Abstract: A yaw rate sensor is described which includes a drive device, at least one Coriolis element, and a detection device having at least two detection elements which are coupled to one another with the aid of a coupling device, the drive device being connected to the Coriolis element for driving a vibration of the Coriolis element, and an additional coupling device which is connected to the detection device and to the Coriolis element for coupling a deflection in the plane of vibration of the Coriolis element to the detection device in a direction orthogonal to the vibration.

Abstract: A yaw rate sensor includes: at least one Coriolis element; a drive device connected to the Coriolis element and configured to drive a vibration of the Coriolis element; a detection device having at least one rotor; and a coupling device connected to the detection device and to the Coriolis element. The coupling device is configured to couple a deflection in the plane of vibration of the Coriolis element to the detection device in a direction orthogonal to the vibration, so that when the Coriolis element is deflected a torque for driving the at least one rotor is transmitted from the Coriolis element to the at least one rotor.

Abstract: A yaw rate sensor having a substrate, a first Coriolis element and a second Coriolis element is described, the first Coriolis element being excitable to a first vibration by first excitation means, and the second Coriolis element being excitable to a second vibration by second excitation means, and the first and second Coriolis elements being connected to one another by a spring structure, and the spring structure also including at least one rocker structure, the rocker structure being anchored on the substrate by at least one spring element.

Abstract: A method for adjusting an acceleration sensor which includes a substrate and a seismic mass, the acceleration sensor having first and further first electrodes attached to the substrate on a first side, counter-electrodes of the seismic mass being situated between the first and further first electrodes, the acceleration sensor having further second electrodes on a second side and further fourth electrodes on a fourth side opposite the second side, an essentially equal first excitation voltage being applied to the first and further first electrodes in a first step for exciting a first deflection of the seismic mass along a first direction, the first deflection being compensated in a second step by applying a first compensation voltage to the further second and further fourth electrodes.

Abstract: A yaw rate sensor having a substrate which has a main plane of extension, and a Coriolis element is proposed. The Coriolis element is excitable to a vibration along a third direction which is perpendicular to the main plane of extension. A Coriolis deflection of the Coriolis element along a first direction which is parallel to the main plane of extension may be detected using a detection arrangement. The detection arrangement includes a Coriolis electrode which is connected to the Coriolis element, and a corresponding counterelectrode. Both the Coriolis electrode and the counterelectrode may be excited to a vibration along the third direction.

Abstract: A micromechanical yaw-rate sensor comprising a first yaw-rate sensor element, which outputs a first sensor signal, which contains information about a rotation around a first rotational axis, a second yaw-rate sensor element, which outputs a second sensor signal, which contains information about a rotation around a second rotational axis, which is perpendicular to the first rotational axis, a drive, which drives the first yaw-rate sensor element, and a coupling link, which mechanically couples the first yaw-rate sensor element and the second yaw-rate sensor element to one another, so that driving of the first yaw-rate sensor element also causes driving of the second yaw-rate sensor element.

Abstract: A rotation rate sensor includes: a mounting device; a first drive frame having a drive, which is designed to set the first drive frame into a first oscillatory motion along an axis of oscillation relative to the mounting device; a first stator electrode; a first actuator electrode coupled to the first drive frame in such a way that in a rotary motion of the rotation rate sensor due to a Coriolis force, the first actuator electrode being displaceable in a first deflection direction relative to the first stator electrode; and an evaluation device configured to determine a voltage applied between the first stator electrode and the first actuator electrode, and to specify information regarding the rotary motion of the rotation rate sensor while taking the determined voltage value into account.

Abstract: A method and a micromechanical component which counteract manufacturing-process-related mechanical stresses in the membrane are provided. The membrane is formed on a substrate in a layer system and spans a cavity in the substrate. The layer system includes at least one base layer formed on the substrate for circuit elements. At least one structured masking layer is also formed on the base layer for defining the circuit elements. The masking layer is structured in the area of the membrane in such a way that mechanical stresses acting in the area of the membrane under vacuum are at least partially compensated, the intrinsic stress of the masking layer being taken into account in the layout of the structuring.

Abstract: A capacitive pressure sensor made up of two silicon on insulator (SOI) wafers lying opposite of each other and joined to each other in a vacuum-tight manner, a recess being formed between the two wafers. The first wafer exclusively supports the evaluation circuits required for measuring the applied pressure and a capacitive electrode, and the second wafer has a recess formed by surface micromechanics processes, in which the counter electrode to the capacitive electrode of the first wafer is situated. The second wafer at the same time forms a cover for the first wafer.

Abstract: A method and a micromechanical component which counteract manufacturing-process-related mechanical stresses in the membrane are provided. The membrane is formed on a substrate in a layer system and spans a cavity in the substrate. The layer system includes at least one base layer formed on the substrate for circuit elements. At least one structured masking layer is also formed on the base layer for defining the circuit elements. The masking layer is structured in the area of the membrane in such a way that mechanical stresses acting in the area of the membrane under vacuum are at least partially compensated, the intrinsic stress of the masking layer being taken into account in the layout of the structuring.

Abstract: A capacitive pressure sensor made up of two silicon on insulator (SOI) wafers lying opposite of each other and joined to each other in a vacuum-tight manner, a recess being formed between the two wafers. The first wafer exclusively supports the evaluation circuits required for measuring the applied pressure and a capacitive electrode, and the second wafer has a recess formed by surface micromechanics processes, in which the counter electrode to the capacitive electrode of the first wafer is situated. The second wafer at the same time forms a cover for the first wafer.

Abstract: A method for manufacturing a micromechanical pressure sensor and a pressure sensor manufactured using this method. The pressure is measured in the pressure sensor composed of at least two components via a capacitance measurement of a capacitor, the pressure sensor having at least one first electrode and one first diaphragm. The movement of the diaphragm causes a change in the capacitance of the capacitor which may be used in the capacitance measurement as a measure for the pressure variable to be measured. It is important that, prior to assembly, the first and the second components of the pressure sensor be processed separately. The first component has at least one semiconductor material and the first electrode, whereas the second component is made of metal, at least in part, and contains at least the first diaphragm.