Patents by Inventor Tomoyuki Kuroki
Tomoyuki Kuroki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240174905Abstract: A showcase includes a refrigerant circuit and a refrigerant enclosed in the refrigerant circuit. The refrigerant circuit includes a compressor (121), a radiator (122), an expansion valve (123), and an evaporator (124). The refrigerant is a low-GWP refrigerant.Type: ApplicationFiled: February 2, 2024Publication date: May 30, 2024Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi FUJINAKA, Masaru TANAKA, Shun OHKUBO, Mitsushi ITANO, Yuuki YOTSUMOTO, Akihito MIZUNO, Tomoyuki GOTOU, Yasufu YAMADA, Hitomi KUROKI, Tatsumi TSUCHIYA, Kenji GOBOU, Daisuke KARUBE, Tatsuya TAKAKUWA
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Patent number: 11920077Abstract: No studies have been made regarding what kinds of refrigerants should be used in a refrigeration cycle device for a vehicle. An air conditioner (1) for a vehicle includes a refrigerant circuit (10) and a refrigerant that is sealed in the refrigerant circuit (10). The refrigerant circuit (10) includes a compressor (80), a first heat exchanger (85), which serves as a heat dissipater in a dehumidifying heating mode, an outside-air heat exchanger (82), a cooling control valve (87), and a second heat exchanger (86), which serves as an evaporator in the dehumidifying heating mode. The refrigerant is a refrigerant having a low GWP.Type: GrantFiled: July 16, 2019Date of Patent: March 5, 2024Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Eiji Kumakura, Kazuhiro Furusho, Masaru Tanaka, Shun Ohkubo, Mitsushi Itano, Yuuki Yotsumoto, Akihito Mizuno, Tomoyuki Gotou, Yasufu Yamada, Tatsumi Tsuchiya, Kenji Gobou, Hitomi Kuroki, Daisuke Karube, Tatsuya Takakuwa, Tetsushi Tsuda
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Patent number: 11912922Abstract: A showcase includes a refrigerant circuit and a refrigerant enclosed in the refrigerant circuit. The refrigerant circuit includes a compressor (121), a radiator (122), an expansion valve (123), and an evaporator (124). The refrigerant is a low-GWP refrigerant.Type: GrantFiled: July 16, 2019Date of Patent: February 27, 2024Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi Fujinaka, Masaru Tanaka, Shun Ohkubo, Mitsushi Itano, Yuuki Yotsumoto, Akihito Mizuno, Tomoyuki Gotou, Yasufu Yamada, Hitomi Kuroki, Tatsumi Tsuchiya, Kenji Gobou, Daisuke Karube, Tatsuya Takakuwa
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Patent number: 11448409Abstract: An air purification device includes a reactor having a hollow shape and extending in one direction, a discharge plasma generator comprising a first electrode disposed on an outer wall of the reactor and a second electrode disposed inside the reactor, where the discharge plasma generator is configured to generate a discharge plasma in a discharge region, a plurality of dielectric particles disposed on a packed-bed of the reactor, a liquid supplier which supplies a liquid into the reactor, and a liquid recoverer which recovers the liquid discharged from the reactor.Type: GrantFiled: January 28, 2021Date of Patent: September 20, 2022Assignees: SAMSUNG ELECTRONICS CO., LTD., UNIVERSITY PUBLIC CORPORATION OSAKAInventors: Kitae Park, Jinkyu Kang, Haruhiko Yamasaki, Tomoyuki Kuroki, Masaaki Okubo, Tadao Yagi, Hyun Chul Lee, Joonseon Jeong, Hyoungwoo Choi
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Publication number: 20210231324Abstract: An air purification device includes a reactor having a hollow shape and extending in one direction, a discharge plasma generator comprising a first electrode disposed on an outer wall of the reactor and a second electrode disposed inside the reactor, where the discharge plasma generator is configured to generate a discharge plasma in a discharge region, a plurality of dielectric particles disposed on a packed-bed of the reactor, a liquid supplier which supplies a liquid into the reactor, and a liquid recoverer which recovers the liquid discharged from the reactor.Type: ApplicationFiled: January 28, 2021Publication date: July 29, 2021Inventors: Kitae PARK, Jinkyu KANG, Haruhiko YAMASAKI, Tomoyuki KUROKI, Masaaki OKUBO, Tadao YAGI, Hyun Chul LEE, Joonseon JEONG, Hyoungwoo CHOI
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Patent number: 8574506Abstract: Disclosed are a method and an apparatus for processing an exhaust gas, which enable to suppress decrease of pH and increase of ORP of a mixture of an aqueous solution of a reducing agent and an aqueous alkali solution circulated within a wet reactor comprising a reduction reaction region and an oxidation reaction region. The method and apparatus enable to prevent deterioration of the mixed aqueous solution, and can be continuously operated for a long time. Specifically, the ORP and pH of the mixed aqueous solution of the aqueous solution of a reducing agent and the aqueous alkali solution to be circulated within the wet reactor are measured, and a fresh aqueous solution of a reducing agent and a fresh aqueous alkali solution are supplied, if necessary, into a reservoir unit arranged in the lower part of the wet reactor so that the ORP and pH of the mixed aqueous solution are kept within predetermined ranges.Type: GrantFiled: February 15, 2008Date of Patent: November 5, 2013Assignees: Osaka Prefecture University Public Corporation, Japan Science and Technology AgenyInventors: Tomoyuki Kuroki, Masaaki Okubo, Toshiaki Yamamoto, Hidekatsu Fujishima, Keiichi Otsuka
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Publication number: 20100044208Abstract: Disclosed are a method and an apparatus for processing an exhaust gas, which enable to suppress decrease of pH and increase of ORP of a mixture of an aqueous solution of a reducing agent and an aqueous alkali solution circulated within a wet reactor comprising a reduction reaction region and an oxidation reaction region. The method and apparatus enable to prevent deterioration of the mixed aqueous solution, and can be continuously operated for a long time. Specifically, the ORP and pH of the mixed aqueous solution of the aqueous solution of a reducing agent and the aqueous alkali solution to be circulated within the wet reactor are measured, and a fresh aqueous solution of a reducing agent and a fresh aqueous alkali solution are supplied, if necessary, into a reservoir unit arranged in the lower part of the wet reactor so that the ORP and pH of the mixed aqueous solution are kept within predetermined ranges.Type: ApplicationFiled: February 15, 2008Publication date: February 25, 2010Inventors: Tomoyuki Kuroki, Masaaki Okubo, Toshiaki Yamamoto, Hidekatsu Fujishima, Keiichi Otsuka
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Patent number: 7521031Abstract: A method for treating exhaust gas includes: adsorbing target components in the exhaust gas with an adsorbent (5); introducing a nitrogen gas with an oxygen concentration of 10 vol % or less and a purity of 90 vol % or more into the adsorbent (5); and applying (6, 7, 8) nonthermal plasma to the adsorbent (5). After the adsorbent (5) adsorbs the target components in the exhaust gas, the nitrogen gas is introduced into the adsorbent (5), and then an electric discharge is generated so that the nonthermal plasma of the nitrogen gas is applied to the adsorbent (5) and causes desorption of the target components and regeneration of the adsorbent (5). This method can remove the target components effectively from oxygen-containing exhaust gas by using nitrogen gas plasma with high activity as a result of ionization of a nitrogen gas and combining adsorption, desorption by the nitrogen gas plasma, and nitrogen plasma treatment.Type: GrantFiled: October 6, 2004Date of Patent: April 21, 2009Assignee: Osaka Industrial Promotion OrganizationInventors: Masaaki Okubo, Toshiaki Yamamoto, Tomoyuki Kuroki
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Publication number: 20070071657Abstract: A method for treating exhaust gas includes: adsorbing target components in the exhaust gas with an adsorbent (5); introducing a nitrogen gas with an oxygen concentration of 10 vol % or less and a purity of 90 vol % or more into the adsorbent (5); and applying (6, 7, 8) nonthermal plasma to the adsorbent (5). After the adsorbent (5) adsorbs the target components in the exhaust gas, the nitrogen gas is introduced into the adsorbent (5), and then an electric discharge is generated so that the nonthermal plasma of the nitrogen gas is applied to the adsorbent (5) and causes desorption of the target components and regeneration of the adsorbent (5). This method can remove the target components effectively from oxygen-containing exhaust gas by using nitrogen gas plasma with high activity as a result of ionization of a nitrogen gas and combining adsorption, desorption by the nitrogen gas plasma, and nitrogen plasma treatment.Type: ApplicationFiled: October 6, 2004Publication date: March 29, 2007Inventors: Masaaki Okubo, Toshiaki Yamamoto, Tomoyuki Kuroki