Patents by Inventor Toshihiko Miyajima

Toshihiko Miyajima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6136168
    Abstract: A clean transfer method and an apparatus therefor capable of receiving, storing and transferring a transferred object by means of a vacuum clean box while eliminating arrangement of any vacuum evacuation means and transfer means in the vacuum clean box, as well as facilitating connection of the vacuum clean box to various processing units. The vacuum clean box is free of any vacuum evacuation means and transfer means and is provided with a first opening selectively closed with a first shutter and kept airtight when the first opening is closed with the first shutter. The vacuum clean box is airtightly connected to a sputter unit which is provided with a second opening selectively closed with a second shutter, when the first and second openings are closed with the first and second shutters, respectively, resulting in forming a closed space therebetween through which the first and second shutters are opposite to each other.
    Type: Grant
    Filed: August 18, 1998
    Date of Patent: October 24, 2000
    Assignee: TDK Corporation
    Inventors: Sho Masujima, Eisaku Miyauchi, Toshihiko Miyajima, Hideaki Watanabe
  • Patent number: 6062808
    Abstract: A clean transfer method and an apparatus therefor capable of facilitating storage and transfer of transferred objects by a vacuum clean box and realizing transfer of the objects to various processing units other than a vacuum unit. A vacuum clean box and a clean unit are airtightly connected to each other. The vacuum clean box includes a first shutter acting also as a lid and arranged so as to airtightly close a first opening of the box. The clean unit is provided with a second opening selectively closed by a second shutter. Airtight connection between the vacuum clean box and the clean unit is carried out while keeping the first and second openings closed by the first and second shutters, respectively, to thereby form a closed space therebetween which the first and second shutters face. Then, the closed space is evacuated to a vacuum, followed by opening of only the first shutter.
    Type: Grant
    Filed: March 24, 1998
    Date of Patent: May 16, 2000
    Assignee: TDK Corporation
    Inventors: Sho Masujima, Eisaku Miyauchi, Toshihiko Miyajima, Hideaki Watanabe
  • Patent number: 5730573
    Abstract: A clean transfer method and an apparatus therefor capable of facilitating storage and transfer of transferred objects by a vacuum clean box and realizing transfer of the objects to various processing units other than a vacuum unit. A vacuum clean box and a clean unit are airtightly connected to each other. The vacuum clean box includes a first shutter acting also as a lid and arranged so as to airtightly close a first opening of the box. The clean unit is provided with a second opening selectively closed by a second shutter. Airtight connection between the vacuum clean box and the clean unit is carried out while keeping the first and second openings closed by the first and second shutters, respectively, to thereby form a closed space therebetween which the first and second shutters face. Then, the closed space is evacuated to a vacuum, followed by opening of only the first shutter.
    Type: Grant
    Filed: February 21, 1995
    Date of Patent: March 24, 1998
    Assignee: TDK Corporation
    Inventors: Sho Masujima, Eisaku Miyauchi, Toshihiko Miyajima, Hideaki Watanabe
  • Patent number: 5364219
    Abstract: A clean transfer system having a first vacuum chamber with a first transfer port, a first shutter for opening and closing the first transfer port and a first connecting member surrounding the first transfer port. The first connecting member is provided with at least an exterior portion. A second vaccum chamber includes a second transfer port, a second shutter for opening and closing the second transfer port, and a second connecting member surrounding the second transfer port. The second connecting member has at least an exterior portion. A closed space is formed between the first and second connecting members, so that the first and second shutters are movable within the closed space.
    Type: Grant
    Filed: June 23, 1992
    Date of Patent: November 15, 1994
    Assignee: TDK Corporation
    Inventors: Tetsuo Takahashi, Eisaku Miyauchi, Toshihiko Miyajima, Hideaki Watanabe
  • Patent number: 5139459
    Abstract: A clean transfer method capable of safely transferring a semiconductor or the like to various apparatus for treating the semiconductor while keeping the environment clean. In the method, the semiconductor is transferred between a vacuum clean box arranged in a clean room and kept at the degree of vacuum of 1 Torr or less and a vacuum chamber arranged in a maintenance room while transfer ports of the vacuum clean box and vacuum chamber are kept air-tightly connected to each other. The vacuum clean box is movably arranged.
    Type: Grant
    Filed: February 28, 1991
    Date of Patent: August 18, 1992
    Assignee: TDK Corporation
    Inventors: Tetsuo Takahashi, Eisaku Miyauchi, Toshihiko Miyajima