Patents by Inventor Toshiaki Katou

Toshiaki Katou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240102688
    Abstract: An indoor unit included in an air conditioner that includes an outdoor unit includes a power receiving circuit (PR2), a low-frequency transmission and reception circuit as a first reception circuit, a high-frequency transmission and reception circuit as a transmission and reception circuit, and an inner-controller. The low-frequency transmission and reception circuit receives a current signal transmitted from an outdoor unit by using a current loop formed by a power line included in power supply wiring. For a first communication state in which physical connection between with the outdoor unit is recognized and a second communication state in which communication for operation of the air conditioner is performed between with the outdoor unit, the inner-controller selects use of the low-frequency transmission and reception circuit and the high-frequency transmission and reception circuit in the first communication state and the second communication state.
    Type: Application
    Filed: November 30, 2023
    Publication date: March 28, 2024
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Ryosuke YAMAMOTO, Yohei KOYAMA, Youta KATOU, Kazuaki ANDO, Taiki KOGAWA, Shin HIGASHIYAMA, Kosuke HOTTA, Shinichi ISHIZEKI, Toshiaki KUMATA
  • Patent number: 4665008
    Abstract: A method is provided for fabricating thin film amorphous silicon p-i-n photodiode array image sensors that have transparent photodiode electrodes made of indium tin oxide or SnO.sub.2 and thin-film aluminum conductors for connecting the transparent electrodes to signal processing circuitry. The method provides for patterning of the aluminum conductors without eroding the material of the transparent electrodes through reduction of such material by hydrogen gas released during etching of the aluminum by using a photoresist etch mask that covers the areas of the transparent electrodes and defines the pattern of the aluminum conductors.
    Type: Grant
    Filed: November 26, 1985
    Date of Patent: May 12, 1987
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Masaharu Nishiura, Toshiaki Katou