Patents by Inventor Ton Breuls

Ton Breuls has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD AND AN APPARATUS FOR PERFORMING A PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS AND A METHOD
    Publication number: 20200362459
    Abstract: The invention relates to a method and an apparatus for performing a plasma chemical vapour deposition process. The apparatus comprises a mainly cylindrical resonator being provided with an outer cylindrical wall and an inner coaxial cylindrical wall defining therebetween a resonant cavity that is operable at an operating frequency. The resonant cavity extends in a circumferential direction around a cylindrical axis of the inner and outer cylindrical wall. Further, the outer cylindrical wall includes an input port connectable to an input waveguide. In addition, the inner cylindrical wall includes slit sections extending in a circumferential direction around the cylindrical axis. A greatest dimension defining the aperture of the slit sections is smaller than half the wavelength of the operating frequency.
    Type: Application
    Filed: August 5, 2020
    Publication date: November 19, 2020
    Inventors: Mattheus Jacobus Nicolaas van Stralen, Igor Milicevic, Gertjan Krabshuis, Ton Breuls
  • Method and an apparatus for performing a plasma chemical vapour deposition process and a method
    Patent number: 10767264
    Abstract: A method and apparatus for performing a plasma chemical vapour deposition process including a mainly cylindrical resonator having an outer cylindrical wall and an inner coaxial cylindrical wall defining therebetween a resonant cavity operable at an operating frequency. The resonant cavity extends in a circumferential direction around a cylindrical axis of the inner and outer cylindrical wall. The outer cylindrical wall includes an input port connectable to an input waveguide. The inner cylindrical wall includes slit sections extending in a circumferential direction around the cylindrical axis. A greatest dimension defining the aperture of the slit sections is smaller than half the wavelength of the operating frequency.
    Type: Grant
    Filed: October 3, 2017
    Date of Patent: September 8, 2020
    Assignee: DRAKA COMTEQ B.V.
    Inventors: Mattheus Jacobus Nicolaas van Stralen, Igor Milicevic, Gertjan Krabshuis, Ton Breuls
  • METHOD AND AN APPARATUS FOR PERFORMING A PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS AND A METHOD
    Publication number: 20180023196
    Abstract: A method and apparatus for performing a plasma chemical vapour deposition process including a mainly cylindrical resonator having an outer cylindrical wall and an inner coaxial cylindrical wall defining therebetween a resonant cavity operable at an operating frequency. The resonant cavity extends in a circumferential direction around a cylindrical axis of the inner and outer cylindrical wall. The outer cylindrical wall includes an input port connectable to an input waveguide. The inner cylindrical wall includes slit sections extending in a circumferential direction around the cylindrical axis. A greatest dimension defining the aperture of the slit sections is smaller than half the wavelength of the operating frequency.
    Type: Application
    Filed: October 3, 2017
    Publication date: January 25, 2018
    Inventors: Mattheus Jacobus Nicolaas van Stralen, Igor Milicevic, Gertjan Krabshuis, Ton Breuls