Abstract: A semiconductor manufacturing apparatus including a plurality of process modules for performing desired processes on a plurality of substrates and a plurality of transfer modules for serially transferring the plurality of substrates to the plurality of process modules is provided. The semiconductor manufacturing apparatus comprises a scheduler for calculating a cycle time so that a difference in time required for each of the desired processes is within an allowable time range and generating a transfer plan for the plurality of substrates based on the cycle time, and a transfer controller for controlling the plurality of transfer modules so that the plurality of substrates are serially transferred to the process modules according to the generated transfer plan.

Abstract: A semiconductor manufacturing apparatus for forming a film on a substrate by sputtering a target based on a recipe for performing film formation is provided. The apparatus comprises: a storage device configured to store an adjustment coefficient for adjusting a film quality of the formed film based on the recipe; a monitoring device configured to monitor a used amount of the target; a compensation device configured to calculate a compensation value for compensating at least one of process conditions set in the recipe by inputting the used amount of the target monitored by the monitoring device and the adjustment coefficient into a calculation formula; and a recipe execution device configured to execute film formation based on the recipe and the compensation value.

Abstract: A substrate processing apparatus, a method, and a program for controlling temperature of the substrate processing apparatus. A substrate processing apparatus comprising: a mounting table configured to hold a substrate to be processed in a vacuum processing container; a heat transfer gas container placed on a back side of the mounting table with a gap between the mounting table and the heat transfer gas container and configured to be cooled by a refrigerator; and a control device configured to control heating of the refrigerator to the vicinity of a first temperature on the basis of a temperature of a first control point provided near the refrigerator and then switching the heating control for the refrigerator on or off.

Abstract: A substrate processing system for performing processing on a plurality of substrates. The substrate processing system comprises: a processing unit comprising a plurality of processing modules each configured to perform a predetermined process; a transfer unit having a transfer device configured to transfer a substrate to each of the plurality of processing modules; a loading/unloading unit configured to hold a plurality of substrates and load/unload a substrate to/from the processing unit; and a controller configured to control the processing unit, the loading/unloading unit, and the transfer unit. The controller controls the transfer unit to transfer to the plurality of processing modules in a serial manner a plurality of substrates that are sequentially loaded from the loading/unloading unit to the processing unit, the controller further comprises a standby mode setting unit configured to set a standby period of the substrate at an appropriate timing depending on a content of the process.

Abstract: A semiconductor manufacturing apparatus including a plurality of process modules for performing desired processes on a plurality of substrates and a plurality of transfer modules for serially transferring the plurality of substrates to the plurality of process modules is provided. The semiconductor manufacturing apparatus comprises a scheduler for calculating a cycle time so that a difference in time required for each of the desired processes is within an allowable time range and generating a transfer plan for the plurality of substrates based on the cycle time, and a transfer controller for controlling the plurality of transfer modules so that the plurality of substrates are serially transferred to the process modules according to the generated transfer plan.

Abstract: There is provided a film forming method performed in a film forming apparatus having cathode units capable of installing a plurality of targets. The method comprises performing a film formation process using a first target between the first target and a second target that are disposed at the cathode units and are made of the same material, based on a recipe of the first target, receiving from a user, after a value for managing a lifespan of the first target has reached a predetermined threshold, selection of the second target to be used for the film forming process, and performing the film forming process using the selected second target based on a recipe in which setting of target-related control items of the recipe of the first target is converted for the selected second target.

Abstract: A substrate processing system includes a processing section that includes a plurality of process modules each of which performs a predetermined processing; a carrying-in/out section that holds the plurality of substrates, and carries the substrates into/out of the processing section; a transfer unit that transfers the substrates; and a controller that controls the processing section, the carrying-in/out section, and the transfer unit. The controller performs a control such that the plurality of substrates is sequentially transferred from the carrying-in/out section to the processing section, and the transferred substrates are sequentially and serially transferred to the plurality of process modules, sets an interval until a next substrate is unloaded after a substrate is unloaded from a predetermined module of the carrying-in/out section, and performs a control such that the plurality of substrates is sequentially unloaded from the predetermined module with a setting value of the interval.

Abstract: A substrate processing system includes a processing unit including processing modules and a first transfer device, a loading/unloading unit including a load port holding a substrate accommodating container and a second transfer device, and a control unit. The control unit controls the substrates to be sequentially transferred.

Abstract: A substrate processing system includes a processing unit including processing modules and a first transfer device, a loading/unloading unit including a load port holding a substrate accommodating container and a second transfer device, and a control unit. The control unit controls the substrates to be sequentially transferred.

Abstract: A substrate processing system includes a processing section that includes a plurality of process modules each of which performs a predetermined processing; a carrying-in/out section that holds the plurality of substrates, and carries the substrates into/out of the processing section; a transfer unit that transfers the substrates; and a controller that controls the processing section, the carrying-in/out section, and the transfer unit. The controller performs a control such that the plurality of substrates is sequentially transferred from the carrying-in/out section to the processing section, and the transferred substrates are sequentially and serially transferred to the plurality of process modules, sets an interval until a next substrate is unloaded after a substrate is unloaded from a predetermined module of the carrying-in/out section, and performs a control such that the plurality of substrates is sequentially unloaded from the predetermined module with a setting value of the interval.

Abstract: An apparatus includes a row of substrate transfer devices 3 which can deliver a wafer W within a transfer chamber; and rows of process modules PM, arranged at right and left sides of the row of the substrate transfer devices along the row, configured to perform processes to the wafer W. The rows of the process modules PM are arranged such that each of the processes can be performed by at least two process modules PM. Thus, when a single process module PM cannot be used, the wafer W can be rapidly transferred to another process module PM which can perform the same process as performed in the corresponding process module. Therefore, even when the single process module PM cannot be used, the processes can be continued to the wafers W without stopping an operation of the apparatus, so that the number of wasted wafers W can be reduced.

Abstract: A film forming system includes a camera having a field of view in a region through which an edge of a film-formed workpiece rotated by a rotational stage and an edge of the film of the film-formed workpiece pass. Based on three or more images obtained by the camera during the rotation of the film-formed workpiece, widths between the edge of the film-formed workpiece and the edge of the film of the film-formed workpiece at circumferentially different locations are obtained. Based on the widths obtained by the first unit, a first positional deviation of a central position of the film of the film-formed workpiece with respect to a central position of the film-formed workpiece is obtained. By using the first positional deviation of the film-formed workpiece, a transfer position of a transfer modules transferring the workpiece to a film forming apparatus used for producing the film-formed workpiece is corrected.

Abstract: An apparatus includes a row of substrate transfer devices 3 which can deliver a wafer W within a transfer chamber; and rows of process modules PM, arranged at right and left sides of the row of the substrate transfer devices along the row, configured to perform processes to the wafer W. The rows of the process modules PM are arranged such that each of the processes can be performed by at least two process modules PM. Thus, when a single process module PM cannot be used, the wafer W can be rapidly transferred to another process module PM which can perform the same process as performed in the corresponding process module. Therefore, even when the single process module PM cannot be used, the processes can be continued to the wafers W without stopping an operation of the apparatus, so that the number of wasted wafers W can be reduced.

Abstract: An apparatus includes a row of substrate transfer devices 3 which can deliver a wafer W within a transfer chamber; and rows of process modules PM, arranged at right and left sides of the row of the substrate transfer devices along the row, configured to perform processes to the wafer W. The rows of the process modules PM are arranged such that each of the processes can be performed by at least two process modules PM. Thus, when a single process module PM cannot be used, the wafer W can be rapidly transferred to another process module PM which can perform the same process as performed in the corresponding process module. Therefore, even when the single process module PM cannot be used, the processes can be continued to the wafers W without stopping an operation of the apparatus, so that the number of wasted wafers W can be reduced.

Abstract: A processing apparatus includes a processing chamber, gas supply paths provided in a corresponding relationship with the kinds of process gases supplied into the processing chamber, and valves respectively arranged in the gas supply paths. The apparatus further includes a measuring unit for measuring a physical parameter associated with each of the process gases passing through the gas supply paths, a register unit which stores the physical parameter, and a control unit configured to determine a process status based on the physical parameter stored in the register unit. The register unit is provided in a lower-hierarchy control device connected to the control unit of a higher hierarchy to transmit and receive signals to and from the control unit. The lower-hierarchy control device is configured to control input and output signals between the control unit and end devices under the control of the control unit.

Abstract: A film forming system includes a camera having a field of view in a region through which an edge of a film-formed workpiece rotated by a rotational stage and an edge of the film of the film-formed workpiece pass. Based on three or more images obtained by the camera during the rotation of the film-formed workpiece, widths between the edge of the film-formed workpiece and the edge of the film of the film-formed workpiece at circumferentially different locations are obtained. Based on the widths obtained by the first unit, a first positional deviation of a central position of the film of the film-formed workpiece with respect to a central position of the film-formed workpiece is obtained. By using the first positional deviation of the film-formed workpiece, a transfer position of a transfer modules transferring the workpiece to a film forming apparatus used for producing the film-formed workpiece is corrected.

Abstract: An apparatus includes a row of substrate transfer devices 3 which can deliver a wafer W within a transfer chamber; and rows of process modules PM, arranged at right and left sides of the row of the substrate transfer devices along the row, configured to perform processes to the wafer W. The rows of the process modules PM are arranged such that each of the processes can be performed by at least two process modules PM. Thus, when a single process module PM cannot be used, the wafer W can be rapidly transferred to another process module PM which can perform the same process as performed in the corresponding process module. Therefore, even when the single process module PM cannot be used, the processes can be continued to the wafers W without stopping an operation of the apparatus, so that the number of wasted wafers W can be reduced.

Abstract: A processing apparatus includes a processing chamber configured to accommodate a target object to be processed, gas supply paths provided in a corresponding relationship with the kinds of process gases supplied into the processing chamber, and valves respectively arranged in the gas supply paths to open and close the gas supply paths. The processing apparatus further includes valve drive units configured to independently drive the valves, sensor units configured to independently monitor opening and closing operations of the valves, and a control unit configured to determine operation statuses of the valves based on valve opening and closing drive signals transmitted to the valve drive units and/or valve opening and closing detection signals transmitted from the sensor units.

Abstract: A capacitor includes a capacitor element, a bottomed, cylindrical, metallic case, a metallic terminal plate, and a sealing rubber. A flange is provided along the outer circumference of the terminal plate. The flange is brought into contact with the bottom face of the sealing rubber for positioning. The case is wrung from the outside thereof so as to compress the sealing rubber. The sealing rubber has at least one of a ring-shaped top projection wall projecting between the metallic case and the terminal plate on the top face thereof, and a ring-shaped bottom projection wall projecting between the metallic case and the flange on the bottom face thereof.

Abstract: An electric double-layer capacitor includes a cylindrical case having a bottom, a side surface, and an opening, a capacitor element accommodated in the case, the capacitor element, a driving electrolyte accommodated in the case, and a terminal plate provided at the opening of the case. The capacitor element includes a first electrode and a second electrode extending in a direction opposite to the first electrode. The second electrode is joined to the bottom of the case. The first and second electrodes are tilted away from the center axis of the capacitor element. In this electric double-layer capacitor, electrodes of the capacitor element are connected to the case and sealing plate reliably.