Patents by Inventor Tomohiro Uemura

Tomohiro Uemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10464107
    Abstract: A substrate processing method for removing a resist from a substrate, the substrate comprising a surface layer which has been cured, and having a pattern disposed inside the resist. The method includes an SPM supplying step of supplying an SPM, formed by mixing sulfuric acid and a hydrogen peroxide solution, to the substrate and a liquid temperature increasing step of changing, in parallel to the SPM supplying step, a mixing ratio of the sulfuric acid and the hydrogen peroxide solution used to form the SPM to increase the liquid temperature of the SPM supplied to the substrate in the SPM supplying step.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: November 5, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Keiji Iwata, Sei Negoro, Tomohiro Uemura, Yuji Sugahara
  • Publication number: 20170165313
    Abstract: A composition and method are disclosed for ameliorating infertility, the composition an extract of one or both of pericarp and fruit of a plant of the genus Trapa, or one or compounds isolated therefrom, as the active ingredient that is safe and has high activity, in which the one or more compounds preferably has an inhibition activity against one or more reactions involving a formation of advanced glycation end products from proteins and saccharides, an enhancing activity against one or more reactions involving a decomposition of the advanced glycation end products and an activity to reduce allergic symptoms.
    Type: Application
    Filed: January 28, 2016
    Publication date: June 15, 2017
    Inventors: Masao Jinno, Michio Yamada, Shoko Takeshita, Tomohiro Uemura
  • Publication number: 20150114432
    Abstract: A substrate processing method that is a method for removing a resist, the surface layer of which has been cured, from a substrate having a pattern disposed inside the resist and includes an SPM supplying step of supplying an SPM, formed by mixing sulfuric acid and a hydrogen peroxide solution, to the substrate and a liquid temperature increasing step of changing, in parallel to the SPM supplying step, a mixing ratio of the sulfuric acid and the hydrogen peroxide solution used to form the SPM to increase the liquid temperature of the SPM supplied to the substrate in the SPM supplying step.
    Type: Application
    Filed: October 21, 2014
    Publication date: April 30, 2015
    Inventors: Keiji IWATA, Sei NEGORO, Tomohiro UEMURA, Yuji SUGAHARA
  • Patent number: 6607719
    Abstract: A keratotic plug remover composition comprising a polymer compound having a salt forming group is disclosed. The composition according to the invention can effectively remove keratotic plugs in the skin pores, so that the conspicuousness of the skin pores is mitigated and clean and healthy skin pores can be maintained. The composition does not hurt the skin.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: August 19, 2003
    Assignee: Kao Corporation
    Inventors: Tomohiro Uemura, Masanori Tanahashi, Yoshiyuki Muroi, Yoshinao Kono
  • Publication number: 20020048560
    Abstract: A keratotic plug remover composition comprising a polymer compound having a salt forming group is disclosed. The composition according to the invention can effectively remove keratotic plugs in the skin pores, so that the conspicuousness of the skin pores is mitigated and clean and healthy skin pores can be maintained. The composition does not hurt the skin.
    Type: Application
    Filed: April 30, 2001
    Publication date: April 25, 2002
    Applicant: KAO CORPORATION
    Inventors: Tomohiro Uemura, Masanori Tanahashi, Yoshiyuki Muroi, Yoshinao Kono
  • Patent number: 6306382
    Abstract: A keratotic plug remover composition comprising a polymer compound having a salt forming group is disclosed. The composition according to the invention can effectively remove keratotic plugs in the skin pores, so that the conspicuousness of the skin pores is mitigated and clean and healthy skin pores can be maintained. The composition does not hurt the skin.
    Type: Grant
    Filed: November 12, 1996
    Date of Patent: October 23, 2001
    Assignee: Kao Corporation
    Inventors: Tomohiro Uemura, Masanori Tanahashi, Yoshinao Kono
  • Patent number: 5512277
    Abstract: A keratotic plug remover composition comprising a polymer compound having a salt forming group is disclosed. The composition according to the invention can effectively remove keratotic plugs in the skin pores, so that the conspicuousness of the skin pores is mitigated and clean and healthy skin pores can be maintained. The composition does not hurt the skin.
    Type: Grant
    Filed: March 21, 1994
    Date of Patent: April 30, 1996
    Assignee: Kao Corporation
    Inventors: Tomohiro Uemura, Masanori Tanahashi, Yoshiyuki Muroi, Yoshinao Kono
  • Patent number: D388533
    Type: Grant
    Filed: December 5, 1996
    Date of Patent: December 30, 1997
    Assignee: Kao Kabushiki Kaisha (Kao Corporation)
    Inventors: Tomohiro Uemura, Koichi Ishida
  • Patent number: D388534
    Type: Grant
    Filed: December 5, 1996
    Date of Patent: December 30, 1997
    Assignee: Koa Kabushiki Kaisha (Kao Corporation)
    Inventors: Tomohiro Uemura, Koichi Ishida