Abstract: A cooler of the present invention is provided with a case having a top plate, a bottom plate, and a side plate, cooling fins disposed inside the case, and a flow path for cooling fluid that comes into contact with the cooling fins and that flows through the interior of the case, the cooler cooling an object to be cooled in contact with the top plate or the bottom plate. The cooling fins have a shaft part and vane parts that protrude outward from the shaft part and extend spirally in the axial direction; the overall cooling fin configuration constituting a quadrangular column shape. The cooling fins are disposed in contact with at least the top plate and the bottom plate, and the flow path has a spiral-formed configuration formed by the vane parts, the top plate, and the bottom plate.

Abstract: Provided is a cooler having high cooling efficiency and low pressure loss of fluid. A cooler includes: a flow-channel part at least including a plate-like fin (top plate) and a plate-like fin (bottom plate); and a continuous groove-like flow channel defined between the top plate and the bottom plate to flow fluid, the cooler being configured to cool semiconductor elements. When the flow-channel part is viewed from the direction parallel to the top plate and intersecting the flow channel, the flow channel has a corrugated shape so that a face of the flow channel closer to the top plate and a face of the flow channel closer to the bottom plate bend in a synchronized manner toward the top plate and the bottom plate.

Abstract: Provided is a cooler having high cooling efficiency and low pressure loss of fluid. A cooler includes: a flow-channel part at least including a plate-like fin (top plate) and a plate-like fin (bottom plate); and a continuous groove-like flow channel defined between the top plate and the bottom plate to flow fluid, the cooler being configured to cool semiconductor elements. When the flow-channel part is viewed from the direction parallel to the top plate and intersecting the flow channel, the flow channel has a corrugated shape so that a face of the flow channel closer to the top plate and a face of the flow channel closer to the bottom plate bend in a synchronized manner toward the top plate and the bottom plate.

Abstract: A cooler of the present invention is provided with a case having a top plate, a bottom plate, and a side plate, cooling fins disposed inside the case, and a flow path for cooling fluid that comes into contact with the cooling fins and that flows through the interior of the case, the cooler cooling an object to be cooled in contact with the top plate or the bottom plate. The cooling fins have a shaft part and vane parts that protrude outward from the shaft part and extend spirally in the axial direction; the overall cooling fin configuration constituting a quadrangular column shape. The cooling fins are disposed in contact with at least the top plate and the bottom plate, and the flow path has a spiral-formed configuration formed by the vane parts, the top plate, and the bottom plate.

Abstract: Provided is a gas sensor in which a connection terminal can be favorably fitted onto a cylindrical sensor element without causing a breakage of the connection terminal. An oxygen sensor (1) includes an outer connection terminal (29) having an outer fitting portion (53), an extension portion (55) extending inwardly from an axially intermediate point of the outer fitting portion (53) and pulling prevention portions (75) and (77) formed on rear end parts of the outer fitting portion (53) at positions adjacent to the extension portion (55). When the extension portion (55) of the outer connection terminal (29) is inserted in and pulled out from a through hole (23) of a separator (27), the extension portion (55) can be prevented from further pulling in the through hole (23) by contact of the pulling prevention portions (75) and (77) with a front end surface of the separator (27).

Abstract: The present invention provides a lithography apparatus which forms a pattern on a substrate, the apparatus including a first dosing device configured to apply a first dose to the substrate based on data corresponding to the pattern, an acquiring device configured to acquire information of an error of a dimension of a pattern formed on the substrate via application of the first dose thereto, and a second dosing device configured to apply a second dose to the substrate based on the acquired information.

Abstract: Provided is a gas sensor in which a connection terminal can be favorably fitted onto a cylindrical sensor element without causing a breakage of the connection terminal. An oxygen sensor (1) includes an outer connection terminal (29) having an outer fitting portion (53), an extension portion (55) extending inwardly from an axially intermediate point of the outer fitting portion (53) and pulling prevention portions (75) and (77) formed on rear end parts of the outer fitting portion (53) at positions adjacent to the extension portion (55). When the extension portion (55) of the outer connection terminal (29) is inserted in and pulled out from a through hole (23) of a separator (27), the extension portion (55) can be prevented from further pulling in the through hole (23) by contact of the pulling prevention portions (75) and (77) with a front end surface of the separator (27).

Abstract: A method of determining a defocus direction of a pattern image formed on a reticle, which is projected by an exposure apparatus onto a resist on a substrate as a resist pattern, the exposure apparatus exposing the resist to light via the pattern image on the reticle to form the resist pattern. The method includes an image capturing step of capturing a resist image of the resist pattern that is formed on the substrate by the exposure apparatus, to obtain image data, an extracting step of extracting a feature of the image data to obtain feature data, and a determining step of determining the defocus direction of the pattern image based on the extracted feature data. The resist pattern includes a dual tone line end shortening target having a hollow grating mark and a solid grating mark, and the feature data includes an edge sharpness of a waveform of the image data.

Abstract: A shape measuring apparatus for measuring the shape of a measurement target surface includes an interferometer and computer. The interferometer senses interference light formed by measurement light from the measurement target surface and reference light by a photoelectric converter, while changing the light path length of the measurement light or the reference light. The computer Fourier-transforms a first interference signal sensed by the photoelectric converter to obtain a phase distribution and an amplitude distribution, shapes the amplitude distribution, inversely Fourier-transforms the phase distribution and the shaped amplitude distribution to obtain a second interference signal, and determines the shape of the measurement target surface based on the second interference signal.

Abstract: A method for calculating a correction amount to a focus amount or an exposure dose in exposing a substrate with an exposure apparatus includes a storing step of storing plural sets, each of which is a combination of a set focus amount, a set exposure dose, and first image information of a pattern formed on the substrate through an exposure with the set focus amount and the set exposure dose, the plural sets having different focus amounts and/or different exposure doses, an obtaining step of obtaining second image information of a pattern formed on the substrate through another exposure, and a selecting step of finding a correlation value between the second image information obtained in the obtaining step and the first image information in the plural sets stored in the storing step, and of selecting at least two sets having two highest correlation values among the plural sets.

Abstract: A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between a critical dimension contained in the information of the shape of the pattern and a reference value of the critical dimension, and calculating an offset of the focus position based on the information of the shape of the pattern, and calculating the offset of the exposure dose based on the shift amount and the offset of the focus position.

Abstract: An apparatus includes (a) an image processor which (i) calculates a similarity between first image data of a first partial region in object image data and reference image data, with respect to each pair of a second partial region of the first image data and a third partial region of the reference image data that correspond to each other, (ii) calculates a statistic of a plurality of the calculated similarities, with respect to a plurality of the image pairs, and (iii) recognizes, as a position of an object region in the object image data, a position of the first partial region in the object image data, which has the highest statistic of a plurality of the calculated statistics, and (b) an exposure unit which exposes a substrate to a pattern based on the position of the object region recognized by the image processor.

Abstract: A shape measuring apparatus for measuring the shape of a measurement target surface includes an interferometer and computer. The interferometer senses interference light formed by measurement light from the measurement target surface and reference light by a photoelectric converter, while changing the light path length of the measurement light or the reference light. The computer Fourier-transforms a first interference signal sensed by the photoelectric converter to obtain a phase distribution and an amplitude distribution, shapes the amplitude distribution, inversely Fourier-transforms the phase distribution and the shaped amplitude distribution to obtain a second interference signal, and determines the shape of the measurement target surface based on the second interference signal.

Abstract: An apparatus for detecting a position of a region, corresponding to a mark, in image data, as a mark position, the mark including periodically arranged patterns. A first unit obtains a real-space energy distribution which corresponds to an energy spectrum distribution of each partial area of the image data. A probability distribution obtaining unit obtains a probability distribution based on the real-space energy distribution, the probability distribution indicating repetitive positions of the periodically arranged patterns and the intensity of periodicity at this position. A second unit obtains a degree of correlation between each probability distribution obtained by the probability distribution obtaining unit and a pre-registered probability distribution of the mark, and a third unit obtains the mark position based upon the degrees of correlation obtained by the second unit.

Abstract: A method for calculating a correction amount to a focus amount or an exposure dose in exposing a substrate with an exposure apparatus includes a storing step of storing plural sets, each of which is a combination of a set focus amount, a set exposure dose, and first image information of a pattern formed on the substrate through an exposure with the set focus amount and the set exposure dose, the plural sets having different focus amounts and/or different exposure doses, an obtaining step of obtaining second image information of a pattern formed on the substrate through another exposure, and a selecting step of finding a correlation value between the second image information obtained in the obtaining step and the first image information in the plural sets stored in the storing step, and of selecting at least two sets having two highest correlation values among the plural sets.

Abstract: A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between a critical dimension contained in the information of the shape of the pattern and a reference value of the critical dimension, and calculating an offset of the focus position based on the information of the shape of the pattern, and calculating the offset of the exposure dose based on the shift amount and the offset of the focus position.

Abstract: Although a copying machine which has finally output a forged print can be specified by the forgery tracking function, a copying machine which has output an original used for copying or a scanner used to read the images of bills or securities cannot be specified. For this purpose, history information embedded in input image data is extracted. When the history information is extracted, information unique to the apparatus is added to the history information. When no history information is extracted, history information containing information unique to the apparatus is generated. The generated or updated history information is embedded in the image data.

Abstract: A method of determining a defocus direction of a pattern image formed on a resist by an exposure apparatus, for exposing a resist on a substrate to light via a pattern of a reticle, includes an image capturing step of capturing a resist image of a resist pattern formed through an exposure of a resist to the pattern image by the exposure apparatus to obtain image data, an extracting step of extracting a feature of the image data to obtain feature data, and a determining step of determining the defocus direction based on the feature data.

Abstract: Although a copying machine which has finally output a forged print can be specified by the forgery tracking function, a copying machine which has output an original used for copying or a scanner used to read the images of bills or securities cannot be specified. For this purpose, history information embedded in input image data is extracted. When the history information is extracted, information unique to the apparatus is added to the history information. When no history information is extracted, history information containing information unique to the apparatus is generated. The generated or updated history information is embedded in the image data.

Abstract: This invention reduces degradation in image quality and improves altered portion specifying accuracy in a digital watermark technology. For this purpose, an apparatus of this invention inputs image data and information such as a copyright holder name to be embedded in the image data (S1, S2). A mask pattern having a blue noise characteristic for intermediate- and high-frequency components is set at the image data start position, and pixel data at a target embedding position in the mask pattern is quantized (S5). The quantization error at this time corresponds to the bit information to be embedded at that position. This processing is repeatedly performed for the entire image (S6-S9).