Abstract: A laminated film includes an insulating substrate resin film and a resistance layer in order in a thickness direction. The resistance layer includes chromium nitride. A temperature coefficient of resistance of the resistance layer is ?400 ppm/° C. or more and ?200 ppm/° C. or less.

Abstract: The present invention relates to an electromagnetic wave transmissive metallic luster member including: a substrate; an indium oxide-containing layer provided on the substrate in a continuous state; and a metal layer formed on the indium oxide-containing layer, in which the metal layer includes, in at least a part thereof, a plurality of portions which are in a discontinuous state each other, and a sheet resistance of a laminate of the metal layer and the indium oxide-containing layer is 2.50 E + 8 ?/? or more.

Abstract: A conductive film (102) includes: a resin film base (50) having a hard coat layer (6) on one main surface of a resin film (5); an underlying layer (20) on a hard coat layer-formed surface of the resin film base; and a metal thin film (10) on the underlying layer. The underlying layer includes at least one layer of inorganic dielectric thin film. The hard coat layer contains first fine particles having an average primary particle diameter of 10 to 100 nm. In a cross section of the hard coat layer, the proportion of an area occupied by the first fine particles is preferably 10% or more.

Abstract: An electrochromic light adjusting member sequentially includes a transparent substrate, a light transmitting electrically conductive layer, and an electrochromic light adjusting layer. The light transmitting electrically conductive layer sequentially includes a first indium-based electrically conductive oxide layer, a metal layer, and a second indium-based electrically conductive oxide layer.

Abstract: The anti-reflection film includes an anti-reflection layer composed of multilayer thin-films having different refractive indexes on one principal surface of a transparent film substrate. The moisture permeability of the anti-reflection film is 15 to 1000 g/m2·24 h. The surface of the anti-reflection layer has an indentation elastic modulus of 20 to 100 GPa, and an arithmetic mean roughness Ra of 3 nm or less. The arithmetic mean roughness Ra of the surface of the anti-reflection layer is preferably 1.5 nm or less. The thin-films constituting the anti-reflection layer can be deposited by, for example, a sputtering method.

Abstract: An electrochromic light adjusting member sequentially includes a transparent substrate, a light transmitting electrically conductive layer, and an electrochromic light adjusting layer. The light transmitting electrically conductive layer sequentially includes a first indium-based electrically conductive oxide layer, a metal layer, and a second indium-based electrically conductive oxide layer.

Abstract: The light transmitting conductive film includes a light transmitting substrate and a non-crystal light transmitting conductive layer, wherein the conditions (1) to (3) below are satisfied when the non-crystal light transmitting conductive layer has a carrier density of Xa×1019(/cm3) and a hole mobility of Ya (cm2/V·s); a heated light transmitting conductive layer has a carrier density of Xc×1019(/cm3) and a hole mobility of Yc (cm2/V·s), wherein the heated light transmitting conductive layer is the non-crystal light transmitting conductive layer after going through heating; and a moving distance L is {(Xc?Xa)2+(Yc?Ya)2}1/2: (1) Xa?Xc (2) Ya?Yc, and (3) the moving distance L is 1.0 or more and 45.0 or less.

Abstract: A light modulation film (1) includes a light modulation layer (30) whose state is reversibly changed between a transparent state by hydrogenation and a reflective state by dehydrogenation, and a catalyst layer (40) that promotes hydrogenation and dehydrogenation in the light modulation layer, in this order on a polymer film substrate (10). light modulation layer (30) includes a light modulation region (32) having a thickness of 10 nm or more on a catalyst layer (40)-side, and an oxidized region (31) on a polymer film substrate (10)-side.

Abstract: The light modulation film (1) is a hydrogen-activation-type light modulation film that includes an inorganic oxide layer (20), a light modulation layer (30) and a catalyst layer (40), in this order on a polymer film substrate (10). The light modulation layer (30) is a layer for reversibly changing states between a transparent state due to hydrogenation and a reflective state due to dehydrogenation. The catalyst layer (40) promotes hydrogenation and dehydrogenation in the light modulation layer. The inorganic oxide layer (20) contains an oxide of an element different from a metal element that constitutes the light modulation layer (30).

Abstract: The anti-reflection film includes an anti-reflection layer composed of multilayer thin-films having different refractive indexes on one principal surface of a transparent film substrate. The moisture permeability of the anti-reflection film is 15 to 1000 g/m2·24 h. The surface of the anti-reflection layer has an indentation elastic modulus of 20 to 100 GPa, and an arithmetic mean roughness Ra of 3 nm or less. The arithmetic mean roughness Ra of the surface of the anti-reflection layer is preferably 1.5 nm or less. The thin-films constituting the anti-reflection layer can be deposited by, for example, a sputtering method.

Abstract: A transparent conductive film includes a crystalline transparent conductive layer obtained by forming an amorphous transparent conductive layer on a polymeric film substrate by sputtering, and crystallizing the amorphous transparent conductive layer. Defining that the amorphous transparent conductive layer has a carrier density represented by na×1019 and Hall mobility represented by ?a, that the crystalline transparent conductive layer has a carrier density represented by nc×1019 and Hall mobility represented by ?c, and that a length of motion L is represented by {(nc?na)2+(?c??a)}1/2, the amorphous transparent conductive layer before the crystallizing process has a carrier density na×1019 of (10?60)×1019/cm3 and Hall mobility ?a of 10-25 cm2/V·s, and the crystalline transparent conductive layer after the crystallizing process has a carrier density nc×1019 of (80?150)×1019/cm3 and Hall mobility ?c of 20-40 cm2/V·s, and the length of motion L is 50-150.

Abstract: There is provided a transparent conductive film achieving low resistance characteristics of a transparent conductive layer. The present invention provides a transparent conductive film including: a polymer film substrate; and a transparent conductive layer formed on at least one surface of the polymer film substrate by means of a sputtering method using a sputtering gas including argon, wherein an existing atomic amount of argon atoms in the transparent conductive layer is 0.24 atomic % or less; an existing atomic amount of hydrogen atoms in the transparent conductive layer is 13×1020 atoms/cm3 or less; and the transparent conductive layer has a specific resistance of 1.1×10?4 ?·cm or more and 2.8×10?4 ?·cm or less.

Abstract: A transparent conductive film includes: a transparent substrate film; an antistripping layer with a thickness of 1.5 nm to 8 nm formed on one main surface of the substrate film; an optical adjustment layer with a thickness of 10 nm to 25 nm formed on the antistripping layer; and a transparent conductor layer with a pattern formed on the optical adjustment layer. The transmission Y value measured from a side of the transparent conductor layer is 88.0 or more and the reflection color difference ?E between a pattern portion and a non-pattern portion is 7.0 or less.

Abstract: The light transmitting conductive film includes a light transmitting substrate and a non-crystal light transmitting conductive layer, wherein the conditions (1) to (3) below are satisfied when the non-crystal light transmitting conductive layer has a carrier density of Xa×1019(/cm3) and a hole mobility of Ya (cm2/V·s); a heated light transmitting conductive layer has a carrier density of Xc×1019(/cm3) and a hole mobility of Yc (cm2/V·s), wherein the heated light transmitting conductive layer is the non-crystal light transmitting conductive layer after going through heating; and a moving distance L is {(Xc?Xa)2+(Yc?Ya)2}1/2: (1) Xa?Xc (2) Ya?Yc, and (3) the moving distance L is 1.0 or more and 45.0 or less.

Abstract: A transparent electroconductive film with a protective film includes: a transparent electroconductive film including a film substrate, an optical adjustment layer formed on one main surface of the film substrate, and a transparent conductive layer formed on the optical adjustment layer; and a protective film bonded to a main surface of the film substrate on a side opposite to the transparent conductive layer, wherein the transparent electroconductive film and the protective film are thermally shrinkable in at least one direction in a main surface, and the absolute value of the maximum thermal shrinkage ratio (%) of the transparent electroconductive film in a main surface is smaller than the absolute value of the maximum thermal shrinkage ratio (%) of the protective film in a main surface, and the difference between the absolute values is 0.05% to 0.6%.

Abstract: A transparent conductive film 1 includes, in this order, a transparent substrate 2, a first optical adjustment layer 4, an inorganic layer 5, and a transparent conductive layer 6. The first optical adjustment layer 4 has refractive index nC lower than refractive index nA of the transparent substrate 2, and thickness TC of 10 nm or more and 35 nm or less. The inorganic layer 5 has refractive index nD that is lower than the absolute value |nC×1.13| of a value obtained by multiplying the refractive index nC of the first optical adjustment layer 4 by 1.13.

Abstract: Disclosed is a polarizing plate with a pressure sensitive adhesive including an infrared reflecting layer and a pressure sensitive adhesive layer in this over on one surface of a polarizer. The pressure sensitive adhesive layer is an outermost surface layer of the polarizing plate with a pressure sensitive adhesive. The polarizing plate with a pressure sensitive adhesive may further include a quarter wave plate.

Abstract: A transparent conductive film includes a transparent substrate film, a hard coat layer, an optical adjustment layer, and a transparent conductor layer, in which the hard coat layer, the optical adjustment layer, and the transparent conductor layer are laminated on the transparent substrate film in this order. The hard coat layer has a thickness of 250 nm to 2,000 nm, and the thickness of the optical adjustment layer is 2% to 10% of the thickness of the hard coat layer. Crystallization of the transparent conductor layer is completed by heating at, for example, 140° C. for 30 minutes.

Abstract: A transparent conductive film includes: a transparent substrate film; an antistripping layer with a thickness of 1.5 nm to 8 nm formed on one main surface of the substrate film; an optical adjustment layer with a thickness of 10 nm to 25 nm formed on the antistripping layer; and a transparent conductor layer with a pattern formed on the optical adjustment layer. The transmission Y value measured from a side of the transparent conductor layer is 88.0 or more and the reflection color difference ?E between a pattern portion and a non-pattern portion is 7.0 or less.

Abstract: There is provided a transparent conductive film which has a transparent conductive layer having low specific resistance and has excellent scratch resistance. A transparent conductive film of the present invention includes: a transparent film substrate; at least three undercoat layers; and a transparent conductive layer in this order. The at least three undercoat layers include: a first undercoat layer formed by a wet coating method; a second undercoat layer that is a metal oxide layer having an oxygen deficient; and a third undercoat layer that is an SiO2 film from a side of the film substrate. The third undercoat layer has a density of 2.0 g/cm3 or more and 2.8 g/cm3 or less. The transparent conductive layer has specific resistance of 1.1×10?4 ?·cm or more and 3.8×10?4 ?·cm or less.