Patents by Inventor Toshihiko Ono
Toshihiko Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11823967Abstract: A glass or glass-ceramic carrier substrate, the substrate having undergone at least one complete cycle of a semiconductor fabrication process and having also undergone a reclamation process following the end of the semiconductor fabrication process; the glass or glass-ceramic carrier substrate comprising at least one of the following properties: (i) a coefficient of thermal expansion of less than 13 ppm/° C.; (ii) a Young's Modulus of 70 GPa to 150 GPa; (iii) an IR transmission of greater than 80% at a wavelength of 1064 nm; (iv) a UV transmission of greater than 20% at a wavelength of 255 nm to 360 nm; (v) a thickness tolerance within the same range as the thickness tolerance of the carrier substrate before undergoing at least one complete cycle of the semiconductor fabrication process; (vi) a total thickness variation of less than 2.5 ?m; (vii) a failure strength of greater than 80 MPa using a 4-point-bending test; (viii) a pre-shape of 50 ?m to 300 ?m.Type: GrantFiled: November 20, 2020Date of Patent: November 21, 2023Assignee: CORNING INCORPORATEDInventors: Robert Alan Bellman, Indrajit Dutta, Yi-Cheng Hsieh, Toshihiko Ono, Nicholas James Smith
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Patent number: 11078179Abstract: In a method for producing a cyclic ester according to an embodiment of the present invention, a mixture (I) containing an aliphatic polyester, a specific polyalkylene glycol diether, and a sulfonic acid compound as a thermal stabilizer is prepared and heated in predetermined conditions to obtain a mixture (II) in a state of solution. Furthermore, heating of the mixture (II) is continued to distill, together with the polyalkylene glycol diether, a cyclic ester formed by the depolymerization reaction, and thus a distillate (III) is obtained. The cyclic ester is recovered from the distillate (III). At this time, a specific solubilizing agent is added to at least one of the mixture (I) or (II). In this production method, the sulfonic acid compound as the thermal stabilizer is contained in the mixtures (I) and (II) and the distillate (III).Type: GrantFiled: March 7, 2019Date of Patent: August 3, 2021Assignee: KUREHA CORPORATIONInventors: Nanako Saigusa, Takenori Tose, Toshihiko Ono, Yoshinori Suzuki
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Patent number: 11046665Abstract: Provided is a method for producing a high purity ?-hydroxycarboxylic acid dimeric cyclic ester while heavy-component formation from an ?-hydroxycarboxylic acid oligomer is suppressed. An ?-hydroxycarboxylic acid dimeric cyclic ester is obtained by performing a depolymerization reaction in the coexistence of an inorganic acid or an inorganic acid salt or a mixture thereof; and an organophosphorus compound.Type: GrantFiled: December 18, 2017Date of Patent: June 29, 2021Assignee: KUREHA CORPORATIONInventors: Haruyasu Yamaji, Yoshinori Suzuki, Toshihiko Ono
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Publication number: 20210159134Abstract: A glass or glass-ceramic carrier substrate, the substrate having undergone at least one complete cycle of a semiconductor fabrication process and having also undergone a reclamation process following the end of the semiconductor fabrication process; the glass or glass-ceramic carrier substrate comprising at least one of the following properties: (i) a coefficient of thermal expansion of less than 13 ppm/° C.; (ii) a Young's Modulus of 70 GPa to 150 GPa; (iii) an IR transmission of greater than 80% at a wavelength of 1064 nm; (iv) a UV transmission of greater than 20% at a wavelength of 255 nm to 360 nm; (v) a thickness tolerance within the same range as the thickness tolerance of the carrier substrate before undergoing at least one complete cycle of the semiconductor fabrication process; (vi) a total thickness variation of less than 2.5 ?m; (vii) a failure strength of greater than 80 MPa using a 4-point-bending test; (viii) a pre-shape of 50 ?m to 300 ?m.Type: ApplicationFiled: November 20, 2020Publication date: May 27, 2021Inventors: Robert Alan Bellman, Indrajit Dutta, Yi-Cheng Hsieh, Toshihiko Ono, Nicholas James Smith
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Patent number: 11001565Abstract: The object of the present invention is to provide a glycolide production method capable of further increasing the production rate of glycolide. The glycolide production method according to the present invention includes adding metal iron to an aqueous glycolic acid solution, subjecting glycolic acid contained in the aqueous glycolic acid solution to which the metal iron is added, to dehydrating polycondensation to obtain a glycolic acid oligomer, and heating and depolymerizing the glycolic acid oligomer to obtain glycolide.Type: GrantFiled: February 20, 2019Date of Patent: May 11, 2021Assignee: KUREHA CORPORATIONInventors: Yuta Yamadoi, Yoshinori Suzuki, Takenori Tose, Haruyasu Yamaji, Toshihiko Ono
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Publication number: 20210087162Abstract: The object of the present invention is to provide a glycolide production method capable of sufficiently increasing the production rate of glycolide. The glycolide production method according to the present invention includes: adding metal titanium to an aqueous glycolic acid solution; subjecting glycolic acid contained in the aqueous glycolic acid solution to which the metal titanium is added, to dehydrating polycondensation to obtain a glycolic acid oligomer; and heating and depolymerizing the glycolic acid oligomer to obtain glycolide.Type: ApplicationFiled: March 6, 2019Publication date: March 25, 2021Applicant: Kureha CorporationInventors: Haruyasu YAMAJI, Yuta YAMADOI, Yoshinori SUZUKI, Toshihiko ONO
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Publication number: 20210002248Abstract: The object of the present invention is to provide a glycolide production method capable of further increasing the production rate of glycolide. The glycolide production method according to the present invention includes adding metal iron to an aqueous glycolic acid solution, subjecting glycolic acid contained in the aqueous glycolic acid solution to which the metal iron is added, to dehydrating polycondensation to obtain a glycolic acid oligomer, and heating and depolymerizing the glycolic acid oligomer to obtain glycolide.Type: ApplicationFiled: February 20, 2019Publication date: January 7, 2021Applicant: Kureha CorporationInventors: Yuta YAMADOI, Yoshinori SUZUKI, Takenori TOSE, Haruyasu YAMAJI, Toshihiko ONO
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Publication number: 20200392102Abstract: In a method for producing a cyclic ester according to an embodiment of the present invention, a mixture (I) containing an aliphatic polyester, a specific polyalkylene glycol diether, and a sulfonic acid compound as a thermal stabilizer is prepared and heated in predetermined conditions to obtain a mixture (II) in a state of solution. Furthermore, heating of the mixture (II) is continued to distill, together with the polyalkylene glycol diether, a cyclic ester formed by the depolymerization reaction, and thus a distillate (III) is obtained. The cyclic ester is recovered from the distillate (III). At this time, a specific solubilizing agent is added to at least one of the mixture (I) or (II). In this production method, the sulfonic acid compound as the thermal stabilizer is contained in the mixtures (I) and (II) and the distillate (III).Type: ApplicationFiled: March 7, 2019Publication date: December 17, 2020Applicant: Kureha CorporationInventors: Nanako SAIGUSA, Takenori TOSE, Toshihiko ONO, Yoshinori SUZUKI
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Patent number: 10612129Abstract: Provided herein are ion-implanted glass based articles with improved flaw suppression properties. The ion-implanted glass based articles generally have a final indent fracture threshold (IFT) load of at least 650 grams, and/or a scratch threshold force of at least 10 N, which represents at least 1.25-fold enhancement compared to the glass based article prior to ion-implantation. Factors affecting the efficacy of the ion implantation process can include the IFT load of the starting glass or glass ceramic substrate (native IFT load), ion type, ion dose, implant energy, beam current, and glass temperature.Type: GrantFiled: June 22, 2017Date of Patent: April 7, 2020Assignee: CORNING INCORPORATEDInventors: Sarko Cherekdjian, Benedict Osobomen Egboiyi, William Brashear Mattingly, III, Michael Yoshiya Nishimoto, Toshihiko Ono, Prakash Chandra Panda, Trevor Edward Wilantewicz
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Publication number: 20190330175Abstract: Provided is a method for producing a high purity ?-hydroxycarboxylic acid dimeric cyclic ester while heavy-component formation from an ?-hydroxycarboxylic acid oligomer is suppressed. An ?-hydroxycarboxylic acid dimeric cyclic ester is obtained by performing a depolymerization reaction in the coexistence of an inorganic acid or an inorganic acid salt or a mixture thereof; and an organophosphorus compound.Type: ApplicationFiled: December 18, 2017Publication date: October 31, 2019Inventors: Haruyasu YAMAJI, Yoshinori Suzuki, Toshihiko ONO
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Publication number: 20170369989Abstract: Provided herein are ion-implanted glass based articles with improved flaw suppression properties. The ion-implanted glass based articles generally have a final indent fracture threshold (IFT) load of at least 650 grams, and/or a scratch threshold force of at least 10 N, which represents at least 1.25-fold enhancement compared to the glass based article prior to ion-implantation. Factors affecting the efficacy of the ion implantation process can include the IFT load of the starting glass or glass ceramic substrate (native IFT load), ion type, ion dose, implant energy, beam current, and glass temperature.Type: ApplicationFiled: June 22, 2017Publication date: December 28, 2017Inventors: Sarko Cherekdjian, Benedict Osobomen Egboiyi, William Brashear Mattingly, III, Michael Yoshiya Nishimoto, Toshihiko Ono, Parkash Chandra Panda, Trevor Edward Wilantewicz
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Publication number: 20160190185Abstract: Disclosed are controlled chemical etching processes used to modify the geometry of surface flaws in thin glass substrates and glass substrate assemblies formed therefrom, and in particular glass substrates suitable for the manufacture of active matrix displays that are essentially free of alkali metal oxides such as Na2O, K2O and Li2O.Type: ApplicationFiled: March 4, 2016Publication date: June 30, 2016Inventors: Jeanne Spadinger Cavuoti, Donald Arthur Clark, Sean Matthew Garner, Gregory Scott Glaesemann, Jun Hou, Jum Sik Kim, Toshihiko Ono, Daniel Arthur Sternquist
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Patent number: 9315412Abstract: Disclosed are controlled chemical etching processes used to modify the geometry of surface flaws in thin glass substrates and glass substrate assemblies formed therefrom, and in particular glass substrates suitable for the manufacture of active matrix displays that are essentially free of alkali metal oxides such as Na2O, K2O and Li2O.Type: GrantFiled: July 3, 2012Date of Patent: April 19, 2016Assignee: CORNING INCORPORATEDInventors: Jeanne Spadinger Cavuoti, Donald A. Clark, Sean Matthew Garner, Gregory Scott Glaesemann, Jun Hou, Jum Sik Kim, Toshihiko Ono, Daniel Arthur Sternquist
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Patent number: 8722907Abstract: The invention provides a production process of glycolide comprising the respective steps of: Step 1 of heating a mixture containing a glycolic acid oligomer and a high boiling polar organic under normal or reduced pressure to reflux the mixture and at that time, conducting a total reflux operation in a reflux time within a range of 0.1 to 20 hours under conditions that substantially the whole amount of a distillate distilled out of a reflux system containing the mixture is refluxed into the reflux system; Step 2 of heating the mixture after the total reflux operation or a mixture obtained by adding the high boiling polar organic solvent to a glycolic acid oligomer component recovered from the mixture after the total reflux operation to conduct depolymerization; and Step 3 of collecting glycolide from a co-distillate.Type: GrantFiled: December 9, 2009Date of Patent: May 13, 2014Assignee: Kureha CorporationInventors: Shigeru Suzuki, Kazuyuki Yamane, Toshihiko Ono, Kazuhiko Sunagawa
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Publication number: 20130109116Abstract: Disclosed are controlled chemical etching processes used to modify the geometry of surface flaws in thin glass substrates and glass substrate assemblies formed therefrom, and in particular glass substrates suitable for the manufacture of active matrix displays that are essentially free of alkali metal oxides such as Na2O, K2O and Li2O.Type: ApplicationFiled: July 3, 2012Publication date: May 2, 2013Inventors: Jeanne Spadinger Cavuoti, Donald A. Clark, Sean Matthew Garner, Gregory Scott Glaesemann, Jun Hou, Jum Sik Kim, Toshihiko Ono, Daniel Arthur Sternquist
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Publication number: 20130079450Abstract: A resin composition containing polyglycolic acid having a structure represented by a formula (1) in a proportion of at least 70% by mol and a calcium-containing inorganic compound, preferably the carbonate, hydroxide or phosphate of calcium, and optionally containing a carboxyl group end-capping agent and further optionally a heat stabilizer.Type: ApplicationFiled: May 17, 2011Publication date: March 28, 2013Applicant: KUREHA CORPORATIONInventors: Hiroyuki Sato, Toshihiko Ono, Moriaki Arasaki
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Patent number: 8133955Abstract: An aromatic polyester resin composition, comprising: a melt-kneaded product of 99-70 weight parts of an aromatic polyester resin and 1-30 wt. parts (providing a total of 100 wt. parts together with the aromatic polyester resin) of a polyglycolic acid resin, wherein the composition is characterized by a transesterification rate CTE (%) of 20-60% determined by formula (1) below based on a peak integration ratio of methylene group in polyglycolic acid appearing at ?4.87 ppm with reference to tetramethylsilane according to 1H-NMR measurement: CTE (%)=(1?I(B)/I(A))×100??(1), wherein I (A): a peak integration ratio of the methylene group of the polyglycolic acid main chain with respect to the alkylene group of the aromatic polyester main chain calculated from the components weight ratio; and I (B): a peak integration ratio of the methylene group of polyglycolic acid main chain to the alkylene group of the aromatic polyester main chain in the resin composition.Type: GrantFiled: January 22, 2008Date of Patent: March 13, 2012Assignee: Kureha CorporationInventors: Hiroyuki Sato, Kazuyuki Yamane, Yuki Hokari, Fuminori Kobayashi, Toshihiko Ono
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Publication number: 20110263875Abstract: The invention provides a production process of glycolide comprising the respective steps of: Step 1 of heating a mixture containing a glycolic acid oligomer and a high boiling polar organic under normal or reduced pressure to reflux the mixture and at that time, conducting a total reflux operation in a reflux time within a range of 0.1 to 20 hours under conditions that substantially the whole amount of a distillate distilled out of a reflux system containing the mixture is refluxed into the reflux system; Step 2 of heating the mixture after the total reflux operation or a mixture obtained by adding the high boiling polar organic solvent to a glycolic acid oligomer component recovered from the mixture after the total reflux operation to conduct depolymerization; and Step 3 of collecting glycolide from a co-distillate.Type: ApplicationFiled: December 9, 2009Publication date: October 27, 2011Applicant: KUREHA CORPORATIONInventors: Shigeru Suzuki, Kazuyuki Yamane, Toshihiko Ono, Kazuhiko Sunagawa
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Publication number: 20110045235Abstract: A method for manufacturing a porous polymer molded article, comprising a step of laminating a first mask with a plurality of openings formed therein and a second mask with a plurality of openings formed therein and having a mean opening diameter that is larger than the mean opening diameter of the first mask, on a polymer molded article, and a step of forming through-holes in the polymer molded article by dry etching from the second mask side.Type: ApplicationFiled: October 15, 2008Publication date: February 24, 2011Applicant: KUREHA CORPORATIONInventors: Kazuyuki Yamane, Yuki Hokari, Toshihiko Ono, Takeshi Saitou
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Publication number: 20100063219Abstract: An aromatic polyester resin composition, comprising: a melt-kneaded product of 99-70 weight parts of an aromatic polyester resin and 1-30 wt. parts (providing a total of 100 wt. parts together with the aromatic polyester resin) of a polyglycolic acid resin, wherein the composition is characterized by a transesterification rate CTE (%) of 20-60% determined by formula (1) below based on a peak integration ratio of methylene group in polyglycolic acid appearing at ?4.87 ppm with reference to tetramethylsilane according to 1H-NMR measurement: CTE(%)=(1?I(B)/I(A))×100 ??(1), wherein I (A): a peak integration ratio of the methylene group of the polyglycolic acid main chain with respect to the alkylene group of the aromatic polyester main chain calculated from the components weight ratio; and I (B): a peak integration ratio of the methylene group of polyglycolic acid main chain to the alkylene group of the aromatic polyester main chain in the resin composition.Type: ApplicationFiled: January 22, 2008Publication date: March 11, 2010Inventors: Hiroyuki Sato, Kazuyuki Yamane, Yuki Hokari, Fuminori Kobayashi, Toshihiko Ono