Patents by Inventor Tomoko Okano

Tomoko Okano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11990314
    Abstract: Sample preparation system and method which enable electron microscope observation of a sample slice with simple structure and process are provided. The sample preparation system includes at least one of a plasma treatment apparatus and a sputtering apparatus, as well as a slice collecting apparatus. The plasma treatment apparatus is configured to feed a resin tape in a plasma irradiation area to irradiate the resin tape with plasma, thereby continuously hydrophilizing the resin tape. The sputtering apparatus is configured to feed the resin tape in a sputtering area to continuously perform sputtering on the resin tape, thereby imparting conductivity to the resin tape. The slice collecting apparatus is configured to serially collect slices cut out from a sample onto the resin tape having been subjected to plasma treatment or sputtering.
    Type: Grant
    Filed: December 26, 2019
    Date of Patent: May 21, 2024
    Assignees: SANYU ELECTRON CO., LTD., KEIO UNIVERSITY
    Inventors: Shinsuke Shibata, Tomoko Shindo, Hideyuki Okano, Shuichi Goto
  • Patent number: 5177043
    Abstract: This invention relates to a catalytic component for the polymerization of .alpha.-olefins and provides a catalytic component of magnesium support type capable of exhibiting a high stereoregularity while maintaining an improved strength as well as a high catalytic activity. The features thereof consist in a catalyst component for the polymerization of .alpha.-olefins obtained by contacting (A) a solid component comprising, as essential components, magnesium, titanium, a halogen and an electron-donating compound with (D) an olefin in the presence of (B) a trialkylaluminum and (C) a dimethoxy group-containing compound represented by the general formula R.sup.1 R.sup.2 Si(OCH.sub.3).sub.2 where R.sup.1 and R.sup.2 are, same or different, aliphatic hydrocarbon groups with 1 to 10 carbon atoms and having a volume, calculated by the quantum chemistry calculation, of 230 to 500 .ANG..sup.3 and an electron density of oxygen atoms in the methoxy group, calculated similarly, ranging from 0.685 to 0.800 A. U.
    Type: Grant
    Filed: March 22, 1991
    Date of Patent: January 5, 1993
    Assignee: Tonen Chemical Corporation
    Inventors: Naomi Koyama, Hiroyuki Furuhashi, Miyuki Usui, Tomoko Okano, Masahide Murata, Satoshi Ueki, Akira Nakano