Abstract: A projection optical system comprises a first lens group with positive power, a second lens group with negative power, a third lens group with positive power, a fourth lens group with negative power, and a fifth lens group with positive power. At least one of the first, second, and third lens group has an aspherical surface. A lens arrangement of one embodiment has a plurality of waists of lenses, with aspherical surface before and after a first waist.

Abstract: A catadioptric system includes: a first image forming optical system that includes at least two reflecting mirrors and forms a first intermediate image of a first plane with light originating from the first plane; a second image forming optical system that includes at least two reflecting mirrors and forms a second intermediate image of the first plane with light having traveled via the first image forming optical system; and a refractive type of third image forming optical system that forms a final image of the first plane onto a second plane with light having traveled via the second image forming optical system, and optical members constituting the first image forming optical system, the second image forming optical system and the third image forming optical system are all disposed along a single linear optical axis.

Abstract: A reflective type projection optical system has good reflection characteristics with X rays and can correct aberrations well while controlling the size of reflective mirrors. The projection optical system includes six reflective mirrors and forms a reduced image of a first plane onto a second plane. The system includes a first reflective image forming optical system (G1) for forming an intermediate image of the first plane and a second reflective image forming optical system (G2) for forming an image of the intermediate image of the second plane. The first reflective image forming optical system has, in order of an incidence of light from the side of the first plane, a first reflective mirror (M1), an aperture stop (AS), a second reflective mirror (M2), a third reflective mirror (M3), and a fourth reflective mirror (M4).

Abstract: A projection exposure apparatus has an illumination optical system 3 for illuminating a mask formed with a pattern with beams of radiation, and a projection optical system for forming an image of the pattern on a workpiece on the basis of radiation from the mask. The illumination optical system supplies an illumination radiation having a center wavelength of 180 nm or smaller, and the projection optical system includes at least one concave mirror, fifteen or less pieces of refracting lenses, and four or more aspherical surfaces.

Abstract: An object of the present invention is to provide a projection optical system having a large numerical aperture in which the maximum effective diameter of lens of the optical system is satisfactorily small.

Abstract: An object of the present invention is to provide a projection optical system having a large numerical aperture in which the maximum effective diameter of lens of the optical system is satisfactorily small.

Abstract: An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of the intermediate image. A reflective surface directs light from the first imaging system to the second imaging system. An aspherical corrective optical surface is located at or near the location of the intermediate image for correcting aberrations such as high-order distortion, aberrations due to accumulation of manufacturing tolerances, and spherical aberration. The first imaging system comprises a positive power refractive element and a concave mirror. The second imaging system comprises refractive elements and no concave mirror.

Abstract: An object of the present invention is to provide a projection optical system having a large numerical aperture in which the maximum effective diameter of lens of the optical system is satisfactorily small.

Abstract: An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of the intermediate image. A reflective surface directs light from the first imaging system to the second imaging system. An aspherical corrective optical surface is located at or near the location of the intermediate image for correcting aberrations such as high-order distortion, aberrations due to accumulation of manufacturing tolerances, and spherical aberration. The first imaging system comprises a positive power refractive element and a concave mirror. The second imaging system comprises refractive elements and no concave mirror.

Abstract: A catoptric reduction projection optical system (5) is provided with a first catoptric optical system (10) that images an object (R) in first (object) plane (OP) into a second plane (12) and forming an intermediate image (II) therein, and a second catoptric optical system (20) that images the intermediate image in the second plane onto a third (image) plane (IP), thereby forming a reduced image of the object in the first (object) plane onto the third (image) plane. The first catoptric optical system comprises a first mirror pair comprising two reflective mirrors (M1, M2). The second catoptric optical system comprises a second mirror pair comprising a convex mirror (M3) and a concave mirror (M4). The system also preferably satisfied a number of design conditions.

Abstract: A catoptric reduction projection optical system (5) is provided with a first catoptric optical system (10) that images an object (R) in first (object) plane (OP) into a second plane (12) and forming an intermediate image (II) therein, and a second catoptric optical system (20) that images the intermediate image in the second plane onto a third (image) plane (IP), thereby and forming a reduced image of the object in the first (object) plane onto the third (image) plane. The first catoptric optical system comprises a first mirror pair comprising two reflective mirrors (M1, M2). The second catoptric optical system comprises a second mirror pair comprising a convex mirror (M3) and a concave mirror (M4). The system also preferably satisfied a number of design conditions.

Abstract: A catoptric reduction projection optical system (5) is provided with a first catoptric optical system (10) that images an object (R) in first (object) plane (OP) into a second plane (12) and forming an intermediate image (II) therein, and a second catoptric optical system (20) that images the intermediate image in the second plane onto a third (image) plane (IP), thereby forming a reduced image of the object in the first (object) plane onto the third (image) plane. The first catoptric optical system comprises a first mirror pair comprising two reflective mirrors (M1, M2). The second catoptric optical system comprises a second mirror pair comprising a convex mirror (M3) and a concave mirror (M4). The system also preferably satisfied a number of design conditions.

Abstract: A catoptric reduction projection optical system (100), a projection exposure apparatus (EX) and a method using same. The catoptric reduction projection optical system is capable of forming a reduced magnification image of an object present on a first surface (R) onto a third surface W. The system includes a first catoptric optical system (10) capable of forming an intermediate image of the object onto a second surface (IM) and comprises a first mirror pair having a first reflective mirror (M1) and a second reflective mirror (M2).

Abstract: An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of the intermediate image. A reflective surface directs light from the first imaging system to the second imaging system. An aspherical corrective optical surface is located at or near the location of the intermediate image for correcting aberrations such as high-order distortion, aberrations due to accumulation of manufacturing tolerances, and spherical aberration. The first imaging system comprises a positive power refractive element and a concave mirror. The second imaging system comprises refractive elements and no concave mirror.

Abstract: A catoptric reduction projection optical system (8), exposure apparatus (EX) including same, and a method using same for forming in a second plane (WP) a reduced image of an object (R) in a first plane (RP). The projection optical system includes, in order along a folded optical path on in optical axis (AX), from the first plane to the second plane, a first mirror (M1) having a concavely shaped reflecting surface and a first vertex, a second mirror (M2) having a second vertex, a third mirror (M3) having a convexly shaped reflecting surface and a third vertex, a single aperture stop (AS), and a fourth mirror (M4) having a concavely shaped reflecting surface and a fourth vertex. The projection optical system also preferable satisfies a number of design conditions.

Abstract: A catadioptric optical system (10, 110) capable of forming an image of an object. The system comprises a first optical axis (Z.sub.1) having a first end (12) and a second end (14), with a concave mirror (M.sub.C) arranged at the first end. A second surface (P.sub.2) orthogonal to the first optical axis is provided at the second end. A reflective surface (M) is arranged between the concave mirror and the second surface. A first imaging optical system (A) comprising a first plurality of lenses (L.sub.1 -L.sub.4) is arranged between the reflective surface and the concave mirror. A second imaging optical system (B) comprising a second plurality of lenses (L.sub.5 -L.sub.9) is arranged between the reflective surface and the second surface. The system further includes a second optical axis (Z.sub.2) intersecting the first optical axis at the reflective surface and having a first surface (P.sub.1) disposed along and orthogonal to the secondary optical axis.

Abstract: To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light beam reflected by the beam splitter is reflected by a concave, reflective mirror to form an image of patterns on the object surface inside the concave, reflective mirror. A light beam from the image of the patterns passes through the beam splitter and thereafter forms an image of the patterns through a third converging group on an image plane.

Abstract: In a catadioptric optical system, the first focusing lens system A includes a concave mirror Mc, and it forms an intermediate image of the first plane R. The second focusing lens system B includes an aperture stop AS, and it forms a refocused image of the intermediate image on the second plane W. A reflecting surface M.sub.P1 is placed so that the light flux leaving the first focusing lens system A is guided to the second focusing lens system B. There are one or more lens surfaces that satisfy the conditionh/.phi.<0.85 (1)and one or more lens surfaces that satisfy the condition0.85<h/.phi.<1.2 (2)where h is the height at each lens surface of the light beam that is assumed to be emitted from the intersection of the optical axis of the first plane and passes through the lens surfaces with the maximum numerical aperture, and .phi. is the radius of the diaphragm of the aperture stop.

Abstract: To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light beam reflected by the beam splitter is reflected by a concave, reflective mirror to form an image of patterns on the object surface inside the concave, reflective mirror. A light beam from the image of the patterns passes through the beam splitter and thereafter forms an image of the patterns through a third converging group on an image plane.

Abstract: A catadioptric projection optical system is provided, which can use a beam splitting optical system smaller in size than a conventional polarizing beam splitter, can set a long optical path from a concave reflecting mirror to an image plane, allows easy adjustment of the optical system, and has excellent imaging performance. A light beam from an object surface forms a first intermediate image through a refracting lens group. A light beam from the first intermediate image passes through a polarizing beam splitter and is reflected by a concave reflecting mirror to form a second intermediate image in the polarizing beam splitter. A light beam from the second intermediate image is reflected by the polarizing beam splitter means to form a final image on the image plane via a refracting lens group. The polarizing beam splitter means is arranged near the positions at which the intermediate images are formed.