Abstract: Method for calibrating a phase mask in a beam path of an optical device with the steps: the phase mask is actuated successively with different patterns of grey levels, wherein a first grey level of a first quantity of segments remains constant and a second grey level of a second quantity of segments is varied from one pattern to the next, light of the optical device impinges on the phase mask, at least one part of the total intensity of the light in the beam path is measured downstream of the phase mask for the different patterns, and a characteristic of the measured intensity is obtained in dependence on the second grey level, a relationship between the second grey level and a phase shift, being imprinted by the phase mask, is obtained from the characteristic and an actuation of the phase mask is calibrated based on the obtained relationship.

Abstract: Method for calibrating a phase mask in a beam path of an optical device with the steps: the phase mask is actuated successively with different patterns of grey levels, wherein a first grey level of a first quantity of segments remains constant and a second grey level of a second quantity of segments is varied from one pattern to the next, light of the optical device impinges on the phase mask, at least one part of the total intensity of the light in the beam path is measured downstream of the phase mask for the different patterns, and a characteristic of the measured intensity is obtained in dependence on the second grey level, a relationship between the second grey level and a phase shift, being imprinted by the phase mask, is obtained from the characteristic and an actuation of the phase mask is calibrated based on the obtained relationship.