Patents by Inventor Tooru Kimura
Tooru Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9581905Abstract: A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.Type: GrantFiled: December 4, 2015Date of Patent: February 28, 2017Assignee: JSR CORPORATIONInventors: Shin-ya Nakafuji, Fumihiro Toyokawa, Goji Wakamatsu, Shingo Takasugi, Tooru Kimura
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Publication number: 20160085152Abstract: A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.Type: ApplicationFiled: December 4, 2015Publication date: March 24, 2016Applicant: JSR CORPORATIONInventors: Shin-ya NAKAFUJI, Fumihiro TOYOKAWA, Goji WAKAMATSU, Shingo TAKASUGI, Tooru KIMURA
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Patent number: 9268229Abstract: A composition for forming a resist underlayer film includes a polysiloxane, and a solvent composition. The solvent composition includes an organic solvent which includes a compound represented by the following formula (1) or a carbonate compound and which has a standard boiling point of no less than 150.0° C. R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an acyl group having 1 to 4 carbon atoms. R3 represents a hydrogen atom or a methyl group. n is an integer of 1 to 4. In a case where n is no less than 2, a plurality of R3s are identical or different.Type: GrantFiled: March 29, 2013Date of Patent: February 23, 2016Assignee: JSR CORPORATIONInventors: Hiromitsu Tanaka, Junya Suzuki, Masayuki Motonari, Tooru Kimura
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Patent number: 9250526Abstract: A composition for forming a resist underlayer film includes a polysiloxane, and an organic solvent composition. The organic solvent composition includes an alkylene glycol monoalkyl ether acetate having a standard boiling point of less than 150.0° C., and an organic solvent having a standard boiling point of no less than 150.0° C. In the organic solvent composition, a content of the alkylene glycol monoalkyl ether acetate is no less than 50% by mass and no greater than 99% by mass, and a content of the organic solvent is no less than 1% by mass and no greater than 50% by mass.Type: GrantFiled: March 5, 2013Date of Patent: February 2, 2016Assignee: JSR CORPORATIONInventors: Tomoaki Seko, Fumihiro Toyokawa, Yuushi Matsumura, Tooru Kimura
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Patent number: 9140984Abstract: A radiation-sensitive composition includes a polymer composition and a radiation-sensitive acid generator. The polymer composition includes a first polymer and a second polymer. The first polymer includes a repeating unit shown by a following formula (1). The second polymer includes a repeating unit shown by a following formula (2) and does not include a repeating unit shown by the formula (1).Type: GrantFiled: June 20, 2012Date of Patent: September 22, 2015Assignee: JSR CORPORATIONInventors: Yuji Yada, Tooru Kimura, Tomohiro Utaka
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Patent number: 9116427Abstract: A composition for forming a resist underlayer film includes a polysiloxane and a solvent. The solvent includes an organic solvent having a standard boiling point of no less than 150.0° C., and water. A content of the organic solvent is no less than 1% by mass and no greater than 50% by mass with respect to a total amount of the solvent. A content of water is no less than 1% by mass and no greater than 30% by mass with respect to the total amount of the solvent.Type: GrantFiled: March 6, 2013Date of Patent: August 25, 2015Assignee: JSR CORPORATIONInventors: Shunsuke Kurita, Kazunori Takanashi, Hiromitsu Nakashima, Tooru Kimura
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Publication number: 20130256264Abstract: A composition for forming a resist underlayer film includes a polysiloxane, and a solvent composition. The solvent composition includes an organic solvent which includes a compound represented by the following formula (1) or a carbonate compound and which has a standard boiling point of no less than 150.0° C. R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an acyl group having 1 to 4 carbon atoms. R3 represents a hydrogen atom or a methyl group. n is an integer of 1 to 4. In a case where n is no less than 2, a plurality of R3s are identical or different.Type: ApplicationFiled: March 29, 2013Publication date: October 3, 2013Applicant: JSR CORPORATIONInventors: Hiromitsu TANAKA, Junya SUZUKI, Masayuki MOTONARI, Tooru KIMURA
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Publication number: 20130233826Abstract: A composition for forming a resist underlayer film includes a polysiloxane, and an organic solvent composition. The organic solvent composition includes an alkylene glycol monoalkyl ether acetate having a standard boiling point of less than 150.0° C., and an organic solvent having a standard boiling point of no less than 150.0° C. In the organic solvent composition, a content of the alkylene glycol monoalkyl ether acetate is no less than 50% by mass and no greater than 99% by mass, and a content of the organic solvent is no less than 1% by mass and no greater than 50% by mass.Type: ApplicationFiled: March 5, 2013Publication date: September 12, 2013Applicant: JSR CORPORATIONInventors: Tomoaki SEKO, Fumihiro TOYOKAWA, Yuushi MATSUMURA, Tooru KIMURA
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Publication number: 20130233825Abstract: A composition for forming a resist underlayer film includes a polysiloxane and a solvent. The solvent includes an organic solvent having a standard boiling point of no less than 150.0° C., and water. A content of the organic solvent is no less than 1% by mass and no greater than 50% by mass with respect to a total amount of the solvent. A content of water is no less than 1% by mass and no greater than 30% by mass with respect to the total amount of the solvent.Type: ApplicationFiled: March 6, 2013Publication date: September 12, 2013Applicant: JSR CORPORATIONInventors: Shunsuke KURITA, Kazunori TAKANASHI, Hiromitsu NAKASHIMA, Tooru KIMURA
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Publication number: 20120282550Abstract: A radiation-sensitive composition includes a polymer composition and a radiation-sensitive acid generator. The polymer composition includes a first polymer and a second polymer. The first polymer includes a repeating unit shown by a following formula (1). The second polymer includes a repeating unit shown by a following formula (2) and does not include a repeating unit shown by the formula (1).Type: ApplicationFiled: June 20, 2012Publication date: November 8, 2012Applicant: JSR CorportionInventors: Yuji YADA, Tooru Kimura, Tomohiro Utaka
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Patent number: 7536279Abstract: An objective is to quickly provide appropriate maintenance services at low costs during routine inspection procedures and/or upon occurrence of abnormal events at thermal power plants or stations. In a thermal power plant maintenance system comprising a control device 1 for control of operation conditions and process amounts of plant equipment and a maintenance tool 2 operatively linked to the control device 1 via a network 7 for performing maintenance of a controlling controller 11 as built in the control device 1, the system further comprises a remote maintenance device 3 that executes similar functions to those offered by the maintenance tool 2 for bidirectionally transferring plant data along with data concerning the controlling controller 11's status via a communications line 8 between the maintenance tool 2 and the remote maintenance device 3 to thereby provide maintenance services of the thermal power plant of interest.Type: GrantFiled: December 8, 2003Date of Patent: May 19, 2009Assignee: Hitachi, Ltd.Inventors: Satoru Shimizu, Tooru Kimura, Yoshio Maruyama
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Patent number: 7482111Abstract: It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.Type: GrantFiled: March 24, 2005Date of Patent: January 27, 2009Assignee: JSR CorporationInventors: Kouji Nishikawa, Tooru Kimura, Shin-ichiro Iwanaga
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Patent number: 7381027Abstract: A fan motor having a small thickness and its impeller's blades formed to have a longer length in the diametrical direction than a width in the axial direction. Since the blade of the fan motor has a tooth structure or chamfers at its edge end in the diametrical direction, turbulence is forcibly evoked in an airflow to promote the turbulent diffusion, thereby suppressing the trailing vortex and reducing the aerodynamic noises, and thus the ventilation efficiency is improved.Type: GrantFiled: May 18, 2004Date of Patent: June 3, 2008Assignee: Sony CorporationInventors: Sachiko Kaneko, Yuji Shishido, Toshio Hashimoto, Tooru Kimura
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Publication number: 20070190450Abstract: It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.Type: ApplicationFiled: March 24, 2005Publication date: August 16, 2007Applicant: JSR CorporationInventors: Kouji Nishikawa, Tooru Kimura, Shin-ichiro Iwanaga
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Patent number: 7214471Abstract: The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70 ?m in an uncured state has a 365 nm radiation transmittance of not less than 10% and a 405 nm radiation transmittance of not less than 60%, contains the radiation-sensitive radical polymerization initiator (C) in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A), and has a dry film thickness of not less than 50 ?m. According to the photosensitive resin film, a high bump having a height of not less than 50 ?m can be readily formed on a chip substrate with high precision though formation of such a high bump is difficult by the conventional technique. Moreover, connection failure of an element can be inhibited, and reliability of an element can be enhanced.Type: GrantFiled: March 25, 2004Date of Patent: May 8, 2007Assignee: JSR CorporationInventors: Shin-ichiro Iwanaga, Tooru Kimura, Kouji Nishikawa
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Publication number: 20060271553Abstract: Documents used for process control can be managed and maintained from a document server and a terminal. In order to update the documents quickly so that an operated process is always kept in the most preferable state of operation, the document server stores and manages production documents used for actually controlling and monitoring a control system plant, whereas the terminal system is used to refer and edit plant documents. The terminal can synchronize contents of the plant documents in the document server with those in the control system before storing the synchronized plant documents in the terminal.Type: ApplicationFiled: February 15, 2006Publication date: November 30, 2006Inventors: Katsuhito Shimizu, Tooru Kimura, Yoshio Maruyama, Yukiko Mouri, Satoru Shimizu, Hidekazu Fujimura, Masao Furukawa, Yoshiharu Hayashi, Yasushi Hayasaka
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Patent number: 7141355Abstract: A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having an unsaturated group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation-induced radical polymerization initiator, wherein: the alkali-soluble resin having an unsaturated group (A) is obtained by reacting: 100 parts by weight of a copolymer comprising 1 to 40 wt % structural units derived from (a) a radically polymerizable compound having a carboxyl group; 1 to 50 wt % structural units having a phenolic hydroxyl group which are derived from (b-1) a radically polymerizable compound having a phenolic hydroxyl group or (b-2) a radically polymerizable compound having a functional group convertible into a phenolic hydroxyl group after the copolymerization, other structural units of said copolymer being derived from (c) another radically polymerizable compound; with 0.1 to 20 parts by weight of (d) a radically polymerizable compound having an epoxy group.Type: GrantFiled: December 13, 2002Date of Patent: November 28, 2006Assignee: JSR CorporationInventors: Shin-ichiro Iwanaga, Satoshi Iwamoto, Tooru Kimura, Hiroko Nishimura, Koji Nishikawa
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Publication number: 20060210912Abstract: The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70 ?m in an uncured state has a 365 nm radiation transmittance of not less than 10% and a 405 nm radiation transmittance of not less than 60%, contains the radiation-sensitive radical polymerization initiator (C) in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A), and has a dry film thickness of not less than 50 ?m. According to the photosensitive resin film, a high bump having a height of not less than 50 ?m can be readily formed on a chip substrate with high precision though formation of such a high bump is difficult by the conventional technique. Moreover, connection failure of an element can be inhibited, and reliability of an element can be enhanced.Type: ApplicationFiled: March 25, 2004Publication date: September 21, 2006Applicant: JSR CorporationInventors: Shin-ichiro Iwanaga, Tooru Kimura, Kouji Nishikawa
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Patent number: 7107295Abstract: Documents used for process control can be managed and maintained from a document server and a terminal. In order to update the documents quickly so that an operated process is always kept in the most preferable state of operation, the document server stores and manages production documents used for actually controlling and monitoring a control system plant, whereas the terminal system is used to refer and edit plant documents. The terminal can synchronize contents of the plant documents in the document server with those in the control system before storing the synchronized plant documents in the terminal.Type: GrantFiled: January 24, 2003Date of Patent: September 12, 2006Assignee: Hitachi, Ltd.Inventors: Katsuhito Shimizu, Tooru Kimura, Yoshio Maruyama, Yukiko Mouri, Satoru Shimizu, Hidekazu Fujimura, Masao Furukawa, Yoshiharu Hayashi, Yasushi Hayasaka
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Patent number: 6895289Abstract: Documents used for process control can be managed and maintained from a document server and a terminal. In order to update the documents quickly so that an operated process is always kept in the most preferable state of operation, the document server stores and manages production documents used for actually controlling and monitoring a control system plant, whereas the terminal system is used to refer and edit plant documents. The terminal can synchronize contents of the plant documents in the document server with those in the control system before storing the synchronized plant documents in the terminal.Type: GrantFiled: November 12, 2002Date of Patent: May 17, 2005Assignee: Hitachi, Ltd.Inventors: Katsuhito Shimizu, Tooru Kimura, Yoshio Maruyama, Yukiko Mouri, Satoru Shimizu, Hidekazu Fujimura, Masao Furukawa, Yoshiharu Hayashi, Yasushi Hayasaka
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Patent number: 5125837Abstract: An apparatus for scaling of teeth and lavage of the gingival sulcus is provided. The apparatus comprises a base unit which contains reservoirs for the medicaments used in the lavage procedure, and a handpiece connected to the base unit by a conduit, which contains an insert for scaling of teeth. Switches on the base unit and a footswitch make it possible for the practitioner to use the apparatus for scaling only, lavage only, or for simultaneous lavage and scaling.Type: GrantFiled: August 7, 1990Date of Patent: June 30, 1992Assignee: Dentsply Management Corp.Inventors: George E. Warrin, Rene J. Perdreaux