Patents by Inventor Tomonori Nakano
Tomonori Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11918449Abstract: A medical device is disclosed for collecting substances inside a body lumen. The medical device includes an elongated shaft portion; a filter portion that has multiple gaps, that is formed in a net shape, that is deformable to be in an expanded state where the filter portion has a basket shape so as to form a concave portion, and that is deformable from the expanded state to be in a contracted state where an opening end portion of the concave portion is contracted; and a support portion that is formed to include a gap larger than gaps of the filter portion and that includes an interlock portion interlocked with the opening end portion of the filter portion and a support side connection portion connected to the shaft portion.Type: GrantFiled: April 25, 2017Date of Patent: March 5, 2024Assignee: TERUMO KABUSHIKI KAISHAInventors: Junichi Kobayashi, Tomonori Hatta, Taiga Nakano
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Patent number: 11920674Abstract: In this shift device, in a case in which an external force has acted on a lever when an operating mechanism is causing the lever to pivot, a clutch mechanism permits rotation of a first detent plate with respect to a second detent plate, such that pivoting of the lever is permitted. Note that a restraining mechanism urges the lever toward a shift position. This enables to the restraining mechanism to urge the lever separately to the clutch mechanism, thereby enabling the degrees of freedom for setting a biasing load on the lever by the restraining mechanism to be increased.Type: GrantFiled: March 18, 2022Date of Patent: March 5, 2024Assignee: KABUSHIKI KAISHA TOKAI-RIKA-DENKI-SEISAKUSHOInventors: Tomonori Hayase, Koji Imai, Tomoaki Asai, Kota Nishida, Yohei Nakano, Yosuke Murakami, Munetoshi Makimura
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Publication number: 20220199356Abstract: A charged particle beam apparatus including a winding aberration corrector capable of correcting a chromatic aberration is provided. A multi-pole lens includes a magnetic core 150, a plurality of current lines 101 to 112, a plurality of wire-shaped electrodes 301 to 312, insulating electrode fixing portions 313 to 342 for fixing the plurality of electrodes to a structure in a vacuum container, and conductive shields 320, 321 set to a reference potential, which are provided between the electrode fixing portion and a central axis of the magnetic core, main line portions of the plurality of current lines are arranged axisymmetrically with respect to the central axis of the magnetic core along an inner wall of the magnetic core, and portions of the plurality of electrodes parallel to the central axis of the magnetic core are arranged axisymmetrically with respect to the central axis of the magnetic core.Type: ApplicationFiled: April 19, 2019Publication date: June 23, 2022Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Tomonori NAKANO, Yu YAMAZAWA, Hideo KASHIMA
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Publication number: 20210249218Abstract: Provided is a winding type aberration corrector that generates a multipole field, in which mechanical positional accuracy required to dispose the current wires can be mitigated. For this purpose, a multipole lens constituting the aberration corrector includes a magnetic core, and a plurality of current wires, in which a plurality of grooves are provided in an inner wall of the magnetic core, centers of the plurality of grooves being disposed axisymmetrically relative to a central axis of the magnetic core, and main wire portions of the plurality of current wires are respectively disposed in the plurality of grooves of the magnetic core.Type: ApplicationFiled: May 10, 2018Publication date: August 12, 2021Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Tomonori NAKANO, Yu YAMAZAWA
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Patent number: 11069505Abstract: In order to provide an aberration corrector with a wide aberration correction range, easy control, highly accurate aberration correction, and a low cost, an aberration corrector, passing an electron beam through a central axis 201, includes a first current line group (101 to 112) which is arranged parallel to an optical axis at a position separated by R1 from the central axis, and excites a first multipole field, and a second current line group (21 to 32) which is arranged parallel to the optical axis at a position separated by R2 from the central axis, and independently excites a second multipole field having an order and intensity different from those of the first multipole field.Type: GrantFiled: December 27, 2016Date of Patent: July 20, 2021Assignee: HITACHI HIGH-TECH CORPORATIONInventor: Tomonori Nakano
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Patent number: 11004650Abstract: Stability of a power source required to operate an aberration corrector is lowered in a wire aberration corrector. Accordingly, a power source that is more inexpensive than a power source in the related art may be used and apparatus cost may be reduced. A multipole lens that is provided in an aberration corrector includes a plurality of pairs of current lines 101 to 112 that are each provided on the same plane in an axisymmetric manner around an optical-axis 100. The current lines each include a main line section 103 that is parallel to the optical-axis and a return line section 116 that faces the main line section. A current in the return line section flows in a direction opposite to a current in the main line section in components parallel to the optical-axis. A distance R2 between the optical-axis and the return line section is larger than a distance R1 between the optical-axis and the main line section.Type: GrantFiled: August 28, 2017Date of Patent: May 11, 2021Assignee: HITACHI HIGH-TECH CORPORATIONInventor: Tomonori Nakano
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Publication number: 20200373117Abstract: Stability of a power source required to operate an aberration corrector is lowered in a wire aberration corrector. Accordingly, a power source that is more inexpensive than a power source in the related art may be used and apparatus cost may be reduced. A multipole lens that is provided in an aberration corrector includes a plurality of pairs of current lines 101 to 112 that are each provided on the same plane in an axisymmetric manner around an optical-axis 100. The current lines each include a main line section 103 that is parallel to the optical-axis and a return line section 116 that faces the main line section. A current in the return line section flows in a direction opposite to a current in the main line section in components parallel to the optical-axis. A distance R2 between the optical-axis and the return line section is larger than a distance R1 between the optical-axis and the main line section.Type: ApplicationFiled: August 28, 2017Publication date: November 26, 2020Inventor: Tomonori NAKANO
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Publication number: 20200152414Abstract: In order to provide an aberration corrector with a wide aberration correction range, easy control, highly accurate aberration correction, and a low cost, an aberration corrector, passing an electron beam through a central axis 201, includes a first current line group (101 to 112) which is arranged parallel to an optical axis at a position separated by R1 from the central axis, and excites a first multipole field, and a second current line group (21 to 32) which is arranged parallel to the optical axis at a position separated by R2 from the central axis, and independently excites a second multipole field having an order and intensity different from those of the first multipole field.Type: ApplicationFiled: December 27, 2016Publication date: May 14, 2020Inventor: Tomonori NAKANO
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Patent number: 10446361Abstract: In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.Type: GrantFiled: July 1, 2015Date of Patent: October 15, 2019Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Zhaohui Cheng, Tomonori Nakano, Kotoko Urano, Takeyoshi Ohashi, Yasunari Sohda, Hideyuki Kazumi
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Publication number: 20180190469Abstract: In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.Type: ApplicationFiled: July 1, 2015Publication date: July 5, 2018Inventors: Zhaohui CHENG, Tomonori NAKANO, Kotoko URANO, Takeyoshi OHASHI, Yasunari SOHDA, Hideyuki KAZUMI
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Patent number: 9530614Abstract: It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.Type: GrantFiled: December 17, 2012Date of Patent: December 27, 2016Assignee: Hitachi High-Technologies CorporationInventors: Kotoko Urano, Tomonori Nakano, Yoichi Ose
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Patent number: 9378703Abstract: A KVM switch that is connected between servers, and at least one set of a keyboard, a mouse and a monitor, comprising: an acquiring portion that acquires information showing a screen resolution to which the monitor is capable of adapting, from the monitor; an analysis portion that analyzes a screen resolution of a video signal output from a corresponding server, based on a horizontal synchronizing signal and a vertical synchronizing signal received from each of the servers; a determination portion that determines whether the analyzed screen resolution exceeds the screen resolution shown by the acquired information; a conversion portion that, when the analyzed screen resolution exceeds the screen resolution shown by the acquired information, converts the analyzed screen resolution into the screen resolution shown by the acquired information; and an output portion that outputs the video signal having the converted screen resolution to the monitor.Type: GrantFiled: January 30, 2009Date of Patent: June 28, 2016Assignee: FUJITSU COMPONENT LIMITEDInventor: Tomonori Nakano
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Patent number: 9343260Abstract: In order to realize a multiple assembled easily with high accuracy, a multipole having assembly accuracy within 10 micrometer and within several seconds of angle is achieved by fixing multipole elements by being guided by grooves provided on an inner side of a cylindrical housing to form the multipole.Type: GrantFiled: February 29, 2012Date of Patent: May 17, 2016Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kotoko Urano, Takeshi Kawasaki, Noboru Moriya, Tomonori Nakano
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Patent number: 9287084Abstract: Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.Type: GrantFiled: January 28, 2015Date of Patent: March 15, 2016Assignee: Hitachi High-Technologies CorporationInventors: Zhaohui Cheng, Hideo Kashima, Hiroaki Baba, Takeyoshi Ohashi, Tomonori Nakano, Kotoko Urano, Naomasa Suzuki
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Publication number: 20150248944Abstract: Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.Type: ApplicationFiled: January 28, 2015Publication date: September 3, 2015Inventors: Zhaohui Cheng, Hideo Kashima, Hiroaki Baba, Takeyoshi Ohashi, Tomonori Nakano, Kotoko Urano, Naomasa Suzuki
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Patent number: 8987680Abstract: In order to provide a multipole measurement apparatus that can easily obtain table data for an aberration corrector that corrects the aberrations in a charged particle beam apparatus, the multipole measurement apparatus, which is provided with an optical system (10), a space into which an aberration corrector (6) is to be inserted, and a position detector (7), measures the relationship between the incident position and angle of a primary charged particle beam on the aberration corrector (6) at a plurality of points, the irradiation position upon the position detector (7), and a multipole, in a state of having a multipole field excited and in a state of not having a multipole field excited, so as to extract multipole components contained in the measurement executed in the state of having the multipole field excited.Type: GrantFiled: May 23, 2012Date of Patent: March 24, 2015Assignee: Hitachi High-Technologies CorporationInventors: Tomonori Nakano, Kotoko Urano, Hiroyuki Ito
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Publication number: 20150060654Abstract: It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.Type: ApplicationFiled: December 17, 2012Publication date: March 5, 2015Applicant: HITACHI HIGH-TECHNOLGIES CORPORATIONInventors: Kotoko Urano, Tomonori Nakano, Yoichi Ose
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Publication number: 20140217304Abstract: In order to provide a multipole measurement apparatus that can easily obtain table data for an aberration corrector that corrects the aberrations in a charged particle beam apparatus, the multipole measurement apparatus, which is provided with an optical system (10), a space into which an aberration corrector (6) is to be inserted, and a position detector (7), measures the relationship between the incident position and angle of a primary charged particle beam on the aberration corrector (6) at a plurality of points, the irradiation position upon the position detector (7), and a multipole, in a state of having a multipole field excited and in a state of not having a multipole field excited, so as to extract multipole components contained in the measurement executed in the state of having the multipole field excited.Type: ApplicationFiled: May 23, 2012Publication date: August 7, 2014Inventors: Tomonori Nakano, Kotoko Urano, Hiroyuki Ito
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Patent number: 8772732Abstract: Disclosed is a scanning charged particle beam apparatus equipped with an aberration corrector, contrived to eliminate resolution degradation in tilt observation by a chromatic third-order aperture aberration without relying on a specific optical system. A controller of the scanning charged particle beam apparatus provides a chromatic third-order aperture aberration measurement method relevant to tilt observation of a specimen. Further, the controller has a chromatic aberration control function relevant to tilt observation of a specimen. By means of the chromatic aberration control function, the controller controls a chromatic aberration to be positive or negative, rather than remaining at 0, in order to eliminate an image blur which occurs in a direction parallel to the specimen surface due to a chromatic third-order aperture aberration and a chromatic aberration at a tilt angle (t1) under observation and another tilt angle (?t1) axially opposite to the tilt angle.Type: GrantFiled: September 29, 2010Date of Patent: July 8, 2014Assignee: Hitachi High-Technologies CorporationInventors: Tomonori Nakano, Takeshi Kawasaki, Kotoko Hirose
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Publication number: 20130320227Abstract: In order to realize a multiple assembled easily with high accuracy, a multipole having assembly accuracy within 10 micrometer and within several seconds of angle is achieved by fixing multipole elements by being guided by grooves provided on an inner side of a cylindrical housing to form the multipole.Type: ApplicationFiled: February 29, 2012Publication date: December 5, 2013Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kotoko Urano, Takeshi Kawasaki, Noboru Moriya, Tomonori Nakano