Abstract: A nickel/vanadium sputter target for depositing magnetic nickel is provided having high homogeneity, high purity and an ultra-low level of alpha emission. Source materials having high purity and alpha emissions of equal or less than 10−2 counts/cm2-hr are melted and cast under a vacuum and low pressure, hot or cold rolled, and heat treated to form a sputter target having an alpha emission of equal or less than 10−2counts/cm2-hr, and preferably less than 10−3 counts/cm2-hr. From this target may be deposited a thin film of magnetic nickel having an alpha emission equal or less than 10−2 counts/cm2-hr, preferably less than 10−3 counts/cm2-hr and more preferably less than 10−4 counts/cm2-hr.

Abstract: A method is provided for forming clad hollow cathode magnetron sputter targets that are lighter in weight and/or less expensive than monolithic targets. A plate of sputter target material is bonded to a sheet of cladding material that is lighter in weight and/or less expensive than the sputter target material. This clad target assembly is then formed into a hollow cathode magnetron sputter target, such as by deep drawing. The clad hollow cathode magnetron further provides greater percent utilization of sputter target material than monolithic targets.

Abstract: An automated heat treatment controller consistently controls heat treating a metallic target in a furnace according to a heat treatment recipe including a cycle temperature and a cycle exposure time. The automated heat treatment controller includes an operator interface for prompting an operator to load or remove a heat treated target. The controller further provides for commanding furnace door locks and for monitoring system performance. An automated heat treatment furnace method includes the steps of pre-heating the furnace, prompting the user to load the material, reheating the furnace to heat treatment parameters, controlling the exposure time and temperature, and prompting the removal of the material.

Abstract: A high performance, high density sputtering target and a method of making. An aluminum and non-aluminum reactive metal powder blend is subjected to cold pressing under pressure, machining, evacuating, and hot pressing under pressure. The aluminum and non-aluminum metal react directly to yield a high performance, high density sputter target containing greater than about 2% aluminum with substantially uniform composition across the body.