Abstract: An alignment apparatus includes: a transport mechanism including a transport carrier which holds and transports a substrate and transport modules which constitute a transport path through which the transport carrier moves; an alignment chamber in which a mask is positioned and fixed to the substrate held by the transport carrier and loaded by the transport mechanism; and control means which applies a current or a voltage to a plurality of coils disposed in one of the transport carrier and each transport module to control a magnetic force generated between the plurality of coils and a plurality of magnets disposed in the other one of the transport carrier and the transport module, wherein the control means adjusts the position of the transport carrier in a state in which the transport carrier holding the substrate has been levitated by controlling the magnetic force to perform positioning.

Abstract: A method of manufacturing a hermetically sealed container provided with first and second substrates includes the steps of disposing, within a chamber, the first and second substrates opposite to each other to form a gap therebetween, and separating an edge portion of at least the first substrate from the second substrate, for processing to warp the first substrate, within the chamber. Additional steps include exhausting a space between the first and second substrates, by exhausting an inside of the chamber in a state of warping the first substrate, and hermetically connecting the first and second substrates through a bonding material, within the chamber, in a state of exhausting the space between the first and second substrates.

Abstract: Disclosed is a processing apparatus which can realize highly fine batch pattern film formation for a mask, which is significantly increased in weight according to the demand for increasing the size of an object to be processed, whereby leading to a possibility of reduction in the alignment accuracy of a pattern. The processing apparatus 1 which fixes and processes an object to be processed 300 and a mask 200 includes a base 400 on which the object to be processed 300 and the mask 200 are placed. The processing apparatus 1 further includes second fixing means 101 and first fixing means 102. The second fixing means 101 includes a permanent magnet for use in fixing a mask frame 200a of the mask 200 on the base 400. The first fixing means 102 includes a permanent magnet for use in fixing a mask membranous plane 200b of the Mask 200 on the base 400. The second fixing means 101 and the first fixing means 102a, 102b are mechanisms in which each permanent magnet can move the base 400 in a vertical direction.

Abstract: A vacuum processing apparatus which processes an object to be processed with the use of a mask membrane plane of magnetic material and a mask frame of the magnetic material is characterized in that the mask of the magnetic material is attracted by an electro-permanent magnet that is disposed in an opposite side of the mask with respect to the surface having the object to be processed mounted thereon.

Abstract: In a method of manufacturing a hermetically sealed container with a pair of substrates caused to undergo joining in an atmosphere of reduced pressure, one side of one substrate is introduced into the atmosphere of reduced pressure in a state of having undergone joining to the other substrate, and spacing between the other side of that one substrate and the other substrate is widened in the atmosphere of reduced pressure and thereby spacing between the both substrates are released in the atmosphere of reduced pressure so as to thereby make it easy to form a vacuum container between the both substrate.

Abstract: In a manufacturing method of forming a hermetically sealed container by bringing a pair of substrates into intimate contact via a supporting frame between them, one of the substrates is warped in a depressurized atmosphere before getting into intimate contact and is thereby separated from the other substrate so as to evacuate inside of the hermetically sealed container by releasing the depressurized atmosphere therein. Relative positions of the substrates are restored by having the warp undone thereafter. Therefore, it is possible to achieve evacuation inside the hermetically sealed container without causing the relative positions of the substrates to deviate.