Abstract: The present invention relates to compounds that inhibit KRas G12C. In particular, the present invention relates to compounds that irreversibly inhibit the activity of KRas G12C, pharmaceutical compositions comprising the compounds and methods of use therefor.

Abstract: Systems and methods are disclosed providing user emotion information to a customer service provider. For example, a method may include: transmitting, to a user device over a communication network, application data enabling the user device to perform a functionality usable by a user of the user device, the user device including a camera; receiving, from the user device over the communication network, user feedback data indicative of a characteristic of image data of the user obtained by the camera during usage of the functionality by the user; inputting the value of the facial expression parameter into a machine learning model to determine an assessment of an emotional state of the user during the usage of the functionality; and providing the assessment to the customer service provider.

Abstract: Systems and methods are disclosed providing user emotion information to a customer service provider. For example, a method may include: transmitting, to a user device over a communication network, application data enabling the user device to perform a functionality usable by a user of the user device, the user device including a camera; receiving, from the user device over the communication network, user feedback data indicative of a characteristic of image data of the user obtained by the camera during usage of the functionality by the user; inputting the value of the facial expression parameter into a machine learning model to determine an assessment of an emotional state of the user during the usage of the functionality; and providing the assessment to the customer service provider.

Abstract: A diagnostic mask and method of diagnosing are disclosed. The method includes collecting data from a plurality of sensors in a mask placed on a patient's face such that the mask covers the patient's eyes, the data representing a plurality of health signs of the patient, wherein at least one of the health signs relates to the patient's eyes; and transmitting a signal from the mask, the signal representing the data representing the plurality of health signs.

Abstract: A computer-implemented method that includes determining a call is received from a user device at a first telecommunication provider and determining a first location of the user device based on data transmitted to the first telecommunication provider via the call. The method includes determining a distance between the first location and a location of each of a plurality of telecommunication platforms. Each of the plurality of telecommunication platforms includes a plurality of predefined addresses. The method includes determining a local telecommunication platform of the plurality of telecommunication platforms is positioned closer to the first location than a remainder of the plurality of telecommunication platforms based on the distance of the plurality of telecommunication platforms from the first location. The method includes routing the call from the first telecommunication provider with at least one of the plurality of predefined addresses of the local telecommunication platform.

Abstract: Systems and methods are disclosed providing user emotion information to a customer service provider. For example, a method may include: transmitting, to a user device over a communication network, application data enabling the user device to perform a functionality usable by a user of the user device, the user device including a camera; receiving, from the user device over the communication network, user feedback data indicative of a characteristic of image data of the user obtained by the camera during usage of the functionality by the user; inputting the value of the facial expression parameter into a machine learning model to determine an assessment of an emotional state of the user during the usage of the functionality; and providing the assessment to the customer service provider.

Abstract: The present invention relates to compounds that inhibit KRas G12C. In particular, the present invention relates to compounds that irreversibly inhibit the activity of KRas G12C, pharmaceutical compositions comprising the compounds and methods of use therefor.

Abstract: A diagnostic mask and method of diagnosing are disclosed. The method includes collecting data from a plurality of sensors in a mask placed on a patient's face such that the mask covers the patient's eyes, the data representing a plurality of health signs of the patient, wherein at least one of the health signs relates to the patient's eyes; and transmitting a signal from the mask, the signal representing the data representing the plurality of health signs.

Abstract: Systems and methods are provided for extracting engineering data from a technical document. The extracted data may be used by a software application to generate new technical data. Both original and new technical data may be stored in a data source and can be queried by using a set of design specifications.

Abstract: A system and method for manipulating the structural characteristics of a MEMS device include etching a plurality of holes into the surface of a MEMS device, wherein the plurality of holes comprise one or more geometric shapes determined to provide specific structural characteristics desired in the MEMS device.

Abstract: A simplified MEMS fabrication process and MEMS device is provided that allows for cheaper and lighter-weight MEMS devices to be fabricated. The process comprises etching a plurality of holes or other feature patterns into a MEMS device, and then etching away the underlying wafer such that, after the etching process, the MEMS device is the required thickness and the individual die are separated, avoiding the extra steps of wafer thinning and die dicing. By etching trenches into the substrate wafer and filling them with a MEMS base material, sophisticated taller MEMS devices with larger force may be made.

Abstract: A system and method for manipulating the structural characteristics of a MEMS device include etching a plurality of holes into the surface of a MEMS device, wherein the plurality of holes comprise one or more geometric shapes determined to provide specific structural characteristics desired in the MEMS device.

Abstract: A system and method for manipulating the structural characteristics of a MEMS device include etching a plurality of holes into the surface of a MEMS device, wherein the plurality of holes comprise one or more geometric shapes determined to provide specific structural characteristics desired in the MEMS device.

Abstract: A simplified MEMS fabrication process and MEMS device is provided that allows for cheaper and lighter-weight MEMS devices to be fabricated. The process comprises etching a plurality of holes or other feature patterns into a MEMS device, and then etching away the underlying wafer such that, after the etching process, the MEMS device is the required thickness and the individual die are separated, avoiding the extra steps of wafer thinning and die dicing. By etching trenches into the substrate wafer and filling them with a MEMS base material, sophisticated taller MEMS devices with larger force may be made.

Abstract: A system and method for manipulating the structural characteristics of a MEMS device include etching a plurality of holes into the surface of a MEMS device, wherein the plurality of holes comprise one or more geometric shapes determined to provide specific structural characteristics desired in the MEMS device.

Abstract: A simplified MEMS fabrication process and MEMS device is provided that allows for cheaper and lighter-weight MEMS devices to be fabricated. The process comprises etching a plurality of holes or other feature patterns into a MEMS device, and then etching away the underlying wafer such that, after the etching process, the MEMS device is the required thickness and the individual die are separated, avoiding the extra steps of wafer thinning and die dicing. By etching trenches into the substrate wafer and filling them with a MEMS base material, sophisticated taller MEMS devices with larger force may be made.

Abstract: A system and method for manipulating the structural characteristics of a MEMS device include etching a plurality of holes into the surface of a MEMS device, wherein the plurality of holes comprise one or more geometric shapes determined to provide specific structural characteristics desired in the MEMS device.

Abstract: A system and method for manipulating the structural characteristics of a MEMS device include etching a plurality of holes into the surface of a MEMS device, wherein the plurality of holes comprise one or more geometric shapes determined to provide specific structural characteristics desired in the MEMS device.

Abstract: A simplified MEMS fabrication process and MEMS device is provided that allows for cheaper and lighter-weight MEMS devices to be fabricated. The process comprises etching a plurality of holes or other feature patterns into a MEMS device, and then etching away the underlying wafer such that, after the etching process, the MEMS device is the required thickness and the individual die are separated, avoiding the extra steps of wafer thinning and die dicing. By etching trenches into the substrate wafer and filling them with a MEMS base material, sophisticated taller MEMS devices with larger force may be made.

Abstract: Systems and methods are provided for super-resolution imaging using 3-axis OIS. A super-resolution image may be created by enabling optical image stabilization (OIS) in three axes using an OIS system on a camera of an image capturing device; capturing an image of a scene using an image sensor of the camera; shifting the image on the image sensor by a predetermined subpixel amount; capturing the subpixel shifted image; and constructing a super-resolution image of the scene using the image and the subpixel shifted image. In one particular implementation, a position sensor may measure a positional drift of the image sensor after capturing the image. Using this measured positional drift, a time sufficient to shift the image sensor by a predetermined subpixel amount may be determined. The OIS may subsequently be disabled in one or two axes for the determined time.