Patents by Inventor Tomoko Oka

Tomoko Oka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6808654
    Abstract: The present invention discloses a double-layer structured low-resistance and low-reflectivity transparent conductive film, comprising a lower high-reflectivity conductive layer containing a fine metal powder in a silica-based matrix and a silica-based low-reflectivity layer, suitable for imparting electromagnetic shielding property and anti-dazzling property to a CRT.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: October 26, 2004
    Assignee: Mitsubishi Materials Corporation
    Inventors: Toshiharu Hayashi, Tomoko Oka, Akira Nishihara
  • Patent number: 6451433
    Abstract: A fine metal particle-dispersion solution and a method for the solution are disclosed which enables to form a transparent conductive film having an uniform distribution of at least two kinds of metals and is produced by mixing an aqueous solution (A) of at lest one metal salt, the metal comprising one or more metals selected from the group consisting of Au, Pt, Ir, Pd, Ag, Rh, Ru, Os, Re and Cu and an aqueous solution (B) including citrate ion and ferrous ion under an atmosphere having substantially no oxygen to produce fine metal particles. A multi-layers conductive film having a low reflectivity, a low resistance and an excellent durability is available by using the dispersion solution of the present invention comprising Ag—Pd fine particles.
    Type: Grant
    Filed: September 14, 1999
    Date of Patent: September 17, 2002
    Assignee: Mitsubishi Materials Corporation
    Inventors: Tomoko Oka, Toshiharu Hayashi, Daisuke Shibuta
  • Publication number: 20020063242
    Abstract: The present invention discloses a double-layer structured low-resistance and low-reflectivity transparent conductive film, comprising a lower high-reflectivity conductive layer containing a fine metal powder in a silica-based matrix and a silica-based low-reflectivity layer, suitable for imparting electromagnetic shielding property and anti-dazzling property to a CRT.
    Type: Application
    Filed: September 10, 2001
    Publication date: May 30, 2002
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Toshiharu Hayashi, Tomoko Oka, Daisuke Shibuta
  • Patent number: 6086790
    Abstract: The present invention discloses a double-layer structured low-resistance and low-reflectivity transparent conductive film, comprising a lower high-reflectivity conductive layer containing a fine metal powder in a silica-based matrix and a silica-based low-reflectivity layer, suitable for imparting electromagnetic shielding property and anti-dazzling property to a CRT.
    Type: Grant
    Filed: June 17, 1998
    Date of Patent: July 11, 2000
    Assignee: Mitsubishi Materials Corporation
    Inventors: Toshiharu Hayashi, Tomoko Oka, Daisuke Shibuta