Patents by Inventor Toshifumi Komatsu
Toshifumi Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11860539Abstract: The present invention discloses a photosensitive composition, comprising polyvinyl acetate (0% saponified) having a styryl type nitrogen-containing heterocyclic groups such as a styrylpyridinium or/and styrylquinolinium that possesses high UV light energy sensitivity with a small photosensitive group content, high solid content, high water resistance, and very sharp imaging characteristics and produced therefrom photosensitive compositions such as a photo-resist, photolithographic plates, screen printing stencil emulsion and film, and abrasion resistant photosensitive emulsion and film, and other photosensitive compositions being used for commercial and industrial applications.Type: GrantFiled: October 13, 2021Date of Patent: January 2, 2024Assignee: SHOWA KAKO CORPORATIONInventor: Toshifumi Komatsu
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Publication number: 20230288803Abstract: The present invention discloses a photosensitive composition, comprising polyvinyl acetate (0% saponified) having a styryl type nitrogen-containing heterocyclic groups such as a styrylpyridinium or/and styrylquinolinium that possesses high UV light energy sensitivity with a small photosensitive group content, high solid content, high water resistance, and very sharp imaging characteristics and produced therefrom photosensitive compositions such as a photo-resist, photolithographic plates, screen printing stencil emulsion and film, and abrasion resistant photosensitive emulsion and film, and other photosensitive compositions being used for commercial and industrial applications.Type: ApplicationFiled: October 13, 2021Publication date: September 14, 2023Inventor: Toshifumi KOMATSU
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Patent number: 11686365Abstract: In a cylinder device, a rod of which one end portion is joined to a piston in a cylinder and the other end portion protrudes from an opening portion of the cylinder includes a first member that is a hollow cylindrical member in sliding contact with a sliding contact member, and a second member that does not come into sliding contact with the sliding contact member. An outer diameter of at least a first member side end portion of the second member is smaller than an outer diameter of the first member. An inner peripheral portion of the first member is joined to an outer peripheral portion of the second member by friction weld joining.Type: GrantFiled: September 20, 2018Date of Patent: June 27, 2023Assignee: HITACHI ASTEMO, LTD.Inventors: Yasuhisa Omata, Naoya Kubo, Toshifumi Komatsu, Ikuo Akai
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Publication number: 20210003188Abstract: In a cylinder device, a rod of which one end portion is joined to a piston in a cylinder and the other end portion protrudes from an opening portion of the cylinder includes a first member that is a hollow cylindrical member in sliding contact with a sliding contact member, and a second member that does not come into sliding contact with the sliding contact member. An outer diameter of at least a first member side end portion of the second member is smaller than an outer diameter of the first member. An inner peripheral portion of the first member is joined to an outer peripheral portion of the second member by friction weld joining.Type: ApplicationFiled: September 20, 2018Publication date: January 7, 2021Inventors: Yasuhisa OMATA, Naoya KUBO, Toshifumi KOMATSU, Ikuo AKAI
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Patent number: 9044986Abstract: Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch resist ink. The acid-etch resist ink is formulated to provide optimal properties for ink jet printing, while also providing excellent acid-etch resist and superior handling properties. The acid-etch resist ink is printed onto a sheet of a carrier substrate that allows the acid-etch resist to be transferred to a mold surface, after which the mold surface is etched with a strong acid.Type: GrantFiled: December 16, 2011Date of Patent: June 2, 2015Assignee: IKONICS CORPORATIONInventors: Toshifumi Komatsu, Jeremy W. Peterson, Alexander S. Gybin
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Patent number: 8361330Abstract: A laminate for making signs, the laminate comprising a readily-abraded layer and an abrasion-resistant layer. A method of making signs is also disclosed. The method includes providing a laminate comprising a first layer that is readily etched by abrasives and a second layer disposed beneath the first layer and substantially resistant to abrasive etching. A mask is applied to the top of the laminate; and abrasives are used to selectively remove a portion of the first layer, so as to form a relief image with a controlled and uniform relief depth.Type: GrantFiled: October 2, 2006Date of Patent: January 29, 2013Assignee: Ikonics CorporationInventor: Toshifumi Komatsu
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Publication number: 20120237700Abstract: Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch resist ink. The acid-etch resist ink is formulated to provide optimal properties for ink jet printing, while also providing excellent acid-etch resist and superior handling properties. The acid-etch resist ink is printed onto a sheet of a carrier substrate that allows the acid-etch resist to be transferred to a mold surface, after which the mold surface is etched with a strong acid.Type: ApplicationFiled: December 16, 2011Publication date: September 20, 2012Applicant: IKONICS CORPORATIONInventors: Toshifumi Komatsu, Jeremy W. Peterson, Alexander S. Gybin
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Patent number: 8097176Abstract: Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch resist ink. The acid-etch resist ink is formulated to provide optimal properties for ink-jet printing, while also providing excellent acid-etch resist and superior handling properties. The acid-etch resist ink is printed onto a sheet of a carrier substrate that allows the acid-etch resist to be transferred to a mold surface, after which the mold surface is etched with a strong acid.Type: GrantFiled: January 19, 2007Date of Patent: January 17, 2012Assignee: Ikonics CorporationInventors: Toshifumi Komatsu, Jeremy W. Peterson, Alexander S. Gybin
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Patent number: 7964335Abstract: The present invention is directed to an ink receptive film and methods of using the ink receptive film. The ink receptive film is generally suitable for etching patterns into substrates, and typically includes a photosensitive laminate structure containing at least an ink receptive, radiation transmissive layer; and at least one photosensitive resist layer.Type: GrantFiled: January 30, 2002Date of Patent: June 21, 2011Assignee: Ikonics CorporationInventors: Toshifumi Komatsu, Kyle Johnson, William Charles Ulland
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Publication number: 20090038742Abstract: A laminate for making signs, the laminate comprising a readily-abraded layer and an abrasion-resistant layer. A method of making signs is also disclosed. The method includes providing a laminate comprising a first layer that is readily etched by abrasives and a second layer disposed beneath the first layer and substantially resistant to abrasive etching. A mask is applied to the top of the laminate; and abrasives are used to selectively remove a portion of the first layer, so as to form a relief image with a controlled and uniform relief depth.Type: ApplicationFiled: October 2, 2006Publication date: February 12, 2009Inventor: Toshifumi Komatsu
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Publication number: 20080286692Abstract: A photoresist laminate structure comprising at least one photosensitive resist layer and a polymeric layer bound to the photosensitive resist layer is disclosed, wherein the polymeric layer is substantially impermeable to water.Type: ApplicationFiled: April 21, 2006Publication date: November 20, 2008Inventor: Toshifumi Komatsu
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Publication number: 20070166652Abstract: Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch resist ink. The acid-etch resist ink is formulated to provide optimal properties for ink-jet printing, while also providing excellent acid-etch resist and superior handling properties. The acid-etch resist ink is printed onto a sheet of a carrier substrate that allows the acid-etch resist to be transferred to a mold surface, after which the mold surface is etched with a strong acid.Type: ApplicationFiled: January 19, 2007Publication date: July 19, 2007Inventors: Toshifumi Komatsu, Jeremy Peterson, Alexander Gybin
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Patent number: 7074358Abstract: Methods and materials used to make detailed cast objects are disclosed. The cast objects are formed in mold created from a photosensitive laminate. The mold is formed by selectively removing portions of the photosensitive laminate. The invention is particularly well suited to make thin molded articles, but can also be used to make thicker molded articles by using multiple photosensitive layers or laminates.Type: GrantFiled: December 13, 2001Date of Patent: July 11, 2006Inventors: Alexander Sergeievich Gybin, Toshifumi Komatsu
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Publication number: 20050082254Abstract: The present invention is directed to a method and apparatus for etching the interior of a mold. In one implementation of the invention the interior of a mold is coated with an acid-resistant material. A photosensitive laminate is partially exposed to light, with only those areas that are to be etched being exposed. The laminate is subsequently developed to remove that portion of the laminate that has been exposed. This removed portion corresponds to the portion of the mold that is to be etched. After development the laminate is positioned in the interior of the mold over the acid-resistant coating, and then portions of the acid-resistant material are abrasively removed. The laminate is lightly wetted in some implementations in order to make it more flexible and stretchable, thereby allowing it to more readily conform to the interior surface of the mold.Type: ApplicationFiled: April 8, 2004Publication date: April 21, 2005Inventors: Toshifumi Komatsu, Alexander Gybin
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Patent number: 6605406Abstract: A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at least one cross-linkable unit represented by the formula: wherein X is an organic moity and Y is selected from the following group: wherein Z is selected from at least one of lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, and tetraalkylammonium.Type: GrantFiled: April 27, 2001Date of Patent: August 12, 2003Assignee: The Chromaline CorporationInventors: Kyle Johnson, Toshifumi Komatsu, Jeremy William Peterson
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Publication number: 20030148217Abstract: The present invention is directed to an ink receptive film and methods of using the ink receptive film. The ink receptive film is generally suitable for etching patterns into substrates, and typically includes a photosensitive laminate structure containing at least an ink receptive, radiation transmissive layer; and at least one photosensitive resist layer.Type: ApplicationFiled: January 30, 2002Publication date: August 7, 2003Inventors: Toshifumi Komatsu, Kyle Johnson, William Charles Ulland
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Publication number: 20030111771Abstract: Methods and materials used to make detailed cast objects are disclosed. The cast objects are formed in mold created from a photosensitive laminate. The mold is formed by selectively removing portions of the photosensitive laminate. The invention is particularly well suited to make thin molded articles, but can also be used to make thicker molded articles by using multiple photosensitive layers or laminates.Type: ApplicationFiled: December 13, 2001Publication date: June 19, 2003Inventors: Alexander Sergeievich Gybin, Toshifumi Komatsu
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Patent number: 6503683Abstract: The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.Type: GrantFiled: June 6, 1995Date of Patent: January 7, 2003Assignee: The Chromaline CorporationInventors: Alexander S. Gybin, Kyle K. Johnson, Toshifumi Komatsu, Lawrence C. Vaniseghem
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Publication number: 20020192569Abstract: The present invention is directed to devices and methods for exposing photoreactive compositions. Specifically, the invention is directed to devices and methods for exposing photoreactive compositions with light from light emitting diodes (LEDs). In certain embodiments the device includes an apparatus for retaining a photosensitive substrate containing a photoreactive composition, a light emitting diode array containing a plurality of light emitting diodes, and a control mechanism for regulating the intensity and distribution of light emitted from the light emitting diode array. In such implementations the light emitting diodes are configured and arranged for controlled exposure of the photoreactive composition.Type: ApplicationFiled: May 15, 2001Publication date: December 19, 2002Applicant: The Chromaline CorporationInventors: William Charles Ulland, Alexander Sergeievich Gybin, Toshifumi Komatsu, Claude P.A. Piguet
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Publication number: 20020115014Abstract: A photosensitive laminate structure including a carrier layer and a photosensitive layer is described.Type: ApplicationFiled: April 27, 2001Publication date: August 22, 2002Inventors: Kyle Johnson, Toshifumi Komatsu, Jeremy William Peterson