Patents by Inventor Tomoyuki Kuroki

Tomoyuki Kuroki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240174905
    Abstract: A showcase includes a refrigerant circuit and a refrigerant enclosed in the refrigerant circuit. The refrigerant circuit includes a compressor (121), a radiator (122), an expansion valve (123), and an evaporator (124). The refrigerant is a low-GWP refrigerant.
    Type: Application
    Filed: February 2, 2024
    Publication date: May 30, 2024
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinichi FUJINAKA, Masaru TANAKA, Shun OHKUBO, Mitsushi ITANO, Yuuki YOTSUMOTO, Akihito MIZUNO, Tomoyuki GOTOU, Yasufu YAMADA, Hitomi KUROKI, Tatsumi TSUCHIYA, Kenji GOBOU, Daisuke KARUBE, Tatsuya TAKAKUWA
  • Patent number: 11920077
    Abstract: No studies have been made regarding what kinds of refrigerants should be used in a refrigeration cycle device for a vehicle. An air conditioner (1) for a vehicle includes a refrigerant circuit (10) and a refrigerant that is sealed in the refrigerant circuit (10). The refrigerant circuit (10) includes a compressor (80), a first heat exchanger (85), which serves as a heat dissipater in a dehumidifying heating mode, an outside-air heat exchanger (82), a cooling control valve (87), and a second heat exchanger (86), which serves as an evaporator in the dehumidifying heating mode. The refrigerant is a refrigerant having a low GWP.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: March 5, 2024
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Eiji Kumakura, Kazuhiro Furusho, Masaru Tanaka, Shun Ohkubo, Mitsushi Itano, Yuuki Yotsumoto, Akihito Mizuno, Tomoyuki Gotou, Yasufu Yamada, Tatsumi Tsuchiya, Kenji Gobou, Hitomi Kuroki, Daisuke Karube, Tatsuya Takakuwa, Tetsushi Tsuda
  • Patent number: 11912922
    Abstract: A showcase includes a refrigerant circuit and a refrigerant enclosed in the refrigerant circuit. The refrigerant circuit includes a compressor (121), a radiator (122), an expansion valve (123), and an evaporator (124). The refrigerant is a low-GWP refrigerant.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: February 27, 2024
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinichi Fujinaka, Masaru Tanaka, Shun Ohkubo, Mitsushi Itano, Yuuki Yotsumoto, Akihito Mizuno, Tomoyuki Gotou, Yasufu Yamada, Hitomi Kuroki, Tatsumi Tsuchiya, Kenji Gobou, Daisuke Karube, Tatsuya Takakuwa
  • Patent number: 11448409
    Abstract: An air purification device includes a reactor having a hollow shape and extending in one direction, a discharge plasma generator comprising a first electrode disposed on an outer wall of the reactor and a second electrode disposed inside the reactor, where the discharge plasma generator is configured to generate a discharge plasma in a discharge region, a plurality of dielectric particles disposed on a packed-bed of the reactor, a liquid supplier which supplies a liquid into the reactor, and a liquid recoverer which recovers the liquid discharged from the reactor.
    Type: Grant
    Filed: January 28, 2021
    Date of Patent: September 20, 2022
    Assignees: SAMSUNG ELECTRONICS CO., LTD., UNIVERSITY PUBLIC CORPORATION OSAKA
    Inventors: Kitae Park, Jinkyu Kang, Haruhiko Yamasaki, Tomoyuki Kuroki, Masaaki Okubo, Tadao Yagi, Hyun Chul Lee, Joonseon Jeong, Hyoungwoo Choi
  • Publication number: 20210231324
    Abstract: An air purification device includes a reactor having a hollow shape and extending in one direction, a discharge plasma generator comprising a first electrode disposed on an outer wall of the reactor and a second electrode disposed inside the reactor, where the discharge plasma generator is configured to generate a discharge plasma in a discharge region, a plurality of dielectric particles disposed on a packed-bed of the reactor, a liquid supplier which supplies a liquid into the reactor, and a liquid recoverer which recovers the liquid discharged from the reactor.
    Type: Application
    Filed: January 28, 2021
    Publication date: July 29, 2021
    Inventors: Kitae PARK, Jinkyu KANG, Haruhiko YAMASAKI, Tomoyuki KUROKI, Masaaki OKUBO, Tadao YAGI, Hyun Chul LEE, Joonseon JEONG, Hyoungwoo CHOI
  • Patent number: 8574506
    Abstract: Disclosed are a method and an apparatus for processing an exhaust gas, which enable to suppress decrease of pH and increase of ORP of a mixture of an aqueous solution of a reducing agent and an aqueous alkali solution circulated within a wet reactor comprising a reduction reaction region and an oxidation reaction region. The method and apparatus enable to prevent deterioration of the mixed aqueous solution, and can be continuously operated for a long time. Specifically, the ORP and pH of the mixed aqueous solution of the aqueous solution of a reducing agent and the aqueous alkali solution to be circulated within the wet reactor are measured, and a fresh aqueous solution of a reducing agent and a fresh aqueous alkali solution are supplied, if necessary, into a reservoir unit arranged in the lower part of the wet reactor so that the ORP and pH of the mixed aqueous solution are kept within predetermined ranges.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: November 5, 2013
    Assignees: Osaka Prefecture University Public Corporation, Japan Science and Technology Ageny
    Inventors: Tomoyuki Kuroki, Masaaki Okubo, Toshiaki Yamamoto, Hidekatsu Fujishima, Keiichi Otsuka
  • Publication number: 20100044208
    Abstract: Disclosed are a method and an apparatus for processing an exhaust gas, which enable to suppress decrease of pH and increase of ORP of a mixture of an aqueous solution of a reducing agent and an aqueous alkali solution circulated within a wet reactor comprising a reduction reaction region and an oxidation reaction region. The method and apparatus enable to prevent deterioration of the mixed aqueous solution, and can be continuously operated for a long time. Specifically, the ORP and pH of the mixed aqueous solution of the aqueous solution of a reducing agent and the aqueous alkali solution to be circulated within the wet reactor are measured, and a fresh aqueous solution of a reducing agent and a fresh aqueous alkali solution are supplied, if necessary, into a reservoir unit arranged in the lower part of the wet reactor so that the ORP and pH of the mixed aqueous solution are kept within predetermined ranges.
    Type: Application
    Filed: February 15, 2008
    Publication date: February 25, 2010
    Inventors: Tomoyuki Kuroki, Masaaki Okubo, Toshiaki Yamamoto, Hidekatsu Fujishima, Keiichi Otsuka
  • Patent number: 7521031
    Abstract: A method for treating exhaust gas includes: adsorbing target components in the exhaust gas with an adsorbent (5); introducing a nitrogen gas with an oxygen concentration of 10 vol % or less and a purity of 90 vol % or more into the adsorbent (5); and applying (6, 7, 8) nonthermal plasma to the adsorbent (5). After the adsorbent (5) adsorbs the target components in the exhaust gas, the nitrogen gas is introduced into the adsorbent (5), and then an electric discharge is generated so that the nonthermal plasma of the nitrogen gas is applied to the adsorbent (5) and causes desorption of the target components and regeneration of the adsorbent (5). This method can remove the target components effectively from oxygen-containing exhaust gas by using nitrogen gas plasma with high activity as a result of ionization of a nitrogen gas and combining adsorption, desorption by the nitrogen gas plasma, and nitrogen plasma treatment.
    Type: Grant
    Filed: October 6, 2004
    Date of Patent: April 21, 2009
    Assignee: Osaka Industrial Promotion Organization
    Inventors: Masaaki Okubo, Toshiaki Yamamoto, Tomoyuki Kuroki
  • Publication number: 20070071657
    Abstract: A method for treating exhaust gas includes: adsorbing target components in the exhaust gas with an adsorbent (5); introducing a nitrogen gas with an oxygen concentration of 10 vol % or less and a purity of 90 vol % or more into the adsorbent (5); and applying (6, 7, 8) nonthermal plasma to the adsorbent (5). After the adsorbent (5) adsorbs the target components in the exhaust gas, the nitrogen gas is introduced into the adsorbent (5), and then an electric discharge is generated so that the nonthermal plasma of the nitrogen gas is applied to the adsorbent (5) and causes desorption of the target components and regeneration of the adsorbent (5). This method can remove the target components effectively from oxygen-containing exhaust gas by using nitrogen gas plasma with high activity as a result of ionization of a nitrogen gas and combining adsorption, desorption by the nitrogen gas plasma, and nitrogen plasma treatment.
    Type: Application
    Filed: October 6, 2004
    Publication date: March 29, 2007
    Inventors: Masaaki Okubo, Toshiaki Yamamoto, Tomoyuki Kuroki