Patents by Inventor Tooru Fukui

Tooru Fukui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reflective mask blank, method of manufacturing the same, and reflective mask
    Patent number: 8785086
    Abstract: To solve a problem of reduction in accumulated energy due to backward scattering, leading to degradation in CD linearity, which is caused when a generally used high-contrast resist is used in the manufacture of a reflective mask. A reflective mask blank for manufacturing a reflective mask includes a substrate, a multilayer reflective film which is formed on the substrate and adapted to reflect exposure light, and an absorber film which is formed on the multilayer reflective film and adapted to absorb the exposure light. A resist film for electron beam writing is formed on the absorber film and the contrast value ? of the resist film for electron beam writing is 30 or less.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: July 22, 2014
    Assignee: Hoya Corporation
    Inventors: Masahiro Hashimoto, Kazunori Ono, Kenta Tsukagoshi, Tooru Fukui
  • REFLECTIVE MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND REFLECTIVE MASK
    Publication number: 20130122407
    Abstract: To solve a problem of reduction in accumulated energy due to backward scattering, leading to degradation in CD linearity, which is caused when a generally used high-contrast resist is used in the manufacture of a reflective mask. A reflective mask blank for manufacturing a reflective mask includes a substrate, a multilayer reflective film which is formed on the substrate and adapted to reflect exposure light, and an absorber film which is formed on the multilayer reflective film and adapted to absorb the exposure light. A resist film for electron beam writing is formed on the absorber film and the contrast value ? of the resist film for electron beam writing is 30 or less.
    Type: Application
    Filed: July 29, 2011
    Publication date: May 16, 2013
    Applicant: HOYA CORPORATION
    Inventors: Masahiro Hashimoto, Kazunori Ono, Kenta Tsukagoshi, Tooru Fukui
  • Method and apparatus for the inspection of patterns
    Patent number: 5173719
    Abstract: The present invention relates to a technique, in the inspection of a defect of a semiconductor memory or the like, in which chip comparison is separated from repetitive pattern comparison in a region of a wafer to be inspected whereby both the comparisons are rendered possible to perform in parallel in one and the same scanning.
    Type: Grant
    Filed: December 19, 1990
    Date of Patent: December 22, 1992
    Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.
    Inventors: Yuzo Taniguchi, Tooru Fukui, Mikihito Saito, Yoshiichi Hori, Takahiro Kamagata