Abstract: A resist composition comprising a polymer or polymer-bound photoacid generator is provided, the polymer comprising repeat units derived from a sulfonium or iodonium salt having a urethane, thiourethane or urea bond in a linker between a polymerizable unsaturated bond and a fluorosulfonic acid site. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition contains an acid generator which is a sulfonium or iodonium salt containing a sulfonic acid anion having a cyclic structure and a fluorosulfonic acid site which are linked by a linker. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a polymer is provided, the polymer comprising photo-decomposable repeat units derived from a sulfonium salt having a polymerizable unsaturated bond, a sulfonium cation site, and a link therebetween, the link having a urethane bond, thiourethane bond or urea bond. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: An onium salt having formula (1) is provided. A chemically amplified resist composition comprising the onium salt as a PAG has advantages including solvent solubility and improved lithography properties such as high sensitivity, high contrast, EL, and LWR when processed by photolithography using high-energy radiation.

Abstract: An optical apparatus includes a light emitting apparatus and a host apparatus. The light emitting apparatus includes a housing extending in a first direction, a light emitting device mounted in the housing, an optical connector including a first optical connection part provided at one end of the housing, and an electrical connector including a first electrical connection part provided at one end of the housing and receiving a voltage to drive the light emitting device. The host apparatus includes a host optical connector including a second optical connection part which faces the first optical connection part and is optically coupled thereto, a host electrical connector including a second electrical connection part facing the first electrical connection part and being electrically connected to the first electrical connection part, and a host board mounting the host optical connector and the host electrical connector thereon.

Abstract: Provided is a novel onium salt used for a resist composition that has high sensitivity and excellent resolution, improved LWR and CDU, and that can inhibit collapse of a resist pattern for both of positive-type and negative-type resists in lithography: an onium salt represented by the following general formula (1), wherein RALU represents any one of a tertiary ether, tertiary carbonate, or acetal formed together with the adjacent oxygen atom and having a cyclic structure; RF represents any one of a fluorine atom, a fluorine-containing alkyl group having 1 to 6 carbon atoms, and a nitro group; Ra represents a hydrocarbyl group having 1 to 20 carbon atoms; n1 represents an integer of 0 or 1; n2 and n3 represent an integer of 1 or 2; one of RF and one of —O—RALU are bonded to carbon atoms adjacent to each other; n4 represents an integer of 0 to 3; and Z+ represents an onium cation.

Abstract: A resist composition comprising a sulfonium salt of carboxylic acid having a chromone structure as the quencher is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a sulfonium salt of carboxylic acid having a coumarin or thiocoumarin structure as the quencher is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: An onium salt compound consisting of a sulfonate anion having the structure that a polymerizable unsaturated bond is linked to an iodized aromatic group via a carbon chain of two or more carbon atoms and a sulfonium or iodonium cation is provided. A resist composition comprising a polymer comprising repeat units derived from the onium salt has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a base polymer and a quencher containing a compound having the formula (A) is provided.

Abstract: A resist composition comprising a quencher containing a sulfonium salt having the formula (A).

Abstract: A salt having formula (1) or (2) serving as an acid diffusion inhibitor is provided as well as a resist composition comprising the acid diffusion inhibitor. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography properties such as CDU and LWR.

Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium or iodonium salt of iodized benzamide group-containing fluorinated sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: An onium salt consisting of an anion containing an iodized aromatic group and two sulfonate groups and a sulfonium or iodonium cation is a useful photoacid generator. A chemically amplified resist composition comprising the photoacid generator forms a pattern of rectangular profile with a good balance of sensitivity, CDU, LWR, MEF, and DOF when it is processed by photolithography using high-energy radiation.

Abstract: A negative resist composition is provided comprising a base polymer, a quencher in the form of a sulfonium salt of a weaker acid than a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group, the sulfonium salt having at least two polymerizable double bonds in the molecule, and an acid generator capable of generating a sulfonic acid which is fluorinated at ?- and/or ?-position of the sulfo group. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

Abstract: An engine is provided, which includes a combustion chamber defined by a crown surface of a piston, an inner wall surface of a cylinder in which the piston is slidably accommodated, and a pentroof-type ceiling surface formed in a cylinder head and formed with an intake port and an exhaust port. The crown surface includes an exhaust-side bottom part, an intake-side bottom part, an exhaust-side sloped surface rising toward a center part of the crown surface from the exhaust-side bottom part, an intake-side sloped surface rising toward the center part from the intake-side bottom part, and a flat surface provided continuously between upper ends of the exhaust-side and intake-side sloped surfaces, and extending perpendicularly to a cylinder axial direction in the center part of the crown surface. A surface area of the flat surface is larger than a surface area of the exhaust-side sloped surface.

Abstract: A negative resist composition is provided comprising a base polymer and an acid generator in the form of a sulfonium salt having at least two polymerizable double bonds in the molecule. The resist composition adapted for organic solvent development exhibits a high resolution and improved LWR or CDU.

Abstract: An engine system is provided, which includes an engine, a swirl control valve, and a controller. The engine includes a cylinder, a piston, and a fuel injection valve provided incliningly with respect to an axial direction of the piston and configured to directly inject fuel into the cylinder. The swirl control valve is provided inside an intake passage and generates a swirl flow inside the cylinder at least when the valve closes. When an engine load is below a given threshold, the controller controls the swirl control valve to close, and controls the fuel injection valve to inject fuel during an intake stroke. While the engine load is below the threshold, at a fixed engine speed, the controller controls to advance a fuel injection timing when the engine load is at a first load, compared with at a second load higher than the first load.

Abstract: An engine system is provided, which includes an engine, a swirl control valve, an EGR passage, an EGR gas adjusting mechanism, and a controller. The engine includes a cylinder, a piston, and a fuel injection valve. The swirl control valve is provided inside an intake passage and generates a swirl flow inside the cylinder when it closes. When an engine load is at or below a given threshold, the controller controls the swirl control valve to close. While the engine load is the threshold or below, the controller controls the EGR gas adjusting mechanism such that, at a fixed engine speed, an increase rate of an EGR gas amount with respect to an increase in the engine load is lower in a first load range than in a second load range, the first load range being on a higher load side of the second load range and including the threshold.

Abstract: An engine system is provided, which includes an engine, a swirl control valve, and a controller. The engine includes a cylinder, a piston, and a fuel injection valve provided incliningly with respect to an axial direction of the piston and configured to directly inject fuel into the cylinder. The swirl control valve is provided inside an intake passage and generates a swirl flow inside the cylinder at least when the valve closes. When an engine load is below a given threshold, the controller controls the swirl control valve to close, and controls the fuel injection valve to inject fuel during an intake stroke. While the engine load is below the threshold, at a fixed engine speed, the controller controls to advance a fuel injection timing when the engine load is at a first load, compared with at a second load higher than the first load.