lithography performance factors such as DOF, LWR and MEF. A lithography process for forming a resist pattern from the composition is also provided.

Abstract: A composition comprising (A) a polymer comprising recurring units (a1) having a carboxyl group protected with an acid labile group and recurring units (a2) having a cyclic ester, cyclic carbonate or cyclic sulfonate structure, (B) a thermal acid generator, and (C) an organic solvent is suited to form a protective film between a substrate and a resist film. Even when a metal-containing resist film is used, the protective film is effective for preventing the substrate from metal contamination.

Abstract: A display device of which an entire thickness in front and rear directions can be reduced and in which temperature of a lower portion can be prevented from being high is provided. A television device (display device) (100) includes a light source part (2), an optical sheet (5), and a rear frame (6). The light source part (2) is disposed in the upper portion of the television device (television device) (100) and a hollow light-guiding region (7) is provided between the reflection sheet (4) and the optical sheet (5). In the reflection sheet (4), a distance to the optical sheet (5) is less in the lower portion than in the upper portion.

Abstract: There is provided a method of manufacturing a group III nitride semiconductor substrate including: a fixing step S10 of fixing a base substrate, which includes a group III nitride semiconductor layer having a semipolar plane as a main surface, to a susceptor; a first growth step S11 of forming a first growth layer by growing a group III nitride semiconductor over the main surface of the group III nitride semiconductor layer in a state in which the base substrate is fixed to the susceptor using an HVPE method; a cooling step S12 of cooling a laminate including the susceptor, the base substrate, and the first growth layer; and a second growth step S13 of forming a second growth layer by growing a group III nitride semiconductor over the first growth layer in a state in which the base substrate is fixed to the susceptor using the HVPE method.

Abstract: It was found that bringing a substance into contact with a plant cell after the plant cell is treated with plasma makes it possible to easily and highly efficiently introduce the substance into the cell without causing a damae regardless of the types of the plant and tissue from which the plant cell is derived.

Abstract: A pattern having a good balance of sensitivity, resolution and LWR is formed by providing a resist film comprising a base resin comprising recurring units having a C4-C6 tertiary alkoxy or alkoxycarbonyl group as an acid labile group and recurring units capable of generating a backbone-bound acid upon exposure, exposing the resist film to radiation, optionally post-exposure baking the resist film at a low temperature of 30-70° C., and developing the film.

Abstract: A sulfonic acid anion-containing polymer having an alkylsulfonium cation not in covalent bond thereto can be readily prepared by reacting a sulfonic acid anion-containing polymer having an ammonium or metal cation with an alkylsulfonium salt under mild conditions. A resist composition comprising the inventive polymer is effective for suppressing acid diffusion since the sulfonium salt is bound to the polymer backbone. When processed by the ArF lithography, the polymer exhibits a lower absorption at the exposure wavelength than the triarylsulfonium salt form PAGs, resulting in improved resolution, mask fidelity, and LWR.

Abstract: An information processing apparatus includes a plurality of partitions, a first controlling device belonging to a first partition among the plurality of partitions, and a second controlling device belonging to a second partition among the plurality of partitions. The first controlling device includes a first processor configured to control the plurality of partitions. The second controlling device includes a second processor configured to control the second partition.

Abstract: A carbon heat source (10) is equipped with: a cylindrical section (11) provided with a cavity (11A) through which there is ventilation communication in the longitudinal axis direction (L) of the carbon heat source (10); and an ignition end (12) which is provided further to the ignition side of the carbon heat source (10) than the cylindrical section (11). Therein, a groove (12A) which connects with the cavity (11A) is formed on the end surface (E) of the ignition side of the ignition end (12).

Abstract: A carbon heat source (10) is equipped with: a cylindrical section (11) provided with a cavity (11A) through which there is ventilation communication in the longitudinal axis direction (L) of the carbon heat source (10); and an ignition end (12) which is provided further to the ignition side of the carbon heat source (10) than the cylindrical section (11). Therein, a groove (12A) which connects with the cavity (11A) is formed on the end surface (E) of the ignition side of the ignition end (12).

Abstract: A projector includes a light source portion; and an optical scanning portion that scans light from the light source portion, wherein the light source portion comprises a first holder that holds a light source, and a second holder that holds an optical portion through which light from the light source is emitted, and the first holder and the second holder are arranged in that order from a light emitting direction.

Abstract: A resist composition comprising a polymer comprising recurring units having an acid labile group of cyclopentyl with tert-butyl or tert-amyl pendant is coated onto a substrate, baked, exposed to high-energy radiation, PEB and developed in an organic solvent to form a negative pattern. A fine hole pattern can be formed from the resist composition with advantages including high dissolution contrast, good size control and wide depth of focus.

Abstract: A negative pattern is formed by coating a resist composition comprising (A) a polymer having an acid labile group, adapted to change its polarity under the action of acid, (B) a photoacid generator, and (C) an organic solvent onto a substrate, baking, exposing the resist film to high-energy radiation, PEB, and developing in an organic solvent-based developer to selectively dissolve the unexposed region of resist film. The photoacid generator has the formula: R1—COOC(CF3)2—CH2SO3?R2R3R4S+ wherein R1 is a monovalent hydrocarbon group, R2, R3 and R4 are an alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl group, or may bond together to form a ring with the sulfur atom.

Abstract: A carbon heat source (10) is equipped with: a cylindrical section (11) provided with a cavity (11A) through which there is ventilation communication in the longitudinal axis direction (L) of the carbon heat source (10); and an ignition end (12) which is provided further to the ignition side of the carbon heat source (10) than the cylindrical section (11). Therein, a groove (12A) which connects with the cavity (11A) is formed on the end surface (E) of the ignition side of the ignition end (12).