Abstract: A robot system includes a robot, a first movable object on which the robot is mounted and which is configured to move with the robot, a camera mounted on the first movable object to take, while the first movable object is moving, a plurality of images of a reference object that relates to a position of a workpiece, and circuitry configured to control the robot to operate on the workpiece based on the plurality of images while the first movable object is moving.

Abstract: A robot system includes a robot, a first movable object on which the robot is mounted and which is configured to move with the robot, a camera mounted on the first movable object to take, while the first movable object is moving, a plurality of images of a reference object that relates to a position of a workpiece, and circuitry configured to control the robot to operate on the workpiece based on the plurality of images while the first movable object is moving.

Abstract: In an object detecting method according to an embodiment, external reference points are set in external space of a model of an object and an internal reference point is set in internal space of the model. A table is stored in which feature quantities on a local surface of the model are associated with positions of the external reference points and the internal reference point. The feature quantity on the local surface of the model is calculated, and the position of the reference point whose feature quantity is identical to the calculated feature quantity is acquired from the table and is converted into a position in a real space. When the converted position is outside the object, the position is excluded from information for estimation and the position and the attitude of the object are estimated.

Abstract: A robot system includes: a robot arm; a robot hand provided on the robot arm; a contact unit provided on the robot hand for rotating a rotation body of a rotation device which includes the rotation body capable of housing a work and a fixed part rotatably supporting the rotation body and which performs a predetermined process on the work; a detection unit configured to detect a detection target part provided on the rotation body; and a first control unit configured to control operation of the robot arm and the robot hand so that the contact unit rotates the rotation body up to a predetermined rotational position according to a result of detecting the detection target part by the detection unit.

Abstract: A robot system includes a first robot, a second robot, a stocker, and a controller. The first robot includes a first sensor. The second robot includes a second sensor. The stocker is configured to accommodate a plurality of workpieces that are to be held by at least one of the first robot and the second robot. The controller is configured to control the first robot and the second robot. When the first robot holds a first workpiece among the plurality of workpieces, the controller is configured to control the first sensor to recognize shapes of the plurality of workpieces in the stocker and control the second sensor to detect a holding state of the first workpiece held by the first robot.

Abstract: In an object detecting method according to an embodiment, external reference points are set in external space of a model of an object and an internal reference point is set in internal space of the model. A table is stored in which feature quantities on a local surface of the model are associated with positions of the external reference points and the internal reference point. The feature quantity on the local surface of the model is calculated, and the position of the reference point whose feature quantity is identical to the calculated feature quantity is acquired from the table and is converted into a position in a real space. When the converted position is outside the object, the position is excluded from information for estimation and the position and the attitude of the object are estimated.

Abstract: A robot system includes: a robot arm; a robot hand provided on the robot arm; a contact unit provided on the robot hand for rotating a rotation body of a rotation device which includes the rotation body capable of housing a work and a fixed part rotatably supporting the rotation body and which performs a predetermined process on the work; a detection unit configured to detect a detection target part provided on the rotation body; and a first control unit configured to control operation of the robot arm and the robot hand so that the contact unit rotates the rotation body up to a predetermined rotational position according to a result of detecting the detection target part by the detection unit.

Abstract: The height of selected points on the surface of a mask is measured, and if the number of measurement errors in this measurement is less than a predetermined value, an approximated curved surface for the mask surface is generated. The measurement data and height data obtained from the approximated curved surface are then compared, and if there is no point at which the difference between the measurement data and the data obtained from the approximated curved surface is greater than a predetermined threshold value, then it is determined that the reliability of the approximated curved surface is high and the height of the mask surface is corrected in accordance with this approximated curved surface.

Abstract: A writing data processing control apparatus includes an assignment part configured to assign processing of a plurality of pieces of writing data of predetermined divided writing regions, stored in a storage device, one by one to one of a plurality of processing apparatuses in which processing is performed in parallel, and a separation part configured, when a processing error occurred as a result of processing of writing data read from the storage device by a first processing apparatus assigned, to separate the first processing apparatus in which the processing error occurred from assigning targets of subsequent writing data processing, wherein the assignment part reassigns the processing of the writing data in which the processing error occurred to a second processing apparatus being different from the first processing apparatus.

Abstract: The height of selected points on the surface of a mask is measured, and if the number of measurement errors in this measurement is less than a predetermined value, an approximated curved surface for the mask surface is generated. The measurement data and height data obtained from the approximated curved surface are then compared, and if there is no point at which the difference between the measurement data and the data obtained from the approximated curved surface is greater than a predetermined threshold value, then it is determined that the reliability of the approximated curved surface is high and the height of the mask surface is corrected in accordance with this approximated curved surface.

Abstract: A charged-particle beam lithography apparatus includes a charged-particle beam irradiation unit, a deflector which deflects the charged particle beam, a stage which disposes thereon a workpiece for pattern writing and a plurality of marks being regularly laid out in an entire area substantially equal to a pattern writing region of the workpiece, a measurement unit for measuring positions of the marks on the stage through scanning of the charged-particle beam by the deflector, a coefficient calculation unit which uses an approximation equation for correction of a position deviation occurring due to a hardware configuration of the apparatus to perform the fitting of a position deviation amount of each mark by a coordinate system of the apparatus to thereby calculate more than one coefficient of the fitting-applied approximation equation, and a storage unit which performs overwrite-storing whenever the coefficient calculation unit calculates the coefficient.

Abstract: A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern writing using a charged particle beam, based on the predetermined command, and an output part for outputting the state of the predetermined function which has been checked.

Abstract: A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere air pressure, a coordinate value corrector which corrects three-dimensional (3D) coordinate values by use of the value of the air pressure measured, a deflection amount computing unit which calculates the deflection amount of a charged particle beam by using the 3D coordinate values corrected, an irradiator for irradiation of the charged particle beam, and a deflector for deflection of the charged particle beam based on the deflection amount.

Abstract: A writing data processing control apparatus includes an assignment part configured to assign processing of a plurality of pieces of writing data of predetermined divided writing regions, stored in a storage device, one by one to one of a plurality of processing apparatuses in which processing is performed in parallel, and a separation part configured, when a processing error occurred as a result of processing of writing data read from the storage device by a first processing apparatus assigned, to separate the first processing apparatus in which the processing error occurred from assigning targets of subsequent writing data processing, wherein the assignment part reassigns the processing of the writing data in which the processing error occurred to a second processing apparatus being different from the first processing apparatus.

Abstract: A charged-particle beam lithography apparatus includes a charged-particle beam irradiation unit, a deflector which deflects the charged particle beam, a stage which disposes thereon a workpiece for pattern writing and a plurality of marks being regularly laid out in an entire area substantially equal to a pattern writing region of the workpiece, a measurement unit for measuring positions of the marks on the stage through scanning of the charged-particle beam by the deflector, a coefficient calculation unit which uses an approximation equation for correction of a position deviation occurring due to a hardware configuration of the apparatus to perform the fitting of a position deviation amount of each mark by a coordinate system of the apparatus to thereby calculate more than one coefficient of the fitting-applied approximation equation, and a storage unit which performs overwrite-storing whenever the coefficient calculation unit calculates the coefficient.

Abstract: A charged particle beam pattern writing apparatus includes an input part for inputting a predetermined command, a check part for checking a state of a predetermined function used for pattern writing using a charged particle beam, based on the predetermined command, and an output part for outputting the state of the predetermined function which has been checked.

Abstract: A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere air pressure, a coordinate value corrector which corrects three-dimensional (3D) coordinate values by use of the value of the air pressure measured, a deflection amount computing unit which calculates the deflection amount of a charged particle beam by using the 3D coordinate values corrected, an irradiator for irradiation of the charged particle beam, and a deflector for deflection of the charged particle beam based on the deflection amount.