Abstract: An adhesive sheet set including a pair of adhesive sheets respectively including an adhesive layer capable of being cured and adhered by being in contact with each other, and a method for producing a product using the same. An adhesive sheet set including a first adhesive sheet and a second adhesive sheet, wherein the first adhesive sheet includes a first separator and a first adhesive layer provided on one surface of the first separator, the second adhesive sheet includes a second separator and a second adhesive layer provided on one surface of the second separator, and the first adhesive sheet and the second adhesive sheet are configured to be cured and adhered by the first adhesive layer and the second adhesive layer being in contact with each other.

Abstract: There is provided a method for repairing or reinforcing a structure. The method includes the steps of: providing an adhesive sheet comprising an adhesive layer comprising at least a curable resin composition whose curing is promoted by irradiation with ionizing radiation and a curing aid which generates a basic substance by irradiation with ionizing radiation; attaching the adhesive sheet to a surface of the structure; and curing the adhesive layer of the adhesive sheet in a state where the adhesive layer is exposed.

Abstract: An adhesive sheet set including a pair of adhesive sheets respectively including an adhesive layer capable of being cured and adhered by being in contact with each other, and a method for producing a product using the same. An adhesive sheet set including a first adhesive sheet and a second adhesive sheet, wherein the first adhesive sheet includes a first separator and a first adhesive layer provided on one surface of the first separator, the second adhesive sheet includes a second separator and a second adhesive layer provided on one surface of the second separator, and the first adhesive sheet and the second adhesive sheet are configured to be cured and adhered by the first adhesive layer and the second adhesive layer being in contact with each other.

Abstract: There is provided a method for repairing or reinforcing a structure. The method includes the steps of: providing an adhesive sheet comprising an adhesive layer comprising at least a curable resin composition whose curing is promoted by irradiation with ionizing radiation and a curing aid which generates a basic substance by irradiation with ionizing radiation; attaching the adhesive sheet to a surface of the structure; and curing the adhesive layer of the adhesive sheet in a state where the adhesive layer is exposed.

Abstract: The present invention provides a method for manufacturing an EL element including an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer, a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.

Abstract: An EL element capable of: preventing the state in which number of excessive layers are laminated on each light emitting part formed in a pattern at the time of forming the light emitting parts using the photolithography method; executing the peeling treatment easily and quickly in the excessive layer peeling process; and preventing generation of color mixture or pixel narrowing derived from the elution of the patterned light emitting part into the light emitting layer coating solution to be coated later, at the end part thereof, at the time of coating a light emitting layer coating solution. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an electroluminescent element using a photolithography method.

Abstract: There is provided a process for producing an EL element by photolithography, which process can produce an EL element having improved luminescence efficiency. The production process comprises the steps of removing a photoresist from photoresist layer-covered parts of an electroluminescent layer and cleaning the surface of the electroluminescent layer parts from which the photoresist has been removed.

Abstract: The main object of the present invention is to provide a method for manufacturing an EL element, capable of preferably carrying out the peeling operation at the time of peeling off an unnecessary layer such as a photoresist layer. In order to achieve the object, the present invention provides a method for manufacturing an EL element comprising: an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer; a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.

Abstract: The present invention provides a method for manufacturing an EL element, capable of preferably carrying out the peeling operation at the time of peeling off an unnecessary layer such as a photoresist layer. This object is achieved by providing a method for manufacturing an EL element comprising: an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer; a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.

Abstract: A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers.

Abstract: The main object of the present invention is to provide a method for manufacturing an EL element, capable of preventing deterioration of the element characteristic by the developing agent or the rinsing agent, while providing the advantages of the photolithography method of high light emitting efficiency and taking out efficiency, the manufacturing process simplicity, and the highly sophisticated pattern formation. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an organic EL element comprising at least a patterned organic light emitting layer, wherein the patterning is conducted by etching with a protecting layer pattern laminated on an organic light emitting layer.

Abstract: A process of producing an electroluminescent element is provided. The production process comprises repeating at least twice a step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer. The method includes the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer, and coating a solution for forming a second buffer layer in a region including the first pattern part. The first buffer layer is immiscible with the solution for forming the second buffer layer.

Abstract: A process of producing an electroluminescent element is provided. The production process comprises repeating at least twice a step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer. The method includes the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer, and coating a solution for forming a second buffer layer in a region including the first pattern part. The first buffer layer is immiscible with the solution for forming the second buffer layer.

Abstract: There is provided a process for producing an EL element by photolithography, which process can produce an EL element having improved luminescence efficiency. The production process comprises the steps of removing a photoresist from photoresist layer-covered parts of an electroluminescent layer and cleaning the surface of the electroluminescent layer parts from which the photoresist has been removed.

Abstract: Disclosed are a light emitting element that, in the formation of a plurality of luminescent layers, can effectively suppress color mixing in each luminescent layer and loss in dissolution of the luminescent layer per se, and a process for producing the same. The light emitting element comprising a plurality of luminescent layers formed by photolithography is produced by a process which comprises: forming a first electrode on a surface of a base material; forming a first luminescent layer on the first electrode; conducting treatment for rendering the first luminescent layer in its exposed area insoluble in a coating liquid for second luminescent layer formation; forming the second luminescent layer on the first electrode; repeating the steps a plurality of times to form a plurality of luminescent layers on the first electrode; and forming a second electrode on the plurality of luminescent layers.

Abstract: A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers.

Abstract: A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers.

Abstract: The present invention provides a device capable of obtaining stable luminescence with a long life by preventing the insulating layer loss by in an etching process and thus preventing the short circuit defect in the device as well as providing the advantages of the photolithographic process, and a method for producing the same. There are provided an electroluminescent device comprising a first electrode layer, an insulating layer, an electroluminescent layer, and a second electrode layer on a substrate, wherein at least one layer of the electroluminescent layer is formed into a predetermined pattern by photolithography, and the insulating layer comprises an inorganic material having 2.5 or more etching selectivity to an organic compound in the dry etching process, or an organopolysiloxane comprising a hydrolysis-condensation product or a hydrolysis-cocondensation product of one or more kinds of specific silicon compounds, and a method for manufacturing the same.

Abstract: There is provided a production process of an electroluminescent element, which, even when a buffer layer patterned by a photolithographic process is formed, luminescence failure derived from cross contamination or a variation in film thickness does not take place and can realize high production efficiency. The production process comprises repeating at least twice the step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer, and comprises the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer; and coating a solution for second buffer layer formation in a region including said first pattern part, the first buffer layer being immiscible with said solution for second buffer layer formation.

Abstract: Disclosed are a light emitting element that, in the formation of a plurality of luminescent layers, can effectively suppress color mixing in each luminescent layer and loss in dissolution of the luminescent layer per se, and a process for producing the same. The light emitting element comprising a plurality of luminescent layers formed by photolithography is produced by a process which comprises: forming a first electrode on a surface of a base material; forming a first luminescent layer on the first electrode; conducting treatment for rendering the first luminescent layer in its exposed area insoluble in a coating liquid for second luminescent layer formation; forming the second luminescent layer on the first electrode; repeating the steps a plurality of times to form a plurality of luminescent layers on the first electrode; and forming a second electrode on the plurality of luminescent layers.