Patents by Inventor Toshifumi Inamasu

Toshifumi Inamasu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7908995
    Abstract: A stage apparatus in which a rectangular substrate which is levitated over a stage is transferred such that a pair of sides of the rectangular substrate are substantially parallel to a transfer direction and the other pair of sides of the rectangular substrate are substantially perpendicular to the transfer direction. The stage includes a plurality of gas spray ports to spray a gas and a plurality of suction ports to attract the rectangular substrate by suction. The rectangular substrate is levitated at a predetermined height from the surface of the stage in a substantially horizontal posture by means of suction of a suction mechanism through the plurality of suction ports and gas spray of a gas spray mechanism through the plurality of gas spray ports.
    Type: Grant
    Filed: January 19, 2006
    Date of Patent: March 22, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Toshifumi Inamasu, Tsuyoshi Yamasaki, Kazuhito Miyazaki
  • Patent number: 7905195
    Abstract: The present invention provides a floating-type substrate conveying and processing apparatus that floats a substrate to be processed. The device includes a floating stage that floats the substrate, a liquid supplier placed above the floating stage via the substrate to supply a process liquid to a surface of the substrate, and a moving mechanism for holding the substrate as detachable at opposite ends of the substrate, at a floating height of the substrate, and for moving the substrate on the floating stage. The floating stage is formed of a porous member and has a plurality of suction apertures airtightly defined in a porous portion of the porous member. The floating stage injects gas through the porous portion and sucks gas through the suction apertures to float the substrate placed on the porous portion.
    Type: Grant
    Filed: July 14, 2006
    Date of Patent: March 15, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Tsuyoshi Yamasaki, Toshifumi Inamasu, Kenya Shinozaki, Kimio Motoda
  • Publication number: 20090311434
    Abstract: Formation of banded irregularities in a process liquid film formed on a substrate being carried by a flotation carrying system is reduced or suppressed effectively. Jet lines C1, C3, C5, . . . extending in an X-direction and suction lines C2, C4, C6, . . . extending in the X-direction are arranged alternately at a fixed pitch W in a Y-direction. Jet openings 88 are arranged at fixed intervals 3D on the jet lines C2n?1, suction openings 90 are arranged at fixed intervals 3D on the suction lines C2n, and the jet openings 88 and the suction openings 90 on the adjacent ones of the jet lines C2n?1 and the suction lines C2n are spaced apart from each other by a fixed distance D with respect to the X-direction. Slots 88a and 90a are extended straight from the upper ends of the jet openings 88 and the upper ends of the suction openings 90, respectively, in a carrying direction (the X-direction) and a direction opposite the carrying direction.
    Type: Application
    Filed: July 5, 2007
    Publication date: December 17, 2009
    Applicant: Tokyo Electron Limited
    Inventors: Toshifumi Inamasu, Fumihiko Ikeda, Kenya Shinozaki, Yoshitaka Otsuka
  • Publication number: 20090047103
    Abstract: A stage apparatus in which a rectangular substrate which is levitated over a stage is transferred such that a pair of sides of the rectangular substrate are substantially parallel to a transfer direction and the other pair of sides of the rectangular substrate are substantially perpendicular to the transfer direction. The stage includes a plurality of gas spray ports to spray a gas and a plurality of suction ports to attract the rectangular substrate by suction. The rectangular substrate is levitated at a predetermined height from the surface of the stage in a substantially horizontal posture by means of suction of a suction mechanism through the plurality of suction ports and gas spray of a gas spray mechanism through the plurality of gas spray ports.
    Type: Application
    Filed: January 19, 2006
    Publication date: February 19, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Toshifumi Inamasu, Tsuyoshi Yamasaki, Kazuhito Miyazaki
  • Publication number: 20070017442
    Abstract: The present invention provides a floating-type substrate conveying and processing apparatus that floats a substrate to be processed. The device includes a floating stage that floats the substrate, a liquid supplier placed above the floating stage via the substrate to supply a process liquid to a surface of the substrate, and a moving mechanism for holding the substrate as detachable at opposite ends of the substrate, at a floating height of the substrate, and for moving the substrate on the floating stage. The floating stage is formed of a porous member and has a plurality of suction apertures airtightly defined in a porous portion of the porous member. The floating stage injects gas through the porous portion and sucks gas through the suction apertures to float the substrate placed on the porous portion.
    Type: Application
    Filed: July 14, 2006
    Publication date: January 25, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tsuyoshi Yamasaki, Toshifumi Inamasu, Kenya Shinozaki, Kimio Motoda