Patents by Inventor Tomoyuki FUJIHARA

Tomoyuki FUJIHARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering method and sputtering apparatus
    Patent number: 11404255
    Abstract: A sputtering method including: performing a pre-sputtering by emitting sputter particles from a target provided in a sputtering apparatus in a state where the target is shielded by a shielding portion of a shutter provided closed to the target to be capable of opening/closing the target; and, after the pre-sputtering, performing a main-sputtering by emitting the sputter particles from the target in a state where an opening of the shutter is aligned with the target thereby depositing the sputter particles on a substrate. When the pre-sputtering and the main-sputtering are repeatedly performed, a shutter position is changed during the pre-sputtering so as to change a position of the shielding portion aligned with the target.
    Type: Grant
    Filed: September 9, 2020
    Date of Patent: August 2, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazunaga Ono, Atsushi Gomi, Tatsuo Hatano, Yasuhiro Otagiri, Tomoyuki Fujihara, Yuuki Motomura
  • SPUTTERING METHOD AND SPUTTERING APPARATUS
    Publication number: 20210082675
    Abstract: A sputtering method including: performing a pre-sputtering by emitting sputter particles from a target provided in a sputtering apparatus in a state where the target is shielded by a shielding portion of a shutter provided closed to the target to be capable of opening/closing the target; and, after the pre-sputtering, performing a main-sputtering by emitting the sputter particles from the target in a state where an opening of the shutter is aligned with the target thereby depositing the sputter particles on a substrate. When the pre-sputtering and the main-sputtering are repeatedly performed, a shutter position is changed during the pre-sputtering so as to change a position of the shielding portion aligned with the target.
    Type: Application
    Filed: September 9, 2020
    Publication date: March 18, 2021
    Inventors: Kazunaga ONO, Atsushi GOMI, Tatsuo HATANO, Yasuhiro OTAGIRI, Tomoyuki FUJIHARA, Yuuki MOTOMURA